Cem Çelebi

Atomic scale study of the impact of the strain and composition of the capping layer on the formation of InAs quantum dots

The impact of the capping material on the structural properties of self-assembled InAs quantum dots (QDs) was studied at the atomic scale by cross-sectional scanning tunneling microscopy. Capping with lattice matched layers and with strained layers was analyzed. When the different capping materials are lattice matched to the substrate, the differences in the QD properties can be dominated by chemical effects: InAs/InP QDs capped with InP have a 2 ML smaller height than those capped with InGaAs or InGaAsP due to As/P exchange induced decomposition. The height of the dots is found to be much more strongly affected when strained capping layers are used. InAs/GaAs, QDs capped with InGaAs are considerably taller than typical GaAs-capped dots. When GaAsSb is used as the capping layer, the dots are almost full pyramids with a height of 9.5 nm, indicating that dot decomposition is almost completely suppressed. This indicates that the dot/capping layer strain plays a major role in inducing dot decomposition during...

Capping of InAs quantum dots grown on (311)B InP studied by cross-sectional scanning tunneling microscopy

Cross-sectional scanning tunneling microscopy was used to study at the atomic scale the impact of the capping material on the structural properties of self-assembled InAs quantum dots (QDs) grown on a high index (311)B InP substrate. Important differences were found in the capping process when InP or lattice matched InGaAs(P) alloys are used. The QDs capped with InP have a smaller height due to As∕P exchange induced decomposition. This effect is not present when InGaAs is used as the capping material. However, in this case a strong strain driven phase separation appears, creating In rich regions above the QDs and degrading the dot/capping layer interface. If the InAs dots are capped by the quaternary alloy InGaAsP the phase separation is much weaker as compared to capping with InGaAs and well defined interfaces are obtained.

Epitaxial graphene contact electrode for silicon carbide based ultraviolet photodetector

We present the fabrication and characterization of graphene-semiconductor-graphene ultraviolet photodetector based on the rectifying character of Schottky junction at the interface between epitaxial graphene and SiC semiconductor. As-grown single layer epitaxial graphene is interdigitated as transparent conductive electrode to probe photo-generated charge carriers in a semi-insulating 4H-SiC substrate. The fabricated device exhibits the typical current-voltage characteristics of a conventional metal-semiconductor-metal type photodetector with low leakage current. Time-resolved photocurrent measurements suggest an excellent photocurrent reversibility and high response speed of the device. The measurements performed for different illumination wavelengths showed that the sample reveals higher responsivity values when it is exposed to the light with 254 nm wavelength. The obtained results imply that epitaxial graphene can be used readily as transparent conductive electrode for SiC based optoelectronic device applications.

The effect of a SiC cap on the growth of epitaxial graphene on SiC in ultra high vacuum

We demonstrate a technique to produce thin graphene layers on C-face of SiC under ultra high vacuum conditions. A stack of two SiC substrates comprising a half open cavity at the interface is used to partially confine the depleted Si atoms from the sample surface during the growth. We observe that this configuration significantly slows the graphene growth to easily controllable rates on C-face SiC in UHV environment. Results of low-energy electron diffractometry and Raman spectroscopy measurements on the samples grown with stacking configuration are compared to those of the samples grown by using bare UHV sublimation process.

Cross-sectional scanning tunneling microscopy study on II-VI multilayer structures

Cross-sectional scanning tunneling microscopy is used to study in the atomic scale the structural properties of ZnSeTe∕ZnTe multiple quantum wells and N:ZnTe delta-doped structures. Some peculiar effects are found on the cleaved (110) ZnTe surface plane, which have not been observed in III–V semiconductors. In particular, cleavage induced monatomic wide vacancy chains are always present on the Te sublattice. Furthermore, the semiconductor surface is manipulated when certain positive voltages are applied to the sample. Regarding the heterostructures, the ZnSeTe∕ZnTe quantum wells are found to have abrupt interfaces and the Se concentration is determined to be significantly larger than the nominal value.

