Dennis Lehr

A generalized Kerker condition for highly directive nanoantennas

A nanoantenna with balanced electric and magnetic dipole moments, known as the first Kerker condition, exhibits a directive radiation pattern with zero backscattering. In principle, a nanoantenna can provide even better directionality if higher order moments are properly balanced. Here, we study a generalized Kerker condition in the example of a nanoring nanoantenna supporting electric dipole and electric quadrupole moments. Nanoring antennas are well suited since both multipole moments can be almost independently tuned to meet the generalized Kerker condition.

Circular Dichroism from Chiral Nanomaterial Fabricated by On‐Edge Lithography

A novel-shaped plasmonic chiral nanomaterial exhibiting circular dichroism in the near-infrared spectral range is presented. Applying on-edge lithography, a large area with these nanostructures is efficiently covered. This fabrication method offers tunability of the operation bandwidth by tailoring the chiral shape.

Enhancing Second Harmonic Generation in Gold Nanoring Resonators Filled with Lithium Niobate

Plasmonic nanorings provide the unique advantage of a pronounced plasmonic field enhancement inside their core. If filled with a polarizable medium, it may significantly enhance its optical effects. Here, we demonstrate this proposition by filling gold nanorings with lithium niobate. The generated second harmonic signal is compared to the signal originating from an unpatterned lithium niobate surface. Measurements and simulation confirm an enhancement of about 20. Applications requiring nanoscopic localized light sources like fluorescence spectroscopy or quantum communication will benefit from our findings.

Plasmonic properties of aluminum nanorings generated by double patterning

In this Letter we evaluate a technique for the efficient and flexible generation of aluminum nanorings based on double patterning and variable shaped electron beam lithography. The process is demonstrated by realizing nanorings with diameters down to 90 nm and feature sizes of 30 nm utilizing a writing speed of one ring per microsecond. Because of redepositions caused by involved etching processes, the material of the rings and, therefore, the impact on the plasmonic properties, are unknown. This issue, which is commonly encountered when metals are nanostructured, is solved by adapting a realistic simulation model that accounts for geometry details and effective material properties. Based on this model, the redepositions are quantified, the plasmonic properties are investigated, and a design tool for the very general class of nanofabrication techniques involving the etching of metals is provided.

Optimization and characterization of a highly-efficient diffraction nanograting for MHz XUV pulses.

We designed, fabricated and characterized a nano-periodical highly-efficient blazed grating for extreme-ultraviolet (XUV) radiation. The grating was optimized by the rigorous coupled-wave analysis method (RCWA) and milled into the top layer of a highly-reflective mirror for IR light. The XUV diffraction efficiency was determined to be around 20% in the range from 35.5 to 79.2 nm. The effects of the nanograting on the reflectivity of the IR light and non-linear effects introduced by the nanograting have been measured and are discussed.

Elevating optical activity: Efficient on-edge lithography of three-dimensional starfish metamaterial

We present an approach for extremely fast, wafer-scale fabrication of chiral starfish metamaterials based on electron beam- and on-edge lithography. A millimeter sized array of both the planar chiral and the true 3D chiral starfish is realized, and their chiroptical performances are compared by circular dichroism measurements. We find optical activity in the visible and near-infrared spectral range, where the 3D starfish clearly outperforms the planar design by almost 2 orders of magnitude, though fabrication efforts are only moderately increased. The presented approach is capable of bridging the gap between high performance optical chiral metamaterials and industrial production by nanoimprint technology.

Simulating different manufactured antireflective sub-wavelength structures considering the influence of local topographic variations

Laterally structured antireflective sub-wavelength structures show unique properties with respect to broadband performance, damage threshold and thermal stability. Thus they are superior to classical layer based antireflective coatings for a number of applications. Dependent on the selected fabrication technology the local topography of the periodic structure may deviate from the perfect repetition of a sub-wavelength unit cell. We used rigorous coupled-wave analysis (RCWA) to simulate the efficiency losses due to scattering effects based on height and displacement variations between the individual protuberances. In these simulations we chose conical and Super-Gaussian shapes to approximate the real profile of fabricated structures. The simulation results are in accordance with the experimentally determined optical properties of sub-wavelength structures over a broad wavelength range. Especially the transmittance reduction in the deep-UV could be ascribed to these variations in the sub-wavelength structures.

Fabrication influences on deep-ultraviolet tungsten wire grid polarizers manufactured by double patterning.

Substantial discrepancies are commonly observed when comparing the predicted and measured optical performance of deep-ultraviolet tungsten wire grid polarizers. Particularly, the extinction ratio is strongly impaired. Therefore, we investigate major differences between assumed and actual achieved properties regarding geometry and material of the grating structure as the origin of theses discrepancies. We find an improvement potential for the extinction ratio of one order of magnitude by improving the material and a factor of four by improving the geometry. Our results allow for a purposeful revision of fabrication processes and will therefore significantly contribute to the improvement of deep-ultraviolet wire grid polarizers.

Antireflective subwavelength structures on microlens arrays—comparison of various manufacturing techniques

Antireflective subwavelength structures (ARS) resembling nanostructures found on the cornea of night-active insects reduce the reflection of light by providing a gradual change in the refractive index at the interface. These artificial ARS have mainly been fabricated by a combination of conventional lithography and reactive ion etching, which constrains their application to planar substrates. We report on the fabrication of ARS using three different techniques including bottom-up and top-down methods as well as their combination on microlens arrays (MLAs) made of fused silica. The optical performance of the resulting ARS on the MLAs is as good as ARS fabricated on planar substrates with increased transmission of up to 96% at certain wavelengths.

Transmission enhanced optical lenses with self-organized antireflective subwavelength structures for the UV range

We present transmission increased fused silica lenses produced by using self-organized antireflective structures for which we developed an efficient manufacturing process. The spectral transmission measured over the whole lens aperture shows a significant transmission enhancement of up to 3.5% in the UV range. Local measurements on the lenss surface reveal a strongly reduced reflection of below 0.1% for 300 nm wavelength, which is homogeneous over the whole lens. Further, the lenses show a broadband spectral antireflection behavior. For 600 nm wavelength the reflection was measured at about 1%.