Dong Fengliang

Electron Beam Lithographic Pixelated Micropolarizer Array for Real-Time Phase Measurement

Pixelated micropolarizer arrays (PMAs) have recently been used as key components to achieve real-time phase measurement. PMA fabrication by electron beam lithography and inductively coupled plasma-reactive ion etching is proposed in this work. A 320 × 240 aluminum PMA with 7.4 μm pitch is successfully fabricated by the proposed technique. The period of the grating is 140 nm, and the polarization directions of each of the 2 × 2 units are 0°, 45°, 90°, and 135°. The scanning electron microscopy and optical microscopy results show that the PMA has a good surface characteristic and polarization performances. When the PMA is applied to phase-shifting interferometry, four fringe patterns of different polarization directions are obtained from only one single frame image, and then the object wave phase is calculated in real time.

Real-time dynamic phase measurement based on pixelated micropolarizer array

Real-time phase-shifting interferometry based on pixelated micropolarizer array (PMA) has recently been used to achieve real-time phase measurement, and the requirement of vibration resistance is greatly reduced. In this paper, a 320×240 Aluminum PMA with 7.4 μm pitch is successfully fabricated by the electron beam lithography (EBL). The period of the grating is 140nm, and the polarization directions of each 2×2 units are 0°, 45°, 90°, and 135°. The PMA is integrated to the CCD sensor to achieve real-time phase measurement. Four fringe patterns of different polarization directions are obtained from only one single frame image by linear interpolation method, and then the object wave phase is calculated in real-time. Moreover, dynamic phase caused by temperature change is obtained in real-time, which verify the feasibility of this method in real-time dynamic phase measurement.