C. Skierbiszewski

Large, nitrogen-induced increase of the electron effective mass in InyGa1−yNxAs1−x

A dramatic increase of the conduction band electron mass in a nitrogen-containing III–V alloy is reported. The mass is found to be strongly dependent on the nitrogen content and the electron concentration with a value as large as 0.4m0 in In0.08Ga0.92As0.967N0.033 with 6×1019 cm−3 free electrons. This mass is more than five times larger than the electron effective mass in GaAs and comparable to typical heavy hole masses in III–V compounds. The results provide a critical test and fully confirm the predictions of the recently proposed band anticrossing model of the electronic structure of the III–N–V alloys.

High Electron Mobility in AlGaN/GaN Heterostructures Grown on Bulk GaN Substrates

Dislocation-free high-quality AlGaN/GaN heterostructures have been grown by molecular-beam epitaxy on semi-insulating bulk GaN substrates. Hall measurements performed in the 300 K–50 mK range show a low-temperature electron mobility exceeding 60 000 cm2/V s for an electron sheet density of 2.4×1012 cm−2. Magnetotransport experiments performed up to 15 T exhibit well-defined quantum Hall-effect features. The structures corresponding to the cyclotron and spin splitting were clearly resolved. From an analysis of the Shubnikov de Hass oscillations and the low-temperature mobility we found the quantum and transport scattering times to be 0.4 and 8.2 ps, respectively. The high ratio of the scattering to quantum relaxation time indicates that the main scattering mechanisms, at low temperatures, are due to long-range potentials, such as Coulomb potentials of ionized impurities.

AlGaN/GaN high electron mobility transistors as a voltage-tunable room temperature terahertz sources

We report on room temperature terahertz generation by a submicron size AlGaN/GaN-based high electron mobility transistors. The emission peak is found to be tunable by the gate voltage between 0.75 and 2.1 THz. Radiation frequencies correspond to the lowest fundamental plasma mode in the gated region of the transistor channel. Emission appears at a certain drain bias in a thresholdlike manner. Observed emission is interpreted as a result of Dyakonov–Shur plasma wave instability in the gated two-dimensional electron gas.

Blue-violet InGaN laser diodes grown on bulk GaN substrates by plasma-assisted molecular-beam epitaxy

We report on the InGaN multiquantum laser diodes (LDs) made by rf plasma-assisted molecular beam epitaxy (PAMBE). The laser operation at 408nm is demonstrated at room temperature with pulsed current injections using 50ns pulses at 0.25% duty cycle. The threshold current density and voltage for the LDs with cleaved uncoated mirrors are 12kA∕cm2 (900mA) and 9V, respectively. High output power of 0.83W is obtained during pulse operation at 3.6A and 9.6V bias with the slope efficiency of 0.35W∕A. The laser structures are deposited on the high-pressure-grown low dislocation bulk GaN substrates taking full advantage of the adlayer enhanced lateral diffusion channel for adatoms below the dynamic metallic cover. Our devices compare very favorably to the early laser diodes fabricated using the metalorganic vapor phase epitaxy technique, providing evidence that the relatively low growth temperatures used in this process pose no intrinsic limitations on the quality of the blue optoelectronic components that can be f...

High mobility two-dimensional electron gas in AlGaN∕GaN heterostructures grown on bulk GaN by plasma assisted molecular beam epitaxy

The results on growth and magnetotransport characterization of AlGaN∕GaN heterostructures obtained by plasma assisted molecular beam epitaxy on dislocation-free (below 100cm−2) GaN high pressure synthesized bulk substrates are presented. The record mobilities of the two dimensional electron gas (2DEG) exceeding 100000cm2∕Vs at liquid helium temperature and 2500cm2∕Vs at room temperature are reported. An analysis of the high field conductivity tensor components allowed us to discuss the main electron scattering mechanisms and to confirm unambiguously the 2DEG room temperature mobility values.

