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Dive into the research topics where Chung-Heon Lee is active.

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Featured researches published by Chung-Heon Lee.


symposium on vlsi circuits | 2004

A 130nm 1.1V 143MHz SRAM-like embedded DRAM COMPILER with Dual Asymmetric bit line Sensing Scheme and quiet unselected IO scheme

K.J. Noh; Yun-Ho Choi; J.D. Joo; Min-Su Kim; J.H. Jung; J.J. Lim; Chung-Heon Lee; G.H. Kim; Moon-Gone Kim

A SRAM-like embedded DRAM compiler with 0.13um technology was designed using two novel circuit schemes. Firstly, Dual Asymmetric bit line Sensing Scheme is proposed to implement VDD bit line pre-charge scheme without any reference cells and half charge generator. Therefore, we overcame the risk of failure caused by defects in reference cells and simplified embodying VDD bit line pre-charge scheme, enjoying privileges of VDD bit line pre-charge scheme such as fast sensing speed (tRC:7ns, tAC:6.7ns in this work) and stable sensing operation at low voltage and low temperature. Secondly, we propose circuit idea for quiet unselected IO lines. Unselected IO lines are not developed by bit line data during READ/WRITE operation. This scheme has advantage in the architecture with wide IO and various IO multiplexing options like a memory compiler.


Proceedings of SPIE | 2017

Investigation on spin-on hard mask integration

Y. J. Park; Seungwook Shin; Yun-Jun Kim; Seung-Hyun Kim; Jaebum Lim; Sung Hwan Kim; Hyeonil Jung; Chung-Heon Lee; Miyeon Han; Sang-Hak Lim; Jeong Yun Yu

For fine patterning, there are two possible hard mask integration schemes: quad-layer and tri-layer systems. Due to the different structures and processes between quad- and tri- layer systems, each system needs specific chemical and physical properties of the hard mask. In this paper, we report the properties of the carbon-based spin-on hard mask (CSOH) candidates for various hard mask integrations.


Archive | 2014

Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

Hyun-Ji Song; Yun-Jun Kim; Go-Un Kim; Young-Min Kim; Hea-Jung Kim; Joon-Young Moon; Yo-Choul Park; Y. J. Park; You-Jung Park; Seungwook Shin; Yong-Woon Yoon; Chung-Heon Lee; Yoo-Jeong Choi; Seung-Hee Hong


Archive | 2015

Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns

Yoo-Jeong Choi; Yun-Jun Kim; Go-Un Kim; Young-Min Kim; Hea-Jung Kim; Joon-Young Moon; Yo-Choul Park; Y. J. Park; You-Jung Park; Hyun-Ji Song; Seungwook Shin; Yong-Woon Yoon; Chung-Heon Lee; Seung-Hee Hong


Archive | 2013

Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition

Yun-Jun Kim; Hyo-Young Kwon; Hea-Jung Kim; Chung-Heon Lee; Youn-Jin Cho; Yoo-Jeong Choi


Archive | 2012

MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION

Yun-Jun Kim; Hwan-Sung Cheon; Youn-Jin Cho; Yong-Woon Yoon; Chung-Heon Lee; Hyo-Young Kwon; Yoo-Jeong Choi


Archive | 2012

MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION

Yoo-Jeong Choi; Hyo-Young Kwon; Youn-Jin Cho; Yun-Jun Kim; Young-Min Kim; Yong-Woon Yoon; Chung-Heon Lee


Archive | 2012

Hard mask composition, method of forming pattern, and semiconductor integrated circuit device including pattern

Min-Soo Kim; Hwan-Sung Cheon; Jee-Yun Song; Young-Min Kim; Cheol-Ho Lee; Chung-Heon Lee


Archive | 2015

MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING THE MONOMER, AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION

Hea-Jung Kim; Sunghwan Kim; Younhee Nam; Yun-Jun Kim; Joon-Young Moon; Hyun-Ji Song; Yong-Woon Yoon; Chung-Heon Lee


Archive | 2013

Hard mask composition and method for forming pattern using same

Chul-ho Lee; You-Jung Park; Yong-Woon Yoon; Sung-Jae Lee; Youn-Jin Cho; Young-Min Kim; Chung-Heon Lee

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Sung-Jae Lee

Korea Institute of Science and Technology

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