David G. Shaw

Use of A New High Speed Acrylate Deposition Process to Make Novel Multilayer Structures

A new process has been developed to deposit acrylate thin films at speeds of 1500 ft/minute or higher. These films range in thickness from a few hundred Angstroms to a fewmicrons and are uniform in thickness to within 5%. They can vary in refractive index from 1.35 to 1.60 and have mechanical properties from very hard and abrasion resistantto very soft and flexible. The acrylate deposition process was originally developed for multilayer acrylate/aluminum capacitors where over 10,000 layer structures were produced[l]. The process is compatible with other vapor deposition processes such as sputtering, evaporation, and CVD. Both processes can take place at the same time in the same vacuum chamber toproduce various multilayer structures. This paper will discuss some of the features of this process and the associated equipment. It will present examples of the wide range of acrylate/acrylate, acrylate/metal, and acrylate/inorganic material structures that can be made. It will discuss various applications for these structures.