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Ewald Losert

Novartis

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Publication

Featured researches published by Ewald Losert.

Archive | 1982

Photopolymerization process employing compounds containing acryloyl group and anthryl group

George E. Green; Ewald Losert; John G. Paul

Archive | 1985

Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface

Christopher George Dr. Demmer; Edward Irving; Ewald Losert

Archive | 1978

Process for the production of solder masks for printed circuits

Ewald Losert; Heinz Dr Rembold

Archive | 1984

Photosensitive coating composition and the use thereof for protective purposes

Thaddeus Dr Audykowski; Anton Mentha; Ewald Losert

Archive | 1973

Process for the manufacture of printed multi-layer circuits

Abdul-Cader Zahir; Heinz Remabold; Ewald Losert

Archive | 1982

Photopolymerisation process with two exposures of a single layer

John G. Paul; Bernard Peter Stark; Ewald Losert

Archive | 1978

Process for the application of soldering masks to printed circuits with through holes for contacting

Ewald Losert; Heinz Dr Rembold

Archive | 1982

Process for purifying organic solutions

Nikolaus Jehle; Markus Th; er; Ewald Losert

Archive | 1988

Process for the production of photographically structurable coatings.

Nikolaus Jehle; Ewald Losert; Kurt Meier

Archive | 1975

Radiation polymerizable esters

George E. Green; Ewald Losert

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Heinz Dr Rembold

Novartis

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George E. Green

Novartis

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Nikolaus Jehle

Novartis

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Anton Mentha

Novartis

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Christopher George Dr. Demmer

Novartis

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Edward Irving

Novartis

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John G. Paul

Novartis

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Thaddeus Dr Audykowski

Novartis

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Kurt Meier

Novartis

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Abdul-Cader Zahir

Novartis

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