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Featured researches published by Eiichi Seya.


Review of Scientific Instruments | 1999

Operation of a separated-type x-ray interferometer for phase-contrast x-ray imaging

Akio Yoneyama; Atsushi Momose; Eiichi Seya; Keiichi Hirano; Tohoru Takeda; Yuji Itai

Aiming at large-area phase-contrast x-ray imaging, a separated-type x-ray interferometer system was designed and developed to produce 25×20 mm interference patterns. The skew-symmetric optical system was adopted because of the feasibility of alignment. The rotation between the separated crystal blocks was controlled within a drift of 0.06 nrad using a feedback positioning system. This interferometer generated a 25×15 mm interference pattern with 0.07 nm synchrotron x-rays. A slice of a rabbit’s kidney was observed, and its tubular structure could be revealed in a measured phase map.


Journal of Synchrotron Radiation | 2002

Large-area phase-contrast X-ray imaging using a two-crystal X-ray interfero­meter

Akio Yoneyama; Atsushi Momose; Ichiro Koyama; Eiichi Seya; Tohoru Takeda; Yuji Itai; Keiichi Hirano; Kazuyuki Hyodo

Large-area (25 x 20 mm) phase-contrast X-ray imaging was attained by using a skew-symmetric two-crystal X-ray interferometer. The sub-nrad angular control required to operate the X-ray interferometer was achieved with a sleeve bearing and a feedback-positioning system. As a demonstration, measurements of a phase map of a rats liver and a phase-contrast tomographic three-dimensional image of a piece of a rabbits liver were performed at the Photon Factory using 0.07 nm synchrotron radiation X-rays.


Grazing Incidence Optics for Astronomical and Laboratory Applications | 1988

Development Of A Precision Diamond Cutting Machine For Fabrication Of Asymmetrical Aspheric Mirrors

Shigeo Moriyama; Fumihiko Uchida; Eiichi Seya

A high-precision, numerically controlled, diamond cutting machine has been developed for fabrication of asymmetrical aspheric mirrors, such as toroidal mirrors used in SOR optics. In this machine, a work-piece is securely fixed to a machine base, and its side face is cut by a flying single-point diamond tool. A tool spindle is laid on an X-Y slide, and its position is numerically controlled by using a laser interferometer. It is possible to fabricate a cylindrical surface by having the spindle-axis rotate slightly about an axis perpendicular to the X-Y slide. Furthermore, while the spindle is rotating, cutting-depth can be dynamically controlled by utilizing a piezo-actuator fixed to the diamond tool. The cutting-depth control is synchronized to the current rotation angle of the spindle, and cutting-depth data are numerically programmed as function of X-Y slide position. A suitable combination of these programmable figure parameters allows fabrication of asymmetrical aspheric mirrors. In order to achieve high figure accuracy, accurate straight motion is required with the X-Y slide. Therefore, straightness error compensation control is adopted, which incorporates a ZERODURE straightedge of 1m length and three optical-fiber gap sensors. The machine accepts a work-piece with maximum dimensions of 600mm length and 100mm width. A figure accuracy of 0.1 μm and surface roughness of 0.03μmRmax have been achieved.


Japanese Journal of Applied Physics | 1992

Stacked Optical Disk Drive for Multimedia Files

Shigeru Nakamura; Eiichi Seya; Hirofumi Sukeda; Kiyosi Matsumoto; Toshio Niihara; Hideki Nihei; Kouji Ichikawa; Seiichi Mita

A stacked optical disk drive with multiple optical heads has been developed for large-capacity multimedia files. This drive will be suitable for such applications as a network database through LAN, a picture library Including moving pictures, and an editing machine for broadcast use.


Optical Data Storage '91 | 1991

10-mm-thick head mechanism for a stacked optical disk system

Eiichi Seya; Kiyoshi Matsumoto; Hideki Nihei; Atsushi Ichikawa; Shigeo Moriyama; Shigeru Nakamura; Seiichi Mita

A 10-mm-thick head mechanism for a 30 GB, multi-head type stacked optical disk system has been developed. A pair of linear brushless motors are utilized as the coarse actuator, and a 2D motion lens actuator is utilized as the fine one. The average access time is 150 ms. The track following characteristics are tested. The tracking error is 0.03 micrometers in amplitude with a 3600 rpm, 254 mm diameter disk.


Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI | 1996

Optical system for high-throughput EUV lithography

Souichi Katagiri; Masaaki Ito; Hiromasa Yamanashi; Eiichi Seya; Tsuneo Terasawa

The designed optical system, which included an illumination optics and an imaging optics, consists of only one grazing-incidence mirror and a two-aspheric-mirror optics with a synchrotron radiation (SR) as a light-source. The illumination optics provides uniform illumination and high-collection efficiency of radiation from the SR. Since there are only four bounces in this system, including the reflective-mask bounce, this optical system has higher throughput. A throughput of 20-30 wafers/hour is predicted with the designed optics. A one- quarter-size prototype of the designed imaging optics was constructed with the numerical aperture of 0.1 and the magnification of 1/5. The efficiency of 60 percent (obtaining dose per estimated one) was obtained with AZ-PN 100 resist in the experiment. A minimum pattern of 0.12-micrometers lines and spaces was printed on a 0.15-micrometers -thick layer of AZ-PN 100 resist.


SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation | 1993

In-position optical surface measurement for x-ray projection lithography optics: theory and simulation

Eiichi Seya; Minoru Hidaka; Masaaki Ito; Souichi Katagiri; Eiji Takeda

A technique is proposed to measure x-ray projection optics. Simultaneous linear equations are derived from the wavefront distortions to obtain form errors of optical surfaces discretely. Simulations proved that the arithmetic operation errors are small enough to achieve nanometer level accuracy. This technique is effective to test aspheric reflectors, as well as the reflector misalignments. It also is able to be applied to adaptive optics compensating for thermal deformation effects or drifts on the exposure system.


Journal of The Japan Society for Precision Engineering | 1987

Reflection Coefficient Correction Technique for an Optical Fiber Displacement Sensor

Shigeo Moriyama; Fumihiko Uchida; Eiichi Seya

This paper presents a novel reflection coefficient correction technique for an optical fiber displacement sensor. The new technique uses conventional fiber prove, however, displacement signal and reflection coefficient signal are simultaneously detected with it, where illumination fiber functions for both irradiating a target plane and detecting reflection light from the target. An experimental setup consists of commercially available fiber prove and a laser diode was bulit, and it was found that measuring error was less than 0.05 μm even in case of target reflection coefficient changing from 40% to 95%. In this paper, measuring principle and design method for the optical system are described, also, some experimental results are discussed.


Archive | 1994

Wafer transport method

Yoshio Kawamura; Yoshifumi Kawamoto; Fumihiko Uchida; Kenichi Mizuishi; Natsuki Yokoyama; Eiichi Murakami; Yoshinori Nakayama; Eiichi Seya


Archive | 1993

Methods for measuring optical system, and method and apparatus for exposure using said measuring method

Eiichi Seya; Massaaki Ito; Soichi Katagiri; Tsuneo Terasawa; Minoru Hidaka; Eiji Takeda; Norio Saitou

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