Egmont Semmler
Ruhr University Bochum
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Featured researches published by Egmont Semmler.
Plasma Sources Science and Technology | 2007
Egmont Semmler; Peter Awakowicz; A von Keudell
The behavior of dual frequency capacitively coupled plasma discharges (2f-CCP) is experimentally studied by Langmuir probe and rf current measurements and is compared with simulations from the literature. The driving frequency ratio, system pressure, high frequency (HF) power and low frequency (LF) power are varied in the experiments. An increase in LF power causes a moderate increase in electron density but a significant decrease in electron temperature. An increase in HF power causes a strong increase in electron density and populates the high energy part of the electron energy distribution function. These dependences can be explained on the basis of a global model. It is shown that the ratios of HF/LF power and driving frequency are the most important parameters. At integer frequency ratios a significant increase in electron density was found, which is explained by the indirect heating at the plasma series resonance. Several design guidelines are derived which address industrial applications and process stability.
Applied Physics Letters | 2008
Deborah O'Connell; Timo Gans; Egmont Semmler; Peter Awakowicz
Frequency coupling in multifrequency discharges is a complex nonlinear interaction of the different frequency components. An alpha-mode low pressure rf capacitively coupled plasma operated simultaneously with two frequencies is investigated and the coupling of the two frequencies is observed to greatly influence the excitation and ionization within the discharge. Through this, plasma production and sustainment are dictated by the corresponding electron dynamics and can be manipulated through the dual-frequency sheath. These mechanisms are influenced by the relative voltage and also the relative phase of the two frequencies.
Plasma Sources Science and Technology | 2010
Dennis Ziegler; Jan Trieschmann; Thomas Mussenbrock; Ralf Peter Brinkmann; Julian Schulze; Uwe Czarnetzki; Egmont Semmler; Peter Awakowicz; Deborah O'Connell; Timo Gans
The influence of the relative phase between the driving voltages on electron heating in asymmetric phase-locked dual frequency capacitively coupled radio frequency plasmas operated at 2 and 14 MHz is investigated. The basis of the analysis is a nonlinear global model with the option to implement a relative phase between the two driving voltages. In recent publications it has been reported that nonlinear electron resonance heating can drastically enhance the power dissipation to electrons at moments of sheath collapse due to the self-excitation of nonlinear plasma series resonance (PSR) oscillations of the radio frequency current. This work shows that depending on the relative phase of the driving voltages, the total number and exact moments of sheath collapse can be influenced. In the case of two consecutive sheath collapses a substantial increase in dissipated power compared with the known increase due to a single PSR excitation event per period is observed. Phase resolved optical emission spectroscopy (PROES) provides access to the excitation dynamics in front of the driven electrode. Via PROES the propagation of beam-like energetic electrons immediately after the sheath collapse is observed. In this work we demonstrate that there is a close relation between moments of sheath collapse, and thus excitation of the PSR, and beam-like electron propagation. A comparison of simulation results to experiments in a single and dual frequency discharge shows good agreement. In particular the observed influence of the relative phase on the dynamics of a dual frequency discharge is described by means of the presented model. Additionally, the analysis demonstrates that the observed gain in dissipation is not accompanied by an increase in the electrodes dc-bias voltage which directly addresses the issue of separate control of ion flux and ion energy in dual frequency capacitively coupled radio frequency plasmas.
