Dominique Hertz
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Featured researches published by Dominique Hertz.
Thin Solid Films | 2000
J.F. Pierson; Thierry Belmonte; T. Czerwiec; Dominique Hertz; H. Michel
Abstract Deposition of zirconium diboride films on Zircaloy-4 substrates at 733 K over 20 cm is carried out by remote plasma enhanced chemical vapor deposition (RPECVD). Different post-discharge compositions (Ar–H 2 , Ar–H 2 –BCl 3 and Ar–BCl 3 ) are tested in several process configurations. Experiments performed by thermal CVD and RPECVD with Ar–H 2 post-discharge show that the deposition of ZrB 2 films on oxidized Zircaloy-4 is impossible at temperature lower than 853 K. Ar–H 2 –BCl 3 post-discharges do not give to adherent films on oxidized Zircaloy-4 at a temperature lower than 753K. It is shown that ZrB 2 thin films can be synthesized by using flowing Ar–BCl 3 microwave post-discharges. Chlorine must etch the zirconia protective layer before zirconium diboride is synthesized. Therefore, the control of thickness of this zirconia layer by a previous oxidation treatment gives homogeneous deposition. The structure of the films has been determined to be nanograins of ZrB 2 dispersed in an amorphous solid solution of boron and zirconium oxides. The origin of the boron species incorporated in the ZrB 2 films is attributed to the eching of the quartz tube by chlorine.
Thin Solid Films | 1997
J. Gavillet; Thierry Belmonte; Dominique Hertz; H. Michel
Thin films of zirconia have been deposited at 733 K and below by microwave post-discharge-assisted oxidation of ZrCl4 in O2–H2–Ar mixtures, leading to monoclinic layers with a columnar morphology. The highest deposition rates were obtained when both H2 and O2 passed through the discharge, with a flowrate ratio of H2/O2=2. The results have been compared with those for a conventional chemical vapour deposition (CVD) process based on the hydrolysis of ZrCl4. Together with information gained on the post-discharge process using other investigation methods, such as mass spectrometry and measurements of atomic oxygen concentrations by NO titration, they have helped to shed light on the reaction paths. The mechanism leading to zirconia formation has been identified as being a simple hydrolysis reaction in the late post-discharge. The microwave post-discharge-assisted O2–H2–Ar process thus seems to behave like a conventional CVD technique in the temperature range from 573 to 733 K.
Materials and Manufacturing Processes | 1991
H.I. Chbihi; S. Audisio; Francoise Defoort; Dominique Hertz
Abstract A chromium oxide (Cr2O3) coating was obtained on metal substrates (steel, alloy steel, etc.) by thermal decomposition of chromium acetylacetone (AA-Cr) in oxygen. The nature and quality of these coatings were investigated by a variety of analysis techniques: X ray Diffraction, Raman Spectrometry, Glow Discharge Spectrometry, Scanning Electron Microscopy and Optical Microscopy. Analysis of the influence of the substrate and precursor temperature, of the flowrate of the carrier gas (Ar) and of the reagent (O2) led to determination of the optimum coating conditions.
Wear | 2004
Lidia Benea; Pierre Ponthiaux; F. Wenger; J. Galland; Dominique Hertz; J.Y Malo
Wear | 2013
Sandra Guadalupe Maldonado; Stefano Mischler; Marco Cantoni; Walter-John Chitty; Carole Falcand; Dominique Hertz
Wear | 2013
C. Nouguier-Lehon; M. Zarwel; C. Diviani; Dominique Hertz; Hassan Zahouani; T. Hoc
Archive | 1995
Dominique Hertz; Thierry Belmonte; Jérôme Gavillet; Henri Michel
Archive | 1995
Dominique Hertz; Luc Pillet
Archive | 1987
Dominique Hertz; Jean-Michel Couturier
Archive | 2003
Dominique Hertz; Yves Desprez