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Daniel Towery

Honeywell

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Publication

Featured researches published by Daniel Towery.

Archive | 2001

Composition for chemical mechanical planarization of copper, tantalum and tantalum nitride

Fan Zhang; Daniel Towery; Joseph A. Levert; Shyama Mukherjee

Archive | 2000

COMPOSITIONS AND PROCESSES FOR SPIN ETCH PLANARIZATION

Joseph A. Levert; Daniel Towery

Archive | 1998

Method for cleaning semiconductor wafers containing dielectric films

Anna M. George; Daniel Towery

Archive | 2000

Method for integrated circuit planarization

Joseph A. Levert; Daniel Towery; Denis H. Endisch

Archive | 2001

Apparatus and methods for integrated circuit planarization

Joseph A. Levert; Daniel Towery; Denis H. Endisch

Archive | 1999

A method for cleaning organic dielectric film containing semiconductor wafers

Anna M. George; Daniel Towery

Archive | 2000

Improved apparatus and methods for integrated circuit planarization

Denis H. Endish; Daniel Towery; Joseph A. Levert; James S. Drage

Archive | 2001

Chemical-hydrodynamic etch planarization

Joseph A. Levert; Daniel Towery; Fan Zhang

Archive | 2005

Zusammensetzung für das chemisch-mechanisch planarisieren (cmp) von kupfer, tantal und tantal nitrid

Fan Zhang; Daniel Towery; Joseph A. Levert; Shyama Mukherjee

Archive | 2001

Planarisation par attaque chimico-hydrodynamique

Joseph A. Levert; Daniel Towery; Fan Zhang

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Collaboration

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Joseph A. Levert

State University of New York System

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Fan Zhang

Honeywell

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Shyama Mukherjee

Honeywell

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Anna M. George

Honeywell

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Denis H. Endisch

Honeywell

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