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Dive into the research topics where Denis Kurapov is active.

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Featured researches published by Denis Kurapov.


Journal of Applied Physics | 2014

Effect of oxygen incorporation on the structure and elasticity of Ti-Al-O-N coatings synthesized by cathodic arc and high power pulsed magnetron sputtering

Marcus Hans; M. to Baben; Denis Music; J. Ebenhöch; Daniel Primetzhofer; Denis Kurapov; Mirjam Arndt; Helmut Rudigier; Jochen M. Schneider

Ti-Al-O-N coatings were synthesized by cathodic arc and high power pulsed magnetron sputtering. The chemical composition of the coatings was determined by means of elastic recoil detection analysis and energy dispersive X-ray spectroscopy. The effect of oxygen incorporation on the stress-free lattice parameters and Youngs moduli of Ti-Al-O-N coatings was investigated by X-ray diffraction and nanoindentation, respectively. As nitrogen is substituted by oxygen, implications for the charge balance may be expected. A reduction in equilibrium volume with increasing O concentration is identified by X-ray diffraction and density functional theory calculations of Ti-Al-O-N supercells reveal the concomitant formation of metal vacancies. Hence, the oxygen incorporation-induced formation of metal vacancies enables charge balancing. Furthermore, nanoindentation experiments reveal a decrease in elastic modulus with increasing O concentration. Based on ab initio data, two causes can be identified for this: First, the metal vacancy-induced reduction in elasticity; and second, the formation of, compared to the corresponding metal nitride bonds, relatively weak Ti-O and Al-O bonds.


Journal of Vacuum Science and Technology | 2007

Influence of the normalized ion flux on the constitution of alumina films deposited by plasma-assisted chemical vapor deposition

Denis Kurapov; Jennifer Reiss; David Huy Trinh; Lars Hultman; Jochen M. Schneider

Alumina thin films were deposited onto tempered hot working steel substrates from an AlCl3–O2–Ar–H2 gas mixture by plasma-assisted chemical vapor deposition. The normalized ion flux was varied during deposition through changes in precursor content while keeping the cathode voltage and the total pressure constant. As the precursor content in the total gas mixture was increased from 0.8% to 5.8%, the deposition rate increased 12-fold, while the normalized ion flux decreased by approximately 90%. The constitution, morphology, impurity incorporation, and the elastic properties of the alumina thin films were found to depend on the normalized ion flux. These changes in structure, composition, and properties induced by normalized ion flux may be understood by considering mechanisms related to surface and bulk diffusion.


Scientific Reports | 2017

Crystallite size-dependent metastable phase formation of TiAlN coatings

Marcus Hans; Denis Music; Yen-Ting Chen; Lena Patterer; Anders Eriksson; Denis Kurapov; Jürgen Ramm; Mirjam Arndt; Helmut Rudigier; Jochen M. Schneider

It is well known that surface energy differences thermodynamically stabilize nanocrystalline γ-Al2O3 over α-Al2O3. Here, through correlative ab initio calculations and advanced material characterization at the nanometer scale, we demonstrate that the metastable phase formation of nanocrystalline TiAlN, an industrial benchmark coating material, is crystallite size-dependent. By relating calculated surface and volume energy contributions to the total energy, we predict the chemical composition-dependent phase boundary between the two metastable solid solution phases of cubic and wurzite Ti1−xAlxN. This phase boundary is characterized by the critical crystallite size dcritical. Crystallite size-dependent phase stability predictions are in very good agreement with experimental phase formation data where x was varied by utilizing combinatorial vapor phase condensation. The wide range of critical Al solubilities for metastable cubic Ti1−xAlxN from xmax = 0.4 to 0.9 reported in literature and the sobering disagreement thereof with DFT predictions can at least in part be rationalized based on the here identified crystallite size-dependent metastable phase formation. Furthermore, it is evident that predictions of critical Al solubilities in metastable cubic TiAlN are flawed, if the previously overlooked surface energy contribution to the total energy is not considered.


Applied Physics A | 2005

Effect of ion irradiation during deposition on the structure of alumina thin films grown by plasma assisted chemical vapour deposition

O. Kyrylov; Denis Kurapov; Jochen M. Schneider


Steel Research International | 2004

Thixoforming/semi-solid forming : Characterization of steel thixoforming tool materials by high temperature compression tests

Reiner Kopp; Hideki Shimahara; Jochen M. Schneider; Denis Kurapov; Rainer Telle; Simon Münstermann; Erich Lugscheider; Kirsten Bobzin; M. Maes


Steel Research International | 2004

Thixoforming/semi-solid forming : Adhesion and thermal shock resistance of Al2O3 thin films deposited by PACVD for die protection in semi-solid processing of steel

Denis Kurapov; Jochen M. Schneider


Vacuum | 2002

Synthesis and mechanical properties of BCN coatings deposited by PECVD

Denis Kurapov; Dieter Neuschütz; R. Cremer; T Pedersen; Matthias Wuttig; D Dietrich; G Marx; Jochen M. Schneider


Surface & Coatings Technology | 2016

Substrate rotation-induced chemical modulation in Ti-Al-O-N coatings synthesized by cathodic arc in an industrial deposition plant

Marcus Hans; Moritz to Baben; Yen-Ting Chen; Konda Gokuldoss Pradeep; Damian M. Holzapfel; Daniel Primetzhofer; Denis Kurapov; Juergen Ramm; Mirjam Arndt; Helmut Rudigier; Jochen M. Schneider


Plasma Chemistry and Plasma Processing | 2005

Structure, Composition, Mechanical, and Tribological Properties of BCN Films Deposited by Plasma Enhanced Chemical Vapor Deposition

Denis Kurapov; Jochen M. Schneider


Archive | 2007

METHOD FOR MANUFACTURING A TREATED SURFACE AND VACUUM PLASMA SOURCES

Juergen Ramm; Beno Widrig; Denis Kurapov

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Marcus Hans

RWTH Aachen University

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Denis Music

RWTH Aachen University

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D Dietrich

Chemnitz University of Technology

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