E. Cambril

Design and fabrication of blazed binary diffractive elements with sampling periods smaller than the structural cutoff

We report here on the theoretical performance of blazed binary diffractive elements composed of pillars carefully arranged on a two-dimensional grid whose period is smaller than the structural cutoff. These diffractive elements operate under unpolarized light. For a given grating geometry, the structural cutoff is a period value above which the grating no longer behaves like a homogeneous thin film. Because the grid period is smaller than this value, effective-medium theories can be fully exploited for the design, and straightforward procedures are obtained. The theoretical performance of the blazed binary elements is investigated through electromagnetic theories. It is found that these elements substantially outperform standard blazed echelette diffractive elements in the resonance domain. The increase in efficiency is explained by a decrease of the shadowing effect and by an unexpected sampling effect. The theoretical analysis is confirmed by experimental evidence obtained for a 3λ-period prismlike grating operating at 633 nm and for a 20°-off-axis diffractive lens operating at 860 nm.

Blazed binary subwavelength gratings with efficiencies larger than those of conventional échelette gratings

We introduce a new structural cutoff beyond which subwavelength gratings cease to behave as homogeneous media and discuss its effects on the proper selection of the sampling periods of subwavelength diffractive elements. According to this analysis, a 3lambda-period blazed binary grating composed of square pillars is designed for He-Ne operation and is fabricated by etching of a TiO>(2) layer deposited upon a glass substrate. Its first-order measured diffraction efficiency is 12% larger than the theoretical efficiency of an ideal blazed échelette grating in glass with the same period.

Domain wall motion induced by spin polarized currents in ferromagnetic ring structures

We present an experimental study of the influence of spin-polarized currents on the displacement of domain walls in submicrometer permalloy ring structures. Using magnetoresistance (MR) measurements with multiple nonmagnetic contacts, we can sense the displacement of a domain wall and, by injecting large dc current densities (1011 A/m2), we can increase or decrease the magnetic field needed to move a single domain wall, depending on the direction of the current with respect to the applied field direction. Using rings with and without notches and by measuring the MR with the magnetic field applied along different directions, we show that we can exclude the possibility that the dominating effect is a classical Oersted field. We conclude that our observations can be explained by a directional spin torque effect.

Sub-50 nm planar magnetic nanostructures fabricated by ion irradiation

He+ ion irradiation of Co–Pt multilayers through a silica mask obtained by a combination of high resolution lithography and reactive ion etching can produce an optical contrast-free, entirely planar, sub-50 nm magnetically patterned array. Furthermore, the specificity of magnetization reversal in such arrays leads to a weak dispersion of coercive forces. The technique holds promise for both present hard disk technology and future near field magneto-optical recording.

Controlled magnetic switching in single narrow rings probed by magnetoresistance measurements

We present anisotropic magnetoresistance measurements of magnetic switching processes in narrow ferromagnetic permalloy rings fabricated with six nonmagnetic electrical contacts. We demonstrate that measuring the resistance between different contacts allows the determination of the domain wall positions. Furthermore, these measurements also yield the possibility of determining the local switching fields of different parts of the ring. This provides a very useful tool to explore the complete switching process of a single ring. We show that, by using notches of suitable size and by applying fields along appropriate directions, it is possible to select the circulation direction of the vortex state using a uniform field only.

HIGH-EFFICIENCY SUBWAVELENGTH DIFFRACTIVE ELEMENT PATTERNED IN A HIGH-REFRACTIVE-INDEX MATERIAL FOR 633 NM

We propose the use of high-index materials for the fabrication of subwavelength diffractive components operating in the visible domain. This approach yields a reduction of fabrication constraints and an improvement of theoretical performance. A blazed grating with subwavelength binary features and with a period of 5.75 wavelengths is designed and fabricated in a TiO(2) layer coated upon a glass substrate. The first-order diffraction efficiency measured with a He-Ne laser beam is 83%, which is slightly larger than that achieved theoretically by the best standard (continuous profile) blazed grating fabricated in glass with the same period.

Direct observation of domain-wall pinning at nanoscale constrictions

In a combined experimental and numerical study, we determine the details of the pinning of domain walls at constrictions in permalloy nanostructures. Using high spatial-resolution (<10nm) electron holography, we image the spin structure of geometrically confined head-to-head domain walls at constrictions. Low-temperature magnetoresistance measurements are used to systematically ascertain the domain-wall depinning fields in constrictions down to 35 nm width. The depinning fields increase from 60 to 335 Oe with decreasing constriction width and depend on the wall spin structure. The energy barrier to depin the wall from the constriction is quantitatively determined and comparison with the depinning field strength allows us to gauge the energy barrier height of the pinning potential.

Study of large area high density magnetic dot arrays fabricated using synchrotron radiation based x‐ray lithography

Large area arrays of dots have been patterned in Au/Co/Au(111) sandwiches with ultrathin Co layers (0.6 to 2 nm) and a perpendicular easy magnetization axis. Dot dimensions down to 0.2 μm have been achieved using x‐ray lithography, with either positive resist and direct ion beam etching or a lift‐off process with aluminum mask. Both processes have been tested against the damages they induce to the fragile structure of the samples. The magneto‐optical effects and magnetization reversal processes in the arrays have been characterized versus Co thickness, dot dimension, and lattice aspect ratio. For high quality samples, the domain walls propagation mechanism that drives magnetization reversal in as‐grown films is drastically modified in dot arrays, leading to a large increase of the coercive field with dot diameter reduction, together with changes in the shape of the hysteresis loops.

A transmission polarizing beam splitter grating

We present the design, fabrication, and test of a polarizing beam splitter grating for operation at 633 nm under a angle of incidence. This component is compact and its fabrication is reproducible enough to be integrated in optical reconfigurable interconnect systems. For TE polarization, the incident beam is undeflected whereas TM beams exhibit a deviation. We used electromagnetic theory to optimize the performance of the polarizing beam splitter grating. We employed direct electron beam writing and reactive ion etching to fabricate a polarizing beam splitter etched in a layer deposited on a glass substrate. Experimental results show that diffraction efficiencies more than 80% and extinction ratios above 100 are manufacturable with present technology.

Nanoimprint lithography for a large area pattern replication

We report on replication of high resolution patterns over a 4 in. wafer area by imprint lithography with a commercial hydraulic press and a pair of hot plates. The experiments confirm that the imprint lithography can be used for large area patterning. As a result, sub-100 nm features were obtained by the imprint lithography and lift-off with a good uniformity and an accurate pattern placement over the 4 in. wafer area.