P3HT–graphene bilayer electrode for Schottky junction photodetectors

We have investigated the effect of a poly (3-hexylthiophene-2.5-diyl)(P3HT)-graphene bilayer electrode on the photoresponsivity characteristics of Si-based Schottky photodetectors. P3HT, which is known to be an electron donor and absorb light in the visible spectrum, was placed on CVD grown graphene by dip-coating method. The results of the UV-vis and Raman spectroscopy measurements have been evaluated to confirm the optical and electronic modification of graphene by the P3HT thin film. Current-voltage measurements of graphene/Si and P3HT-graphene/Si revealed rectification behavior confirming a Schottky junction formation at the graphene/Si interface. Time-resolved photocurrent spectroscopy measurements showed the devices had excellent durability and a fast response speed. We found that the maximum spectral photoresponsivity of the P3HT-graphene/Si photodetector increased more than three orders of magnitude compared to that of the bare graphene/Si photodetector. The observed increment in the photoresponsivity of the P3HT-graphene/Si samples was attributed to the charge transfer doping from P3HT to graphene within the spectral range between near-ultraviolet and near-infrared. Furthermore, the P3HT-graphene electrode was found to improve the specific detectivity and noise equivalent power of graphene/Si photodetectors. The obtained results showed that the P3HT-graphene bilayer electrodes significantly improved the photoresponsivity characteristics of our samples and thus can be used as a functional component in Si-based optoelectronic device applications.

The effect of adsorbates on the electrical stability of graphene studied by transient photocurrent spectroscopy

Adsorbate induced variations in the electrical conductivity of graphene layers with two different types of charge carriers are investigated by using the Transient Photocurrent Spectroscopy (TPS) measurement technique. In-vacuum TPS measurements taken for a duration of 5 ks revealed that the adsorption/desorption of atmospheric adsorbates leads to more than a 110% increment and a 45% decrement in the conductivity of epitaxial graphene (n-type) and chemical vapor deposition graphene (p-type) layers on semi-insulating silicon carbide (SiC) substrates, respectively. The graphene layers on SiC are encapsulated and passivated with a thin SiO2 film grown by the Pulsed Electron Deposition method. The measurements conducted for short periods and a few cycles showed that the encapsulation process completely suppresses the time dependent conductivity instability of graphene independent of its charge carrier type. The obtained results are used to construct an experimental model for identifying adsorbate related condu...

Few-layer MoS2 as nitrogen protective barrier

We report experimental and theoretical investigations of the observed barrier behavior of few-layer MoS2 against nitrogenation. Owing to its low-strength shearing, low friction coefficient, and high lubricity, MoS2 exhibits the demeanor of a natural N-resistant coating material. Raman spectroscopy is done to determine the coating capability of MoS2 on graphene. Surface morphology of our MoS2/graphene heterostructure is characterized by using optical microscopy, scanning electron microscopy, and atomic force microscopy. In addition, density functional theory-based calculations are performed to understand the energy barrier performance of MoS2 against nitrogenation. The penetration of nitrogen atoms through a defect-free MoS2 layer is prevented by a very high vertical diffusion barrier, indicating that MoS2 can serve as a protective layer for the nitrogenation of graphene. Our experimental and theoretical results show that MoS2 material can be used both as an efficient nanocoating material and as a nanoscale mask for selective nitrogenation of graphene layer.

Electron field emission from SiC nanopillars produced by using nanosphere lithography

Field emitter arrays of silicon carbide based nanopillars with high emitter density were fabricated by using a combination of nanosphere lithography and inductively coupled plasma reactive ion etching techniques. The electron field emission characteristics of the produced nanopillars with two different aspect ratios and geometries were investigated, and the obtained results were compared with each other. The authors found that unlike the samples containing low aspect ratio SiC nanopillars with blunt tip apex, the samples comprising high aspect ratio nanopillars with sharp tip apex generate greater emission currents under lower electric fields. The nanopillars with sharp tip apex produced field emission currents up to 240 μA/cm2 under 17.4 V/μm applied electric field, while the nanopillars with blunt tip apex produced an emission current of 70 μA/cm2. The electric fields required to obtain 10 μA/cm2 current density are found to be 9.1 and 7.2 V/μm for the nanopillars with blunt and sharp tip apex, respecti...