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Dive into the research topics where Douglas Gordon is active.

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Featured researches published by Douglas Gordon.


MRS Proceedings | 1993

Advances in Precursor Development for CVD of Bariumcontaining Materials

Brian A. Vaartstra; Robin A. Gardiner; Douglas Gordon; Robert L. Ostrander; Arnold L. Rheingold

Barium titanate and barium-strontium titanate (BST) are high dielectric materials, likely to replace state-of-the-art capacitor materials for memory applications. Chemical Vapor Deposition (CVD) of these materials has been hampered, particularly by the lack of suitable precursors for barium. Although attempts to make volatile metal-organic barium compounds have met with some progress, a suitably stable, volatile barium source is still in demand. This paper will highlight recent developments at ATM, including syntheses and structures of polyamine and glycol ether adducts which have been designed to limit aggregation of barium diketonates, and stabilize the adducts with respect to ligand dissociation.


Chemical Communications | 1998

Isolation and structural determination of octacyanobutanediide, [C4(CN)8]2–; precursors to M(TCNE)x magnets‡

Jie Zhang; Rico E. Del Sesto; Douglas Gordon; Joel S. Miller; Louise M. Liable-Sands; Arnold L. Rheingold; Brian M. Burkhart

The reaction of MI2·xMe3CN (M = Mn, Fe) and TCNE (tetracyanoethylene) leads to unprecedented [C4(CN)8]2– µ4-metal complexes which have been crystallographically characterized and are precursors to M(TCNE)x·yS magnets.


Archive | 1995

Precursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions comprising same

Robin A. Gardiner; Peter S. Kirlin; Thomas H. Baum; Douglas Gordon; Timothy E. Glassman; Sofia Pombrik; Brian A. Vaartstra


Archive | 1995

Method of forming metal films on a substrate by chemical vapor deposition

Robin A. Gardiner; Peter S. Kirlin; Thomas H. Baum; Douglas Gordon; Timothy E. Glassman; Sofia Pombrik; Brian A. Vaartstra


Chemistry of Materials | 1994

Mononuclear barium diketonate polyamine adducts. Synthesis, structures, and use in MOCVD of barium titanate

Robin A. Gardiner; Douglas Gordon; Gregory T. Stauf; Brian A. Vaartstra; Robert L. Ostrander; Arnold L. Rheingold


Archive | 1995

Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same

Peter S. Kirlin; Brian A. Vaartstra; Douglas Gordon; Timothy E. Glassman


Archive | 2007

Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition

Robin A. Gardiner; Thomas H. Baum; Douglas Gordon; Timothy E. Glassman; Sofia Pombrik; Brian A. Vaartstra; Peter S. Kirlin


Journal of the American Chemical Society | 2000

Identification of [MII(Arene)2]2+ (M = V, Cr) as the Key Intermediate in the Formation of V[TCNE]x·ySolvent Magnets and Cr[TCNE]x·Solvent

Douglas Gordon; Laura Deakin; and Atta M. Arif; Joel S. Miller


Archive | 1995

Chemical vapor deposition of tantalum- or niobium-containing coatings

Peter S. Kirlin; Brian A. Vaartstra; Douglas Gordon; Timothy E. Glassman


Chemistry of Materials | 1995

Gas-Phase Pyrolysis of tert-Butyl(allyl)selenium, a New Precursor for Organometallic Chemical Vapor Deposition of ZnSe

Michal Danek; Jeung-Soo Huh; Klavs F. Jensen; Douglas Gordon; Walter P. Kosar

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Brian M. Burkhart

Hauptman-Woodward Medical Research Institute

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Gregory T. Stauf

United States Naval Research Laboratory

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Jeung-Soo Huh

Massachusetts Institute of Technology

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