Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where Cai Wang is active.

Publication


Featured researches published by Cai Wang.


international microsystems, packaging, assembly and circuits technology conference | 2008

Properties of a Newly Developed Immersion Tin Coating

Yung-Herng Yau; Cai Wang; Robert Farrell; Pingping Ye; Ed Kudrak; Karl Wengenroth; Joseph Anthony Abys

Gradually diminishing solderability and potential risk of whisker growth are two major concerns in using immersion tin as a final finish for printed wiring boards. Both phenomena are attributable to the spontaneous formation of intermetallic compounds (IMC) of Cu6Sn5 and Cu3Sn between the tin coating and copper substrate. The formation of IMC consumes the free tin in the coating that is essential for good solderability. It also builds up compressive stress within the tin coating that induces whisker growth. The formation of IMC is known to be affected by the microstructure of the tin coating, as evidenced by the difference in whisker propensity observed between bright and matte tin coatings. Various methods have been used in the formulation of immersion tin chemistries to alter the microstructure of the tin deposit and to retard the intermetallic formation process, yet there is no direct experimental data to link solderability and whisker propensity to the physical properties of the tin deposit. The objective of this study was to investigate such a link through the evaluation of a newly developed immersion tin chemistry. The propensity to form whiskers was evaluated by aging in an ambient environment for 3000 hours and accelerated thermal cycling tests. Solderability was evaluated by wetting balance tests after simulated reflow thermal excursions. The distribution of IMCs was investigated by sequential electrochemical reduction analysis and cross examined by focused ion beam.


international microsystems, packaging, assembly and circuits technology conference | 2007

Characterization of key coating properties of immersion tin for PWB

Yung-Herng Yau; Xingping Wang; Cai Wang; Pingping Ye; Karl Wengenroth; Joseph Abys

In order to meet the requirement of RoHS, including the elimination of lead from electronic components, the printed circuit board industry is moving away from lead bearing hot air solder leveled final finishes to alternative materials. Immersion tin has been available on the market for some time, in spite of its high manufacturing cost and difficulties in processing, because it provides a thick, uniform metallic coating for improved ICT probe life, lubricity for press fit pins, and excellent solderability. Since the formation of intermetallic compounds of Cu6Sn5 and Cu3Sn between the copper substrate and tin coating decreases the solderability and induces whiskers, various methods have been used in the formulation of immersion tin chemistries to retard the intermetallic formation process. This paper compares several immersion tin coatings through the investigation of the kinetics of intermetallic growth and phase transformation by using sequential electrochemical reduction analysis; and the associated solderability by wetting balance test. The intermetallic growth and whisker formation are related to coating compositions and crystal morphologies.


Archive | 2008

Copper metallization of through silicon via

Thomas B. Richardson; Yun Zhang; Chen Wang; Vincent Paneccasio; Cai Wang; Xuan Lin; Richard Hurtubise; Joseph Anthony Abys


Archive | 2008

Metallic surface enhancement

Joseph Anthony Abys; Shenliang Sun; Chonglun Fan; Edward J. Kudrak; Cai Wang


Archive | 2012

Process for filling vias in the microelectronics

Thomas B. Richardson; Joseph Anthony Abys; Wenbo Shao; Chen Wang; Vincent Paneccasio; Cai Wang; Xuan Lin; Theodore Antonellis


Archive | 2009

Immersion tin silver plating in electronics manufacture

Yung-Herng Yau; Xingping Wang; Cai Wang; Robert Farrell; Pingping Ye; Edward J. Kudrak; Karl Wengenroth; Joseph Anthony Abys


Archive | 2011

Copper filling of through silicon vias

Thomas B. Richardson; Wenbo Shao; Xuan Lin; Cai Wang; Vincent Paneccasio; Joseph Anthony Abys; Yun Zhang; Richard Hurtubise; Chen Wang


Archive | 2012

Procédé permettant de combler des trous d'interconnexion en microélectronique

Thomas B. Richardson; Joseph Anthony Abys; Wenbo Shao; Chen Wang; Jr. Vincent Paneccasio; Cai Wang; Xuan Lin; Theodore Antonellis


Archive | 2011

Remplissage par du cuivre d'intra-connexions traversantes dans un substrat de silicium

Joseph Anthony Abys; Richard Hurtubise; Xuan Lin; Vincent Paneccasio; Thomas B. Richardson; Wenbo Shao; Cai Wang; Chen Wang; Yun Zhang


Archive | 2010

Plaquage par immersion d'étain-argent dans une fabrication de dispositifs électroniques

Yung-Herng Yau; Xingping Wang; Cai Wang; Robert Farrell; Pingping Ye; Edward J. Kudrak; Karl Wengenroth; Joseph Anthony Abys

Collaboration


Dive into the Cai Wang's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar

Chen Wang

Dalian Medical University

View shared research outputs
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge