Daniel A. Steigerwald

A study of parasitic reactions between NH 3 and TMGa or TMAl

The growth of AlGaN using organometallic vapor phase epitaxy has been studied as a function of reactor pressure in a horizontal reactor. At atmospheric pressure, GaN with growth efficiency comparable to that of GaAs in the same reactor is obtained. In addition, the GaN growth efficiency changes little at different reactor pressures. These results indicate that the parasitic reaction between TMGa and NH3 is not substantial in the reactor used in this study. On the other hand, A1N growth at atmospheric pressure has not been possible. By lowering the reactor pressure below 250 Torr, A1N deposition is achieved. However, the growth efficiency decreases at higher reactor pressures and higher growth temperatures, indicating that a strong parasitic reaction occurs between TMAI and NH3. For the ternary AlGaN, lower pressure also leads to more Al incorporation. The results indicate that parasitic reactions are much more severe for TMAI+NH3 than for TMGa+NH3.

Hall-effect characterization of III–V nitride semiconductors for high efficiency light emitting diodes

Abstract Variable-temperature Hall-effect measurements were employed to optimize doping for GaN layers utilized in blue, blue-green and green light emitting diodes (LEDs). N-type doping was accomplished by doping with Si, Ge, and O, and the electronic properties of these donors were studied. Si and Ge, which substitute for Ga, are shallow donors with almost identical activation energies for ionization (ca. 17 and ca. 19 meV, respectively, for a donor concentration of ca. 3×10 17 cm −3 ). O substitutes for N and introduces a slightly deeper donor level into the bandgap of GaN having an activation energy of ca. 29 meV (for a donor concentration of ca. 1×10 18 cm −3 ). Mg doping was employed to achieve p-type conductivity for GaN device layers. Mg substitutes for Ga introducing a relatively deep acceptor level. For the analysis of the variable-temperature Hall-effect data, it was found important to take the coulomb interaction between ionized acceptors into account, leading to lower activation energy with increasing degree of ionization (increasing temperature). The activation energy for ionization of Mg acceptors in GaN was thus estimated to be (208±6) meV for very low acceptor concentrations. Using optimized nitride layers, LEDs with typical external quantum efficiencies of ca. 10% in the blue and blue-green, and ca. 8% in the green wavelength range were achieved. Due to optimized doping, the forward voltages for these diodes were as low as 3.2 V at 20 mA drive current.

III–V Nitride semiconductors for high-performance blue and green light-emitting devices

Most of the rapid developments in (AlIn)GaN alloy system technology have occurred within the past few years, and the technology is still moving at a fast pace. New performance records for light-emitting diodes and laser diodes are constantly being reported. This article highlights the progression of the development of the (AlIn)GaN alloy system and describes the fabrication and performance of some of the light-emitting devices that have been produced to date.