Interband optical absorption in free standing layer of Ga0.96In0.04As0.99N0.01

We have measured the interband optical absorption of a free-standing sample of Ga0.96In0.04As0.99N0.01 in a wide energy range from 1 to 2.5 eV. We found that the fundamental absorption edge is shifted by 150 meV towards lower energies, and the absorption coefficient measured at higher energies exhibits substantial reduction comparing to that of GaAs. By removing the GaAs substrate, we were able to get an experimental insight into the interband optical transitions and the density of state in this material. The changes can be understood within the band anticrossing model predicting the conduction band splitting. New absorption edges associated with optical transitions from the spin-orbit split off band to the lower conduction subband (1.55 eV) and from the top of the valence band to the upper subband (1.85 eV) are observed.

Evidence for localized Si-donor state and its metastable properties in AlGaN

Transport studies of AlxGa1−xN (0.5<x<0.6) doped with Si have been performed in the pressure range up to 1.4 GPa. For these alloys, the Si dopant forms two donor states. One of them has an effective mass character and the other one represents the localized state strongly coupled to the crystal lattice (metastable state). The localized state of Si forms the corresponding level in the gap for x exceeding 0.5. For the higher x, an increase of the activation energy of this state occurs. Metastable properties of the localized state of Si lead to a persistent photoconductivity effect and to a pressure induced freeze-out of electrons.

60mW continuous-wave operation of InGaN laser diodes made by plasma-assisted molecular-beam epitaxy

We demonstrate continuous-wave operation at 411nm of InGaN multi-quantum-well laser diodes (LDs) made by plasma-assisted molecular-beam epitaxy (PAMBE). The threshold current density and voltage for these LDs are 4.2kA∕cm2 and 5.3V, respectively. High optical output power of 60mW is achieved. The LDs are fabricated on low-dislocation-density bulk GaN substrates, at growth conditions which resemble liquid-phase epitaxy. We show that use of such substrates eliminates spiral growth, which is the dominant growth mechanism for PAMBE on high-dislocation-density substrates. Therefore, PAMBE opens new perspectives for next generation of InGaN LDs.

High power blue–violet InGaN laser diodes grown on bulk GaN substrates by plasma-assisted molecular beam epitaxy

We report on the InGaN multi-quantum well laser diodes (LDs) made by RF plasma-assisted molecular beam epitaxy (PAMBE). The laser operation was demonstrated in a temperature range from 297 K up to 360 K with pulsed current injections using 50 ns pulses at 0.25% duty cycle. The threshold current density and voltage for these LDs were 9 kA cm−2 (680 mA) and 8.2 V respectively at 297 K. The slope efficiency is 0.35–0.47 W A−1. A high output power of 1.1 W was obtained during pulse operation for 3.6 A and 8.7 V. We compare parameters of laser diodes with two and five InGaN/InGaN quantum wells. The new, low temperature growth mechanism which enhances surface adatom kinetics, together with bulk GaN low dislocation density substrates allowed us to grow high quality laser diode structures. Our result indicates that there are no intrinsic limitations in the growth of nitride-based optoelectronic devices by PAMBE.

Optically pumped 500 nm InGaN green lasers grown by plasma-assisted molecular beam epitaxy

We report on optically pumped lasing at 500 nm on InGaN laser structures grown by plasma assisted molecular beam epitaxy. The InGaN laser structures were grown under group III-rich conditions on bulk (0001) GaN substrates. The influence of the nitrogen flux and growth temperature on the indium content of InGaN layers was studied. We demonstrate that at elevated growth temperatures, where appreciable dissociation rate for In-N bonds is observed, the indium content of InGaN layers increases with increasing nitrogen flux. We show that growth of InGaN at higher temperatures improves optical quality of InGaN quantum wells, which is crucial for green emitters. The influence of piezoelectric fields on the lasing wavelength is also discussed. In particular, the controversial issue of partial versus complete screening of built-in electric field at lasing conditions is examined, supporting the former case.