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Featured researches published by E. Camps.


Thin Solid Films | 2000

Electron evaporation of carbon using a high density plasma.

S. Muhl; E. Camps; L. Escobar-Alarcón; O Olea

High-density plasmas are often used either in the preparation of thin films or for the modification of surfaces. However, except for collision-driven chemical reactions the electrons present are not used, although electron bombardment heating of the work piece nearly always occurs. Principally it is the ions and neutrals that are utilised for material processing. By suitable biasing of a conducting source material the electrons can be extracted from a high-density low-pressure plasma to such an extent that evaporation of this source material can be achieved. Due to the presence of the plasma and the flux of electrons a large proportion of the evaporant is expected to be ionised. We have used this novel arrangement to prepare thin films of carbon using a resonant high-density argon plasma and a water-cooled rod of high purity graphite. Multiple substrates were used both outside of, and immersed in, the plasma. We report the characteristics of the plasma (electron temperature and density, the ion energy and flux, and optical emission spectra), the deposition process (the evaporation rate and ion/neutral ratio), and the film properties (IR and UV/Vis absorption spectra, Raman spectra, elemental analysis, hardness and refractive index).


Diamond and Related Materials | 2001

DLC films prepared by electron evaporation of graphite in an ECR plasma

S. Muhl; E. Camps; L. Escobar-Alarcón; O. Olea; M. Miki; N. A. Morrison

Abstract Films of diamond-like carbon (DLC) have been prepared by a novel electron evaporation scheme in an argon plasma within a linear microwave ECR reactor. The electrons present in the high density ECR plasma are attracted to a biased graphite rod to such an extent that the carbon is thermally evaporated. The argon ions bombard the substrate with an energy determined by the plasma potential and the substrate bias. However, the plasma potential is determined by the size of the graphite rod as well as the applied voltage. The films have been analysed using the following techniques: profilometry (thickness and residual stress); ellipsometry (refractive index and thickness); Raman spectroscopy (atomic bonding); UV-Vis spectrophotometry (bandgap), PEELS (C sp3), EDX and RBS (chemical analysis). The results are discussed in terms of the knock-on subplantation model [Rad. Effects Defects Solids, 142 (1997) 63] and the recently published interpretation of the Raman spectra of carbon films [Phys. Rev. B, 61 (2000) 14095].


Journal of Non-crystalline Solids | 2010

Amorphous niobium oxide thin films

G. Ramírez; S.E. Rodil; S. Muhl; D. Turcio-Ortega; J.J. Olaya; M. Rivera; E. Camps; L. Escobar-Alarcón


Applied Surface Science | 2007

An alternative procedure for the determination of the optical band gap and thickness of amorphous carbon nitride thin films

L. Escobar-Alarcón; A. Arrieta; E. Camps; S. Muhl; S.E. Rodil; E. Vigueras-Santiago


Diamond and Related Materials | 2008

Evolution of the opto-electronic properties of amorphous carbon films as a function of nitrogen incorporation

F. Alibart; O. Durand Drouhin; M. Lejeune; M. Benlahsen; S.E. Rodil; E. Camps


Applied Surface Science | 2011

Microstructural characterization of Ti–C–N thin films prepared by reactive crossed beam pulsed laser deposition

L. Escobar-Alarcón; V. Medina; E. Camps; S. Romero; M. Fernández; D. Solís-Casados


Applied Physics A | 2010

TiCN thin films grown by reactive crossed beam pulsed laser deposition

L. Escobar-Alarcón; E. Camps; S. Romero; S. Muhl; Iván Camps; E. Haro-Poniatowski


Applied Surface Science | 2008

Comparison and semiconductor properties of nitrogen doped carbon thin films grown by different techniques

F. Alibart; O. Durand Drouhin; M. Benlahsen; S. Muhl; S. Elizabeth Rodil; E. Camps; L. Escobar-Alarcón


Diamond and Related Materials | 2007

a-CN thin film properties as a function of laser ablation plasma parameters

L. Escobar-Alarcón; A. Arrieta; E. Camps; S. Romero; S. Muhl; Miguel A. Camacho-López


Applied Physics A | 2005

Effect of the plasma parameters on the properties of titanium nitride thin films grown by laser ablation

L. Escobar-Alarcón; E. Camps; M.A. Castro; S. Muhl; J.A. Mejia-Hernandez

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S. Muhl

National Autonomous University of Mexico

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A. Arrieta

Universidad Autónoma Metropolitana

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S.E. Rodil

National Autonomous University of Mexico

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E. Haro-Poniatowski

Universidad Autónoma Metropolitana

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L. Escobar-Alarcón

Universidad Autónoma del Estado de México

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Miguel A. Camacho-López

Universidad Autónoma del Estado de México

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V.H. Castrejón-Sánchez

Universidad Autónoma del Estado de México

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M. Lejeune

University of Picardie Jules Verne

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D. Solís-Casados

Universidad Autónoma del Estado de México

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D. Turcio-Ortega

National Autonomous University of Mexico

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