Erman Erdoğan

InGaN thin film deposition on Si(100) and glass substrates by termionic vacuum arc

Group-III nitride semiconductors covering infrared, visible and ultraviolet spectral range has direct band gaps changing from 0,7 eV (InN) to 3,4 eV (GaN). LEDs emit red, blue, green light, ultraviolet (UV) laser diodes (LD), UV light detectors and high power electronic devices are obtained and commercialized based on group-III nitride materials. InGaN semiconductor can be deposited by different techniques such as molecular beam epitaxy (MBE), metal organic chemical vapor deposition (MOCVD). In this study, InGaN thin films were prepared on Si and glass substrates as well as on GaN layer by termionic vacuum arc (TVA) which is a plasma asisted thin film deposition technique. The film was deposited at 10-6 torr working pressure, 18A filament current. Plasma was produced at 200 V with 0,6A plasma current. The purpose of this research is to investigate the properties of InGaN thin films. X-ray diffraction (XRD) spectrophotometer was used to analyze microstructure of the deposited films. Scanning electon microscopy (SEM) were used for surface morphology characterizations. Compositional analysis was done by energy dispersive X-ray spectroscopy (EDAX).

Controlling of the optical properties of the solutions of the PTCDI-C8 organic semiconductor

N,N′-Dioctyl-3,4,9,10 perylenedicarboximide (PTCDI-C8) organic semiconductor have vast applications in solar cells, thermoelectric generators, thin film photovoltaics and many other optoelectronic devices. These applications of the materials are based on their spectral and optical properties. The solutions of the PTCDI-C8 for different molarities were prepared and the spectral and optical mesaurements were analyzed. Effects of the molarities on optical properties were investigated. Vibronic structure has been observed based on the absorption bands of PTCDI-C8 semiconductor with seven peaks at 2.292, 2.451, 2.616, 3.212, 3.851, 4.477 and 4.733 eV. The important spectral parameteres such as molar/mass extinction coefficients, absorption coefficient of the PTCDI-C8 molecule were calculated. Optical properties such as angle of incidence/refraction, optical band gap, real and imaginary parts of dielectric constant, loss factor and electrical susceptibility of the the PTCDI-C8 were obtained. Finally, we discussed these parameters for optoelectronic applications and compared with related parameters in literature.

Fundamental properties of PTCDI-C8 semiconductor for optoelectronic and photonic applications

In this study, we investigated fundamental properties such as electrical and optical properties of the N,N′-Dioctyl-3,4,9,10 perylenedicarboximide (PTCDI-C8) Organic Semiconductor (OSC) material for optoelectronic and photonic applications. The important spectral parameters such as mass extinction coefficient and transmittance spectrum of the PTCDI-C8 molecule were calculated. Optical properties such as refractive index, optical band gap, real and imaginary parts of dielectric constants of the PTCDI-C8 were obtained. The electrical and optical conductance properties were also investigated. The advantages and disadvantages of obtained fundamental parameters were determined for optoelectronic and photonic applications.