Clive J. Oliphant

Thermally Induced Nano-Structural and Optical Changes of nc-Si:H Deposited by Hot-Wire CVD

We report on the thermally induced changes of the nano-structural and optical properties of hydrogenated nanocrystalline silicon in the temperature range 200–700 °C. The as-deposited sample has a high crystalline volume fraction of 53% with an average crystallite size of ~3.9 nm, where 66% of the total hydrogen is bonded as ≡Si–H monohydrides on the nano-crystallite surface. A growth in the native crystallite size and crystalline volume fraction occurs at annealing temperatures ≥400 °C, where hydrogen is initially removed from the crystallite grain boundaries followed by its removal from the amorphous network. The nucleation of smaller nano-crystallites at higher temperatures accounts for the enhanced porous structure and the increase in the optical band gap and average gap.

EBSD analysis of tungsten-filament carburization during the hot-wire CVD of multi-walled carbon nanotubes.

Filament condition during hot-wire chemical vapor deposition conditions of multi-walled carbon nanotubes is a major concern for a stable deposition process. We report on the novel application of electron backscatter diffraction to characterize the carburization of tungsten filaments. During the synthesis, the W-filaments transform to W2C and WC. W-carbide growth followed a parabolic behavior corresponding to the diffusion of C as the rate-determining step. The grain size of W, W2C, and WC increases with longer exposure time and increasing filament temperature. The grain size of the recrystallizing W-core and W2C phase grows from the perimeter inwardly and this phenomenon is enhanced at filament temperatures in excess of 1,400°C. Cracks appear at filament temperatures >1,600°C, accompanied by a reduction in the filament operational lifetime. The increase of the W2C and recrystallized W-core grain size from the perimeter inwardly is ascribed to a thermal gradient within the filament, which in turn influences the hardness measurements and crack formation.

Structural evolution of a Ta-filament during hot-wire chemical vapour deposition of Silicon investigated by electron backscatter diffraction

We report on the application of electron backscatter diffraction to investigate the structural changes of a tantalum filament operated at typical hot-wire chemical vapour deposition conditions for the synthesis of hydrogenated nanocrystalline silicon. Various tantalum-silicides, identified by electron backscatter diffraction, form preferentially along the length of the filament. The filament has a recrystallized Ta inner core and a TaSi2 layer encapsulated with a Si layer at the cooler ends. The αTa5Si3, metastable Ta5Si3 and Ta2Si phases formed in addition to recrystallized Ta and TaSi2 at the centre regions. Cracks and porosity were prevalent throughout the length of the filament. The microstructural evolution of the aged tantalum filament can be ascribed to the thermal gradient along the filament length, recrystallization of Ta and the variation of silicon content within the filament.

Effect of additional electron acceptor in hybrid P3HT:PCBM:ZnO spin-coated films for photovoltaic application: Effect of additional electron acceptor in hybrid P3HT:PCBM:ZnO spin-coated films

Copyright: 2016 Wiley. Due to copyright restrictions, the attached PDF file only contains the abstract of the full text item. For access to the full text item, kindly consult the publishers website.

Oxidation Reduction in Nanocrystalline Silicon Grown by Hydrogen-Profiling Technique

The deposition of a compact amorphous silicon/nano-crystalline silicon material is demonstrated by hot-wire chemical vapour deposition using a sequential hydrogen profiling technique at low hydrogen dilutions. Nano-crystallite nucleation occurs at the substrate interface that develops into a uniform, porous crystalline structure as the growth progresses. A further reduction in the H-dilution results in the onset of a dense amorphous silicon layer. The average crystalline volume fraction and nano-crystallite size in the sample bulk amounts to 30% and 6 nm, respectively, as probed by Raman spectroscopy using the 647 nm excitation. The change in hydrogen dilution is accompanied by a graded hydrogen concentration depth-profile, where the hydrogen concentration decreases as the growth progresses. The level of post-deposition oxidation is considerably reduced, as inferred from infrared spectroscopy. The presence of oxygen is mainly confined to the substrate interface as a result of thermal oxidation during thin film growth.