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Featured researches published by Ewa Tocha.


Soft Matter | 2009

Surface Relaxations of Poly (methyl methacrylate) Assessed by Friction Force Microscopy on the Nanoscale

Ewa Tocha; Holger Schönherr; G. Julius Vancso

A variation of the spatial distribution of segments has been anticipated for polymer chains at free surfaces. This effect, which should alter surface viscoelastic properties in comparison with the bulk, remained hitherto a controversial issue in the literature. We here present the first comprehensive, quantitative AFM study of surface relaxations of poly(methyl methacrylate) (PMMA) to address the experimental shortcomings experienced so far in addressing the top nanoscale layer. The broad range of scanning velocities accessible through the use of a high velocity accessory, temperature control, and in particular tips with significantly differing radii, allowed us to cover a frequency range from 1 to 107 Hz. Friction data acquired at various temperatures and velocities were successfully shifted to yield a single mastercurve in which the onset of the α- and the β-relaxation processes of PMMA were identified. The substantially reduced activation energies (Eaα ∼ 110 kJ/mol and Eaβ = 35 kJ/mol) and the significantly higher relaxation frequencies as compared to the bulk support the notion of a significantly higher mobility of the macromolecules present at the free surface of glassy polymers.


Review of Scientific Instruments | 2005

Development of a high velocity accessory for atomic force microscopy-based friction measurements

Ewa Tocha; Tomasz Stefański; Holger Schönherr; G. Julius Vancso

A high velocity accessory for friction force microscopy measurements for velocities up to the mm/s range was developed for a commercial stand-alone atomic force microscope (AFM). The accessory consists of a shear piezo element, which rapidly displaces the sample in the lateral direction, perpendicular to the main axis of the AFM cantilever. Friction forces, which are acquired via conventional optical beam deflection detection, can thus be measured as a function of velocity and load in controlled environment (0–40% relative humidity and 0–40°C). Using the accessory, a broad range of velocities up to several mm/s can be accessed independent of the lateral scan size up to a maximum scan size of 1000nm. The velocity dependence of friction forces and coefficients was measured on organic [poly(methylmethacrylate)], as well as inorganic [oxidized Si(100)] samples to demonstrate the feasibility and underline the importance of high velocity nanotribology using this accessory.


Langmuir | 2006

Quantitative nanotribology by AFM: a novel universal calibration platform.

Ewa Tocha; Holger Schönherr; G. Julius Vancso


Topics in Current Chemistry | 2008

Friction and Surface Dynamics of Polymers on the Nanoscale by AFM

Holger Schönherr; Ewa Tocha; G. Julius Vancso


Langmuir | 2007

Calibration of friction force signals in atomic force microscopy in liquid media.

Ewa Tocha; Jing Song; Holger Schönherr; G. Julius Vancso


Polymer | 2011

Compared Structure and Morphology of Nylon-12 and 10-Polyurethane Lamellar Crystals

Carlos E. Fernández; Marta Bermúdez; A. Alla; Sebastián Muñoz-Guerra; Ewa Tocha; Gyula J. Vancso


Journal of the American Ceramic Society | 2005

Influence of Grain Size and Humidity on the Nanotribological Properties of Wear‐Resistant Nanostructured ZrO2 Coatings: An Atomic Force Microscopy Study

Ewa Tocha; Holger Schönherr; G. Julius Vancso; Natasha Siebelt


Journal of the American Ceramic Society | 2008

Low Friction in CuO‐Doped Yttria‐Stabilized Tetragonal Zirconia Ceramics: A Complementary Macro‐ and Nanotribology Study

Ewa Tocha; H.R. Pasaribu; D.J. Schipper; Holger Schönherr; G. Julius Vancso


Surface Design; Applications in Bioscience and Nanotechnology | 2009

Quantitative Lateral Force Microscopy

Holger Schönherr; Ewa Tocha; Jing Song; G. Julius Vancso


Dutch Polymer Days, DPD 2008 | 2008

Intelligent Organometallic Polymer Brushes: Switching Friction by Electrochemical Redox Stimuli

Jing Song; Ewa Tocha; W. Shi; Holger Schönherr; Gyula J. Vancso

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G. Julius Vancso

MESA+ Institute for Nanotechnology

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Mark A. Hempenius

MESA+ Institute for Nanotechnology

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Natasha Siebelt

MESA+ Institute for Nanotechnology

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S Zou

MESA+ Institute for Nanotechnology

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Yujie Ma

MESA+ Institute for Nanotechnology

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