Emmanuel Ossei-Wusu

Optimized Cu-Contacted Si Nanowire Anodes for Li Ion Batteries Made in a Production Near Process

Anodically etching macropores in Si substrates followed by chemical over-etching and Cu galvanics allows producing Si nanowire anodes for Li ion batteries with optimized geometry. This paper focuses on the optimizations of the process chain. The times for key processes could be substantially reduced while concomitantly improving the quality and the process window. The process chain now is close to enabling mass production on 200 mm wafers

New Applications of Electrochemically Produced Porous Semiconductors and Nanowire Arrays

The growing demand for electro mobility together with advancing concepts for renewable energy as primary power sources requires sophisticated methods of energy storage. In this work, we present a Li ion battery based on Si nanowires, which can be produced reliable and cheaply and which shows superior properties, such as a largely increased capacity and cycle stability. Sophisticated methods based on electrochemical pore etching allow to produce optimized regular arrays of nanowires, which can be stabilized by intrinsic cross-links, which serve to avoid unwanted stiction effects and allow easy processing.

Smoothening the Pores Walls in Macroporous n-Si

Our work reports on the etching of very smooth pores in n-Si with backside illumination. From the point of view of the so- called current burst model we explain the origin of the roughness on macropore walls. By trying different types of electrolytes at very low or moderate pH, electrolytes with very small dissolution rates of SiO2, or etching at very low temperatures, we show that the roughness of the walls can be controlled. Finally we propose to use a viscous electrolyte which lead to a roughness of only 9 nm on a 800 x 800 nm2 area which is a factor 5 smaller than the roughness observed for aqueous electrolytes.

Analysis of p-Si macropore etching using FFT-impedance spectroscopy

The dependence of the etch mechanism of lithographically seeded macropores in low-doped p-type silicon on water and hydrofluoric acid (HF) concentrations has been investigated. Using different HF concentrations (prepared from 48 and 73 wt.% HF) in organic electrolytes, the pore morphologies of etched samples have been related to in situ impedance spectra (IS) obtained by Fast Fourier Transform (FFT) technique. It will be shown that most of the data can be fitted with a simple equivalent circuit model. The model predicts that the HF concentration is responsible for the net silicon dissolution rate, while the dissolution rate selectivity at the pore tips and walls that ultimately enables pore etching depends on the water content. The ‘quality’ of the pores increases with decreasing water content in HF/organic electrolytes.