Plasma Sources Science and Technology | 2012
Stefan Bienholz; Egmont Semmler; Peter Awakowicz; Hayo Brunken; Alfred Ludwig
Dual frequency capacitively coupled plasmas (CCPs) are widely used in (large area) etching and plasma enhanced chemical vapor deposition processes. However, applications in physical vapor deposition (PVD) are still sparse due to the well-established dc magnetron cathode discharges. Nevertheless, there exist critical applications such as ferromagnetic or ceramic thin film deposition which are difficult to handle even for dc magnetron systems. For these materials systems dual frequency CCPs pose a good alternative, because for insulators charging can be avoided and for ferromagnetic materials the target thickness becomes independent of the magnetron configuration at comparable deposition rates.In this work we investigate two separate subjects. First, in dual frequency capacitive discharges a complex coupling of the applied excitation frequencies can be observed, which from a plasma parameter point of view limits the separability of ion flux (usually controlled by frequencies >60?MHz) and ion bombarding energy (usually controlled by frequency <15?MHz) onto the sputter target. By performing deposition experiments it was found that by following simple tuning guidelines a very good degree of separability is achievable. Additionally, the deposition homogeneity is not affected.Second, we correlate the growth conditions with crystalline and magnetic properties as well as the degree of O content for Fe and Ni films. Therefore, we applied different signals as a substrate bias to influence thin film growth. It was found that the crystalline and magnetic properties can be influenced for both Fe and Ni films but is more pronounced for Ni.
Pda Journal of Pharmaceutical Science and Technology | 2016
Egmont Semmler; Wenzel Novak; Wilf W. Allinson; Darren P. Wallis; Nigel I. Wood; Peter Awakowicz; Joachim Wunderlich
A new technology to the pharmaceutical field is presented: surface decontamination by plasmas. The technology is comparable to established barrier systems like e-beam, volatile hydrogen peroxide, or radiation inactivation of microbiological contaminations. This plasma technology is part of a fully automated and validated syringe filling line at a major pharmaceutical company and is in production operation. Incoming pre-sterilized syringe containers (“tubs”) are processed by plasma, solely on the outside, and passed into the aseptic filling isolator upon successful decontamination. The objective of this article is to present the operating principles and develop and establish a validation routine on the basis of standard commercial biological indicators. Their decontamination efficacies are determined and correlated to the actual inactivation efficacy on the pharmaceutical packaging material. The reference setup is explained in detail and a short presentation of the cycle development and the relevant plasma control parameters is given, with a special focus on the in-process monitor determining the cycle validity. Different microbial inactivation mechanisms are also discussed and evaluated for their contribution and interaction to enhance plasma decontamination. A material-dependent inactivation behavior was observed. In order to be able to correlate the tub surface inactivation of Geobacillus stearothermophilus endospores to metallic biological indicators, a comparative study was performed. Through consistently demonstrating the linear inactivation behavior between the different materials, it becomes possible to develop an effective and time-saving validation scheme. LAY ABSTRACT: The challenge in new decontamination systems lies in a thorough validation of the inactivation efficacy under different operating regimes. With plasma, as an ionized gas, a new barrier concept is introduced into pharmaceutical aseptic processing of syringes. The presented system operates in vacuum and only decontaminates the outer surface of pre-sterilized syringe containers (“tubs”), before they are transferred into the aseptic area. The plasma does not penetrate into the tub. This article discusses the phase from development and test germ selection, across the identified sporicidal mechanisms, to a proposal for a validation scheme on the basis of commercially available biological indicators. A special focus is placed on an extensive investigation to establish a link between the tub surface microbial kill (polystyrene and Tyvekand 2) and biological indicator inactivation (stainless steel). Additionally, a rationale is developed on how an optical in-process monitor can be applied to establish a validatable limit on the base of the predetermined inactivation data of Geobacillus stearothermophilus endospores.
Plasma Processes and Polymers | 2012
Benjamin Denis; Simon Steves; Egmont Semmler; Nikita Bibinov; Wenzel Novak; Peter Awakowicz
international conference on plasma science | 2010
Katharina Stapelmann; Nikita Bibinov; Benjamin Denis; Egmont Semmler; Peter Awakowicz
Archive | 2016
Seitaro Matsuo; Egmont Semmler; Peter Awakowicz; A von Keudell
Bulletin of the American Physical Society | 2011
Stefan Bienholz; Egmont Semmler; Peter Awakowicz
Bulletin of the American Physical Society | 2011
Egmont Semmler; A Bergner; J Mentel; Peter Awakowicz