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Dive into the research topics where Douglas Edward Deckman is active.

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Tribology Transactions | 2006

Atomic Force Microscopy and Raman Spectroscopy Investigation of Additive Interactions Responsible for Anti-Wear Film Formation in a Lubricated Contact

Dalia G. Yablon; Patricia H. Kalamaras; Douglas Edward Deckman; Martin N. Webster

Rational formulation of lubricants requires an understanding of additive interactions that impact antiwear film qualities such as thickness, topography, and friction. In an effort to understand the complex additive interactions responsible for formation of anti-wear and friction-reducing films, atomic force microscopy (AFM) in conjunction with Raman microscopy has been used to conduct a nanoscale investigation of the wear tracks formed by a high-frequency reciprocating rig (HFRR) in the presence of various commercial lubricant additives combinations. Of the additives examined, zinc dithiophosphate (ZnDTP)-based additives are found to be solely responsible for the formation of a thick (hundreds of nm) film that exhibits a pitted topography. Addition of a molybdenum-based friction modifier to the lubricant blend reduces the film thickness considerably and reacts to produce MoS 2 on the surface, suggesting an interaction with the zinc dithiophosphate–based additive that prevents antiwear film formation. Formation of MoS 2 , found only in the wear track, is consistent with a dramatic reduction of friction coefficient measured in the HFRR. Subsequent addition of borated dispersants to the lubricant reveals a further reduction in friction coefficient and a modest return of anti-wear film. However, addition of detergents to the formulation increases the friction coefficient and also promotes the formation of an anti-wear film. Nanoindentation measurements on the bulk properties of the anti-wear films determined that all of the anti-wear films had similar modulus and hardness measurements which were lower than that of the parent steel material, but did not correlate with the friction measurements obtained from the HFRR. This indicates that nanoscale measurements on material properties of the film are necessary to elucidate friction properties of the interface, and that these properties cannot be determined from macroscale measurements on the bulk film. Presented at the STLE Annual Meeting, in Toronto, Ontario, Canada. May 17–20, 2004 Review led by Bob Kauffman


Archive | 2003

Lubricating oil compositions with improved friction properties

Mark D. Winemiller; Douglas Edward Deckman; William L. Maxwell; William H. Buck; David J. Baillargeon


Archive | 2003

Low ash, low phosphorus and low sulfur engine oils for internal combustion engines

Liehpao Oscar Farng; Andrew Jackson; Willie A. Givens; Douglas Edward Deckman; William H. Buck


Archive | 2002

Functional fluid lubricant using low noack volatility base stock fluids

Douglas Edward Deckman; Mark D. Winemiller; William L. Maxwell; David J. Baillargeon; Norman Yang; Maria Caridad B. Goze


Archive | 2006

Mixed TBN detergents and lubricating oil compositions containing such detergents

Douglas Edward Deckman; Mark D. Winemiller; William L. Maxwell; William H. Buck; David J. Baillargeon


Archive | 2006

Lubricant and method for improving air release using ashless detergents

Jacob Joseph Habeeb; David J. Baillargeon; Douglas Edward Deckman


Archive | 2004

High performance non-zinc, zero phosphorus engine oils for internal combustion engines

Liehpao Oscar Farng; Andrew Jackson; Willie A. Givens; Douglas Edward Deckman; William H. Buck


Archive | 2003

Lubricating oil compositions for internal combustion engines with improved wear performance

Douglas Edward Deckman; William H. Buck; William L. Maxwell; Mark D. Winemiller; David J. Baillargeon


Archive | 2006

Ashless detergents and formulated lubricating oil containing same

Jacob Joseph Habeeb; William H. Buck; Douglas Edward Deckman; William L. Maxwell


Archive | 2007

Low SAP engine lubricant additive and composition containing non-corrosive sulfur and organic borates

William H. Buck; L. Oscar Farng; Douglas Edward Deckman; Steven Kennedy; Andrew G. Horodysky

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