Diana L. Huffaker

Strain relief by periodic misfit arrays for low defect density GaSb on GaAs

We demonstrate the growth of a low dislocation density, relaxed GaSb bulk layer on a (001) GaAs substrate. The strain energy generated by the 7.78% lattice mismatch is relieved by a periodic array of 90° misfit dislocations. The misfit array is localized at the GaSb∕GaAs interface and has a period of 5.6nm which is determined by transmission electron microscope images. No threading dislocations are visible. The misfits are identified as 90°, rather than 60°, using Burger’s circuit analysis, and are therefore not associated with generation of threading dislocations. A low dislocation density and planar growth mode is established after only 3 monolayers of GaSb deposition as revealed by reflection high-energy electron diffraction patterns. Calculations corroborate the materials characterization and indicate the strain energy generated by the 7.78% lattice mismatch is almost fully dissipated by the misfit array. The low dislocation density bulk GaSb material on GaAs enabled by this growth mode will lead to new devices, especially in the infrared regime, along with novel integration schemes.We demonstrate the growth of a low dislocation density, relaxed GaSb bulk layer on a (001) GaAs substrate. The strain energy generated by the 7.78% lattice mismatch is relieved by a periodic array of 90° misfit dislocations. The misfit array is localized at the GaSb∕GaAs interface and has a period of 5.6nm which is determined by transmission electron microscope images. No threading dislocations are visible. The misfits are identified as 90°, rather than 60°, using Burger’s circuit analysis, and are therefore not associated with generation of threading dislocations. A low dislocation density and planar growth mode is established after only 3 monolayers of GaSb deposition as revealed by reflection high-energy electron diffraction patterns. Calculations corroborate the materials characterization and indicate the strain energy generated by the 7.78% lattice mismatch is almost fully dissipated by the misfit array. The low dislocation density bulk GaSb material on GaAs enabled by this growth mode will lead to n...

Improved device performance of InAs/GaAs quantum dot solar cells with GaP strain compensation layers

We report optical, electrical, and spectral response characteristics of three-stack InAs∕GaAs quantum dot solar cells with and without GaP strain compensation (SC) layers. The short circuit current density, open circuit voltage, and external quantum efficiency of these cells under air mass 1.5G at 290mW∕cm2 illumination are presented and compared with a GaAs control cell. The cells with SC layers show superior device quality, confirmed by I-V and spectral response measurements. The quantum dot solar cells show an extended photoresponse compared to the GaAs control cell. The effect of the SC layer thickness on device performance is also presented.

GaSb∕GaAs type II quantum dot solar cells for enhanced infrared spectral response

The authors report an enhanced infrared spectral response of GaAs-based solar cells that incorporate type II GaSb quantum dots (QDs) formed using interfacial misfit array growth mode. The material and devices, grown by molecular beam epitaxy, are characterized by current-voltage and spectral response characteristics. From 0.9to1.36μm, these solar cells show significantly more infrared response compared to reference GaAs cells and previously reported InAs QD solar cells. The short circuit current density and open circuit voltages of solar cells with and without dots measured under identical conditions are 1.29mA∕cm2, 0.37V and 1.17mA∕cm2, 0.6V, respectively.

Patterned radial GaAs nanopillar solar cells.

Photovoltaic devices using GaAs nanopillar radial p-n junctions are demonstrated by means of catalyst-free selective-area metal-organic chemical vapor deposition. Dense, large-area, lithographically defined vertical arrays of nanowires with uniform spacing and dimensions allow for power conversion efficiencies for this material system of 2.54% (AM 1.5 G) and high rectification ratio of 213 (at ±1 V). The absence of metal catalyst contamination results in leakage currents of ∼236 nA at -1 V. High-resolution scanning photocurrent microscopy measurements reveal the independent functioning of each nanowire in the array with an individual peak photocurrent of ∼1 nA at 544 nm. External quantum efficiency shows that the photocarrier extraction highly depends on the degenerately doped transparent contact oxide. Two different top electrode schemes are adopted and characterized in terms of Hall, sheet resistance, and optical transmittance measurements.

