É. S. Putilin

Increasing the coating-uniformity zone when insulators are thermally evaporated in vacuum

This paper discusses the possibility of obtaining uniformly thick coatings on large areas. Evaporation of film-forming material from two sources lying at different distances from the axis of rotation of the substrate holder is used to increase the coating-uniformity zone. A discussion is given of how the evaporation rates of the film-forming material and the distance from the axis of rotation to the evaporators affect the thickness distribution of the deposited layer on a flat substrate holder.

Interference coatings with a specified refractive index based on dielectric nanolayers

This paper discusses the possibility of using nanolayers to create quarter-wave plates with a specified refractive index. Such systems make it possible to broaden the class of usable film-forming materials. The possibility is considered of creating antireflective coatings one or several layers of which are formed by a set of symmetrical systems of nanolayers. The symmetrical systems of nanolayers consist of two dielectrics with different refractive indices. An advantage of such coatings is that they can be used as a basis for fabricating quarter-wave antireflection coatings that have a wide region of minimum reflection; these were not implemented earlier because of the lack of film-forming materials with the necessary refractive indices.

Measuring the refractive index of an inhomogeneous antireflection coating

Ellipsometric and photometric methods are used to measure the refractive index of a film based on tetraethoxy silane. It is shown that the method of ellipsometry makes it possible not only to determine the refractive index but also to detect the inhomogeneity of the optical profile.

Determining the optical constants of thin metallic films while they are being deposited in vacuum

This paper proposes a method of monitoring the optical constants and thickness of a layer while it is being deposited in vacuum, using measurements of the reflectance and transmittance on two substrates with different refractive indices. All four measured signals, as well as the background-illumination signal, are monitored by a monochromatic spatial radiation detector. The system was certified using nickel films up to 80nm thick.

Forming gradient layers on spherical substrates

This paper discusses the factors that affect the thickness distribution of a layer on a spherical surface of convex shape of known radius when layers are being formed on it through a flat stop of the simplest shape. It shows that the placement of the optical item and the stop relative to the evaporator affect the character of the thickness distribution of the layer.

A process for creating mirrors with variable reflectance

This paper discusses the structural and process features of the creation of optical amplitude correctors that operate in the UV region.

Mirrors that correct the phase of reflected radiation

This paper discusses the possibility of using quarter-wave dielectric mirrors to correct the shape of the wave front of reflected radiation and the shape of the surface of constant phase difference formed in laser cavities and Fabry-Perot interferometers. It is shown that, by using quarter-wave dielectric mirrors consisting of two systems formed by layers with small and large refractive-index differences, it is possible to form a plane wave front and a flat surface of constant phase difference with a small number of layers whose thicknesses varies.© 2004 Optical Society of America

Using features of the spectral responses when monitoring the thicknesses of layers during the deposition of multilayer systems

This article discusses the possibility of photometric monitoring of the thickness of layers of interference systems during fabrication, using the features of their spectral responses.

Synthesizing the deposition conditions of gradient laser mirrors

This paper proposes an optimal-choice criterion for the relative position of the stop and the optical element during electron-beam evaporation to provide a given reflectance distribution over the surface of an optical element.

Forming gradient layers by means of circular stops and screens

This paper discusses the possibility of depositing layers whose thickness varies over the surface of an item on rotating substrates, using electron-beam evaporation of dielectrics. The layers are deposited through a circular stop that is displaced relative to the center of rotation. The agreement of the experimental results and the calculations is satisfactory to within the accuracy of the measurements.