D. B. Chrisey

Electrical, optical, and structural properties of indium-tin-oxide thin films for organic light-emitting devices

High-quality indium–tin–oxide (ITO) thin films (200–850 nm) have been grown by pulsed laser deposition (PLD) on glass substrates without a postdeposition annealing treatment. The structural, electrical, and optical properties of these films have been investigated as a function of target composition, substrate deposition temperature, background gas pressure, and film thickness. Films were deposited from various target compositions ranging from 0 to 15 wt % of SnO2 content. The optimum target composition for high conductivity was 5 wt % SnO2+95 wt % In2O3. Films were deposited at substrate temperatures ranging from room temperature to 300 °C in O2 partial pressures ranging from 1 to 100 mTorr. Films were deposited using a KrF excimer laser (248 nm, 30 ns full width at half maximum) at a fluence of 2 J/cm2. For a 150-nm-thick ITO film grown at room temperature in an oxygen pressure of 10 mTorr, the resistivity was 4×10−4 Ω cm and the average transmission in the visible range (400–700 nm) was 85%. For a 170-n...

Transparent conducting aluminum-doped zinc oxide thin films for organic light-emitting devices

Aluminum-doped zinc oxide (AZO) thin films (∼3000 A) with low electrical resistivity and high optical transparency have been grown by pulsed-laser deposition on glass substrates without a postdeposition anneal. Films were deposited at substrate temperatures ranging from room temperature to 400 °C in O2 partial pressures ranging from 0.1 to 50 mTorr. For 3000-A-thick AZO films grown at room temperature in an oxygen pressure of 5 mTorr, the electrical resistivity was 8.7×10−4 Ω cm and the average optical transmittance was 86% in the visible range (400–700 nm). For 3000-A-thick AZO films deposited at 200 °C in 5 mTorr of oxygen, the resistivity was 3.8×10−4 Ω cm and the average optical transmittance in the visible range was 91%. AZO films grown at 200 °C were used as an anode contact for organic light-emitting diodes. The external quantum efficiency measured from these devices was about 0.3% at a current density of 100 A/m2.

Indium tin oxide thin films for organic light-emitting devices

High-quality indium tin oxide (ITO) thin films (150–200 nm) were grown on glass substrates by pulsed laser deposition (PLD) without postdeposition annealing. The electrical, optical, and structural properties of these films were investigated as a function of substrate temperature, oxygen pressure, and film thickness. PLD provides very uniform ITO films with high transparency (⩾85% in 400–700 nm spectrum) and low electrical resistivity (2–4×10−4 Ω cm). The Hall mobility and carrier density for a 170-nm-thick film deposited at 300 °C are 29 cm2/V s and 1.45×1021 cm−3, respectively. Atomic force microscopy measurements of the ITO films indicated that their root-mean-square surface roughness (∼5 A) is superior to that (∼40 A) of commercially available ITO films deposited by sputtering. ITO films grown at room temperature by PLD were used to study the electroluminescence (EL) performance of organic light-emitting devices. The EL performance was comparable to that measured with commercial ITO anodes.

Effect of aluminum doping on zinc oxide thin films grown by pulsed laser deposition for organic light-emitting devices

Transparent conducting aluminum-doped zinc oxide (AZO) thin films have been deposited on glass substrates by pulsed laser deposition. The structural, electrical and optical properties of these films were investigated as a function of Al-doping amount (0–4 wt.%) in the target. Films were deposited at a substrate temperature of 200°C in 0.67 Pa of oxygen pressure. It was observed that 0.8-wt.% of Al is the optimum doping amount in the target to achieve the minimum film resistivity and the maximum film transmission. For the 300-nm thick AZO film deposited using a ZnO target with an Al content of 0.8 wt.%, the electrical resistivity was 3.7×10−4 Ω-cm and the average transmission in the visible range (400–700 nm) was 90%. The AZO films grown by PLD were used as transparent anodes to fabricate organic light-emitting diodes. The device performance was measured and an external quantum efficiency of 0.3% was measured at a current density of 100 A/m2.

Microwave properties of tetragonally distorted (Ba0.5Sr0.5)TiO3 thin films

A strong correlation is observed between the structure and the microwave dielectric properties of epitaxial Ba0.5Sr0.5TiO3 (BST) thin films deposited onto (001) MgO by pulsed laser deposition. Films were deposited at 750 °C in an oxygen pressure that was varied from 3 to 1000 mTorr. The tetragonal distortion (ratio of in-plane and surface normal lattice parameters, D=a/c) of the films depends on the oxygen deposition pressure. D varied from 0.996 at 3 mTorr to 1.003 at 800 mTorr. At microwave frequencies (1–20 GHz), BST films with low distortion have higher dielectric constants (e∼500), and lower dielectric loss (tan δ∼0.02) compared to films with higher distortion. The correlation of the microwave properties with the film structure can be attributed to stresses and polarizability in the film. The BST film grown at the oxygen deposition pressure of 50 mTorr exhibits a large dielectric constant change and a low dielectric loss at the same time, which corresponds to the film in low stress (D=1.0004). For tu...

