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Dive into the research topics where Dincer Gokcen is active.

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Featured researches published by Dincer Gokcen.


Journal of The Electrochemical Society | 2010

Stoichiometry of Pt Submonolayer Deposition via Surface-Limited Redox Replacement Reaction

Dincer Gokcen; Sang-Eun Bae; Stanko R. Brankovic

The work exploring the stoichiometry of Pt deposition via surface-limited redox replacement of the underpotentially deposited (UPD) Cu monolayer on Au(111) is presented. The Cu UPD monolayer is formed from 10 -3 M Cu 2+ + 0.1 M HClO 4 solution, whereas the Pt deposition via surface-limited redox replacement reaction is carried out in 10- 3 M {PtCl 6 } 2- + 0.1 M HClO 4 solution at open-circuit potential. Our results indicate that the Pt submonolayers have two-dimensional morphology and linear dependence of their coverage on the amount (coverage) of the replaced Cu UPD monolayers. Our analysis shows that the oxidation state of Cu during redox replacement reaction is 1+, suggesting that four Cu UPD adatoms are replaced by each deposited Pt adatom. This work stresses the general importance of the anions, determining the stoichiometry of metal deposition reaction via surface-limited redox replacement of the UPD monolayers.


Electrocatalysis | 2012

Size Effects in Monolayer Catalysis—Model Study: Pt Submonolayers on Au(111)

Sang-Eun Bae; Dincer Gokcen; Ping Liu; Parnia Mohammadi; Stanko R. Brankovic

The two-dimensional Pt submonolayers on Au(111) were used as model catalyst system to study kinetics of hydrogen oxidation reaction (HOR). The morphology of different Pt submonolayers was characterized by ex situ scanning tunneling microscopy combined with statistical image analysis. The HOR kinetics data were analyzed using Levich–Koutecky formalism and presented as a function of the mean size of Pt clusters for each Pt submonolayer. The Pt submonolayers with smaller Pt clusters were found less active for HOR. This trend is well correlated with the continuum elasticity analysis of the average active strain in Pt clusters indicating that smaller clusters have less tensile strain. The density functional theory calculations were found in agreement with our results demonstrating that the size-dependent strain in Pt clusters has significant effect on the energy of the d-band center, i.e., the Pt clusters’ activity.


Electrochimica Acta | 2011

Reaction kinetics of metal deposition via surface limited red-ox replacement of underpotentially deposited metal monolayers

Dincer Gokcen; Sang-Eun Bae; Stanko R. Brankovic


Journal of The Electrochemical Society | 2014

Nucleation of Pt Monolayers Deposited via Surface Limited Redox Replacement Reaction

Dincer Gokcen; Qiuyi Yuan; Stanko R. Brankovic


219th ECS Meeting | 2011

Kinetics of Metal Deposition via Surface-Limited Redox Replacement Reaction

Dincer Gokcen; Sang E. Bae; Stanko R. Brankovic


233rd ECS Meeting (May 13-17, 2018) | 2018

Atomic Layer Deposition Using Self-Terminated Electrodeposition Reactions

Thomas P. Moffat; Yihua Liu; Sang Hyun Ahn; Nicole L. Ritzert; Rongyue Wang; Eleanor Gillette; Dincer Gokcen; Carlos M. Hangarter; Haiyan Tan; Leonid A. Bendersky; Hoydoo You; Ugo Bertocci


232nd ECS Meeting (October 1-5, 2017), | 2017

Electrochemical Atomic Layer Deposition: Self-Terminated Electrodeposition Reactions

Thomas P. Moffat; Yihua Liu; Sang Hyun Ahn; Nicole L. Ritzert; Rongyue Wang; Eleanor Gillette; Dincer Gokcen; Haiyan Tan; Carlos M. Hangarter; Leonid A. Bendersky; Ugo Bertocci; Hoydoo You


231st ECS Meeting (May 28 - June 1, 2017) | 2017

Invited) Electrochemical Atomic Layer Deposition of Ultrathin Electrocatalytic Films

Thomas P. Moffat; Sang Hyun Ahn; Yihua Liu; Ugo Bertocci; Dincer Gokcen; Nicole L. Ritzert; Rongyue Wang; Carlos M. Hangarter


231st ECS Meeting (May 28 - June 1, 2017) | 2017

New Opportunities in Pulse Plating Via Self-Terminated Electrodeposition Reactions

Thomas P. Moffat; Yihua Liu; Sang Hyun Ahn; Nicole L. Ritzert; Rongyue Wang; Dincer Gokcen; Carlos M. Hangarter; Ugo Bertocci


227th ECS Meeting (May 24-28, 2015) | 2015

Self-Terminated Electrodeposition Reactions

Thomas P. Moffat; Yihua Liu; Sang Hyun Ahn; Rongyue Wang; Dincer Gokcen; Carlos M. Hangarter; Ugo Bertocci

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Thomas P. Moffat

National Institute of Standards and Technology

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Ugo Bertocci

National Institute of Standards and Technology

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Yihua Liu

National Institute of Standards and Technology

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Sang Hyun Ahn

National Institute of Standards and Technology

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Haiyan Tan

National Institute of Standards and Technology

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Leonid A. Bendersky

National Institute of Standards and Technology

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