Dimitrios Deligiannis

Influence of transparent conductive oxides on passivation of a-Si:H/c-Si heterojunctions as studied by atomic layer deposited Al-doped ZnO

In silicon heterojunction solar cells, the main opportunities for efficiency gain lie in improvements of the front-contact layers. Therefore, the effect of transparent conductive oxides (TCOs) on the a-Si:H passivation performance has been investigated for Al-doped zinc oxide (ZnO:Al) layers made by atomic layer deposition (ALD). It is shown that the ALD process, as opposed to sputtering, does not impair the chemical passivation. However, the field-effect passivation is reduced by the ZnO:Al. The resulting decrease in low injection-level lifetime can be tuned by changing the ZnO:Al doping level (carrier density = 7 × 1019–7 × 1020 cm−3), which is explained by a change in the TCO workfunction. Additionally, it is shown that a ~10–15 nm ALD ZnO:Al layer is sufficient to mitigate damage to the a-Si:H by subsequent sputtering, which is correlated to ALD film closure at this thickness.

Optical Enhancement of Silicon Heterojunction Solar Cells With Hydrogenated Amorphous Silicon Carbide Emitter

In this paper, the electrical and optical properties of p-type hydrogenated amorphous silicon carbide (a-SiC:H) are compared with p-type hydrogenated amorphous silicon (a-Si:H) widely used as emitter material of silicon heterojunction solar cells. The difference in solar-cell performance of the two emitters shows that p-type a-SiC:H emitter is able to enhance the short-circuit current density (Jsc) by reducing the parasitic absorption loss and reflection loss without degrading the electrical performance of devices. The application of the p-type a-SiC:H emitter can lead to a Jsc increase of about 1 mA/cm2, compared with the p-type a-Si:H emitter. Our silicon heterojunction solar cell with p-type a-SiC:H emitter shows an active-area efficiency of 20.8% and the short-circuit current density of 40.3 mA/cm2.

Understanding the thickness-dependent effective lifetime of crystalline silicon passivated with a thin layer of intrinsic hydrogenated amorphous silicon using a nanometer-accurate wet-etching method

This work studies the dependency of the effective lifetime on the a-Si:H layer thickness of c-Si substrates passivated with intrinsic a-Si:H. This is experimentally investigated by using a soft wet-etching method that enables accurate control of the a-Si:H layer thickness. In this way, variations in the effective lifetime down to thicknesses of a few nanometers are studied, while excluding effects originating from the deposition conditions of a-Si:H when samples of different thicknesses are fabricated. For thin passivation layers, results show a strong thickness dependency of the effective lifetime, which is mainly influenced by the recombination at the external a-Si:H surfaces. For thicker passivation layers, the effective lifetime is predominantly determined by the bulk a-Si:H and/or c-Si defect density. During the etching of the a-Si:H passivation layers, a gradient in the Cody gap for our samples is observed. This gradient is accompanied by a stronger decrease in the effective lifetime and is attribut...

Surface passivation of c-Si for silicon heterojunction solar cells using high-pressure hydrogen diluted plasmas

In this work we demonstrate excellent c-Si surface passivation by depositing a-Si:H in the high-pressure and high hydrogen dilution regime. By using high hydrogen dilution of the precursor gases during deposition the hydrogen content of the layers is sufficiently increased, while the void fraction is reduced, resulting in dense material. Results show a strong dependence of the lifetime on the substrate temperature and a weaker dependence on the hydrogen dilution. After applying a post-deposition annealing step on the samples equilibration of the lifetime occurs independent of the initial nanostructure.

Passivation mechanism in silicon heterojunction solar cells with intrinsic hydrogenated amorphous silicon oxide layers

In this work, we use intrinsic hydrogenated amorphous silicon oxide layers (a-SiOx:H) with varying oxygen content (cO) but similar hydrogen content to passivate the crystalline silicon wafers. Using our deposition conditions, we obtain an effective lifetime (τeff) above 5 ms for cO ≤ 6 at. % for passivation layers with a thickness of 36 ± 2 nm. We subsequently reduce the thickness of the layers using an accurate wet etching method to ∼7 nm and deposit p- and n-type doped layers fabricating a device structure. After the deposition of the doped layers, τeff appears to be predominantly determined by the doped layers themselves and is less dependent on the cO of the a-SiOx:H layers. The results suggest that τeff is determined by the field-effect rather than by chemical passivation.In this work, we use intrinsic hydrogenated amorphous silicon oxide layers (a-SiOx:H) with varying oxygen content (cO) but similar hydrogen content to passivate the crystalline silicon wafers. Using our deposition conditions, we obtain an effective lifetime (τeff) above 5 ms for cO ≤ 6 at. % for passivation layers with a thickness of 36 ± 2 nm. We subsequently reduce the thickness of the layers using an accurate wet etching method to ∼7 nm and deposit p- and n-type doped layers fabricating a device structure. After the deposition of the doped layers, τeff appears to be predominantly determined by the doped layers themselves and is less dependent on the cO of the a-SiOx:H layers. The results suggest that τeff is determined by the field-effect rather than by chemical passivation.

Temperature dependency of the silicon heterojunction lifetime model based on the amphoteric nature of dangling bonds

This work adapts a model to simulate the carrier injection dependent minority carrier lifetime of crystalline silicon passivated with hydrogenated amorphous silicon at elevated temperatures. Two existing models that respectively calculate the bulk lifetime and surface recombination velocity are used and the full temperature dependency of these models are explored. After a thorough description of these temperature dependencies, experimental results using this model show that the minority carrier lifetime changes upon annealing of silicon heterojunction structures are not universal. Furthermore, comparisons of the temperature dependent model to using the room temperature model at elevated temperatures is given and significant differences are observed when using temperatures above 100 °C. This shows the necessity of taking temperature effects into account during in-situ annealing experiments.

Light-Induced Effects on the a-Si:H/c-Si Heterointerface

Light-induced effects on the minority carrier lifetime of silicon heterojunction structures are studied through multiple-exposure photoconductance decay (MEPCD). MEPCD monitors the effect of the measurement flash from a photoconductance decay setup on a sample over thousands of measurements. Varying the microstructure of the intrinsic hydrogenated amorphous silicon (a-Si:H) used for passivation of n-type crystalline silicon (c-Si) showed that passivating films rich in voids produce light-induced improvement, while denser films result in samples that are susceptible to light-induced degradation. Light-induced degradation is linked to an increase in dangling bond density at the a-Si:H/c-Si interface, while light-induced improvements are linked to charging at the a-Si:H/c-Si interface. Furthermore, doped a-Si:H is added to make samples with an emitter and back surface field (BSF). These doped layers have a significant effect on the light-induced kinetics on minority carrier lifetime. Emitter samples exhibit consistent light-induced improvement, while BSF samples exhibit light-induced degradation. This is explained through negative charging at the BSF and positive charging at the emitter. Full precursors with a BSF and emitter exhibit different kinetics based on which side is being illuminated. This suggests that the light-induced charging at the a-Si:H/c-Si interface can only occur when a-Si:H has sufficient generation.