The effect of annealing on the microwave properties of Ba0.5Sr0.5TiO3 thin films

Oriented, single phase thin films (∼5000 A thick) of Ba0.5Sr0.5TiO3 (BST) have been deposited onto (100) MgO and (100) LaAlO3 (LAO) substrates using pulsed laser deposition. The capacitance and dielectric Q (1/tan δ) of as-deposited and annealed films have been measured from 1 to 20 GHz as a function of electric field (0–80 kV/cm) at room temperature using interdigitated Ag electrodes deposited on top of the film. For films deposited onto MgO, it is observed that, after a postdeposition anneal (1000–1200 °C), the dielectric constant decreases and the dielectric Q increases. For films deposited onto LAO, a postdeposition anneal (⩽ 1000 °C) resulted in a significant increase in the dielectric constant and a decrease in Q. The observed dielectric properties of the BST films are attributed to the changes in film stress, which affects the extent of ionic polarization.

THE EFFECT OF ANNEALING ON THE STRUCTURE AND DIELECTRIC PROPERTIES OF BAXSR1-XTIO3 FERROELECTRIC THIN FILMS

The effect of a postdeposition anneal on the structure and dielectric properties of epitaxial BaxSr1−xTiO3 (BST) thin films (x=0.35–0.65) have been measured. The films were grown by pulsed laser deposition on LaAlO3 (001) substrates. The films were single phase and (001) oriented with a lattice parameter larger than the bulk. The dielectric properties of the x=0.35 film exhibited a broad temperature dependence and a peak at 168 K, which is 36 K below the peak observed in bulk BST (x=0.35). Annealing films for 8 h in flowing oxygen at 900 °C caused the lattice parameter to decrease and dielectric properties to become more like the bulk. Annealing also resulted in an increased electric field dependent dielectric tuning without increased dielectric loss.

Effect of film thickness on the properties of indium tin oxide thin films

Transparent conducting indium tin oxide (ITO) thin films (40–870 nm) were grown by pulsed laser deposition on amorphous substrates and the structural, electrical, and optical properties of these films were investigated. Films were deposited using a KrF excimer laser (248 nm, 30 ns FWHM) at a fluence of 2 J/cm2, at substrate temperature of 300 °C and 10 mTorr of oxygen pressure. For ITO films (30–400 nm thickness) deposited at 300 °C in 10 mTorr of oxygen, a resistivity of 1.8–2.5×10−4 Ω cm was observed and the average transmission in the visible range (400–700 nm) was about 85%–90%. The Hall mobility and carrier density for ITO films (40–870 nm thickness) were observed to be in the range of 24–27 cm2/V s and 8–13×1020 cm−3, respectively. The ITO films have been used as the anode contact in organic light emitting diodes and the effect of ITO film thickness on the device performance has been studied. The optimum thickness of the ITO anode for the maximum device efficiency was observed to be about 60–100 nm....

High-temperature thermopower in La2/3Ca1/3MnO3 films: Evidence for polaronic transport.

Thermoelectric power, electrical resistivity, and magnetization experiments, performed in the paramagnetic phase of La{sub 2/3}Ca{sub 1/3}MnO{sub 3}, provide evidence for polaron-dominated conduction in colossal magnetoresistance materials. At high temperatures, a large, nearly-field-independent difference between the activation energies for resistivity {rho} and thermopower {ital S}, a characteristic of Holstein polarons, is observed, and ln{rho} ceases to scale with the magnetization. On approaching {ital T}{sub {ital c}}, both energies become field dependent, indicating that the polarons are magnetically polarized. Below {ital T}{sub {ital c}}, the thermopower follows a law {ital S}({ital H}){approximately}1/{rho}({ital H}) as in nonsaturated ferromagnetic metals. {copyright} {ital 1996 The American Physical Society.}

Indium tin oxide thin films grown on flexible plastic substrates by pulsed-laser deposition for organic light-emitting diodes

Transparent conducting indium tin oxide (ITO) thin films were grown by pulsed laser deposition (PLD) on flexible polyethylene terephthalate (PET) substrates. The structural, electrical, and optical properties of these films were investigated as a function of substrate deposition temperature and background gas pressure. ITO films (200 nm thick), deposited by PLD on PET at 25 °C and 45 mTorr of oxygen, exhibit high optical transparency (∼87%) in the visible (400–700 nm) with a low electrical resistivity of 7×10−4 Ω cm. ITO films grown by PLD on PET were used as the anode contact in organic light-emitting devices. A luminous power efficiency of ∼1.6 lm/W was achieved at 100 cd/m2, slightly higher than that (∼1.5 lm/W) measured for the control device based on a sputter-deposited ITO on glass.