III/V ratio based selectivity between strained Stranski-Krastanov and strain-free GaSb quantum dots on GaAs

The authors demonstrate and characterize type-II GaSb quantum dot (QD) formation on GaAs by either Stranski-Krastanov (SK) or interfacial misfit (IMF) growth mode. The growth mode selection is controlled by the gallium to antimony (III/V) ratio where a high III/V ratio produces IMF and a low ratio establishes the SK growth mode. The IMF growth mode produces strain-relaxed QDs, where the SK QDs remain highly strained. Both ensembles demonstrate strong room temperature photoluminescence (PL) with the SK QDs emitting at 1180nm and the IMF QDs emitting at 1375nm. Quantized energy levels along with a spectral blueshift are observed in 77K PL. Transmission electron microscope images identify the IMF array and crystallographic shape for both types of QD formation. Atomic force microscope images characterize QD geometry and density.

Formation trends in quantum dot growth using metalorganic chemical vapor deposition

We discuss the results of a growth matrix designed to produce high quantum dot (QD) density, defect-free QD ensembles, which emit at 1.3 μm using metalorganic chemical vapor deposition (MOCVD). In our study, we balance the nucleation rate and adatom surface migration to achieve high surface densities (1×1011 dots/cm2) and avoid QD coalescence or defects that commonly characterize MOCVD-grown QD ensembles designed for longer wavelength emission. Room-temperature photoluminescence (PL) spectra from corresponding surface QDs depend on QD size and density and show an emission wavelength up to 1600 nm. Ground-state PL from capped QDs is measured at 1.38 μm with a 40 meV linewidth. We demonstrate the ground-state 1.3 μm electroluminescence from a QD light-emitting diode structure grown on n-type GaAs.

Growth mechanisms of highly mismatched AlSb on a Si substrate

We describe the growth mechanisms of highly mismatched (Δao∕ao=13%) defect-free AlSb on Si(001) substrates. Nucleation occurs during the first few monolayers of AlSb deposition by crystalline quantum dot formation. With continued growth, the islands coalesce into a bulk material with no vertically propagating defects. Strain energy from the AlSb∕Si interface is dissipated by crystallographic undulations in the zinc-blende lattice, as confirmed by high-resolution transmission electron microscopy (TEM) images. Reciprocal space analysis of the TEM images corroborates a crystallographic rotation associated with the undulations. The resulting AlSb material is >98% relaxed according to x-ray diffraction analysis.

2.0 μm wavelength InAs quantum dashes grown on a GaAs substrate using a metamorphic buffer layer

We describe optical and structure characteristics of InAs quantum dashes grown on a GaAs substrate using an AlGaAsSb metamorphic buffer. The metamorphic buffer increases the lattice constant of the growth matrix from 5.653 to 5.869 A. The increased lattice constant of the growth matrix yields a lattice mismatch with the InAs active region of only 3.2% and accommodates a large In content to access emission wavelengths >2.0 μm. From our comparison with quantum dot structures, we conclude that the elongated quantum dash formation is due to asymmetric surface bonds in the zinc blende crystal structure that control surface migration in low strain conditions.

Bottom-up Photonic Crystal Lasers

The directed growth of III-V nanopillars is used to demonstrate bottom-up photonic crystal lasers. Simultaneous formation of both the photonic band gap and active gain region is achieved via catalyst-free selective-area metal-organic chemical vapor deposition on masked GaAs substrates. The nanopillars implement a GaAs/InGaAs/GaAs axial double heterostructure for accurate, arbitrary placement of gain within the cavity and lateral InGaP shells to reduce surface recombination. The lasers operate single-mode at room temperature with low threshold peak power density of ∼625 W/cm2. Cavity resonance and lasing wavelength is lithographically defined by controlling pillar pitch and diameter to vary from 960 to 989 nm. We envision this bottom-up approach to pillar-based devices as a new platform for photonic systems integration.

Effect of strain-compensation in stacked 1.3μm InAs∕GaAs quantum dot active regions grown by metalorganic chemical vapor deposition

We have introduced tensile layers embedded in a GaAs matrix to compensate compressive strain in stacked 1.3μm InAs quantum dot (QD) active regions. The effects of the strain compensation are systematically investigated in five-stack and ten-stack QD structures where we have inserted InxGa1−xP (x=0.30 or 0.36) layers. High-resolution x-ray diffraction spectra quantify the overall strain in each sample and indicate >35% strain reduction can be accomplished. Both atomic force and transmission electron microscope images confirm that strain compensation improves material crystallinity and QD uniformity. With aggressive strain compensation, room temperature QD photoluminescence intensity is significantly increased demonstrating a reduced defect density.