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Featured researches published by F. Rousseau.


Chemical Papers | 2012

Role of reactive species in processing materials at laboratory temperature by spray plasma devices

Mehrdad Nikravech; Kamal Baba; Bernard LeNeindre; F. Rousseau

Processing the aerosol of metal salts in non-equilibrium plasma represents a promising technique that combines the advantages of spray pyrolysis with the high reactivity of plasmas at nearlaboratory temperature in order to produce mixed-oxides and perovskite materials. The aim of this paper is to describe the principles of this new technique and to present the various applications and latest developments. This technique’s capacity to deposit various mixed metal oxides with precise stoichiometry is demonstrated. It is shown that oxidant plasma species play a key role in the chemical transformation of starting materials into oxides at laboratory temperature, while the configuration of the reactor determines the morphology and texture of the deposited layers. Two different reactor configurations are presented. The porous layers of LaxSr1−xMnO3 as the cathode for fuel cells were synthesised in a wave shock reactor configuration, while nanostructured ZnO-Al layers to form a transparent conductive cathode for photovoltaic cells were deposited in the spray plasma reactor of the latest generation for this technique. The experimental results emphasise the role of plasma species in the rate of chemical reactions and in the chemical composition of the deposited layers.


photovoltaic specialists conference | 2015

Study of a low power plasma reactor for the synthesis of doped and undoped zinc oxide used as the window layer in CIGS solar cells

Alexandre Ma; Frédérique Donsanti; F. Rousseau; Daniel Morvan

The Low Power Plasma Reactor is an original process which allows a rapid deposition of ZnO thin films with calibrated thickness. The deposition is performed by the spraying of an aqueous precursor solution in cold plasma. The final optimizations allow high average growth rates reaching 0.6 nm/s. Characterization of films (XRD, FTIR, Transmittance, resistivity measures) reports the expected crystallinity, composition, the needed transparency and a calculated optical gap value ranging between 3.2-3.3 e V. The resistivity of layers was studied to be decreased in order to improve the electric properties of thin films. The performances of Cu(In,Ga)Se2 solar cells with a plasma sprayed intrinsic ZnO (i-ZnO) layer showed efficiencies around 15% (equivalent value with classic sputtered i-ZnO).


Surface & Coatings Technology | 2011

Deposition of thick and 50% porous YpSZ layer by spraying nitrate solution in a low pressure plasma reactor

F. Rousseau; C. Fourmond; F. Prima; M.H. Vidal Serif; O. Lavigne; Daniel Morvan; P. Chereau


Surface & Coatings Technology | 2007

Deposit of dense YSZ electrolyte and porous NiO-YSZ anode for SOFC device by a low pressure plasma process

F. Rousseau; S. Awamat; Mehrdad Nikravech; Daniel Morvan; Jacques Amouroux


Surface & Coatings Technology | 2007

Deposition of thick oxide layers from solutions in a low pressure plasma reactor

F. Rousseau; S. Awamat; Daniel Morvan; Jacques Amouroux; R. Mevrel


Surface & Coatings Technology | 2008

Yttria-stabilized zirconia thick coatings deposited from aqueous solution in a low pressure plasma reactor

F. Rousseau; S. Awamat; Daniel Morvan; F. Prima; R. Mevrel


Journal of Applied Electrochemistry | 2006

Electrochemical studies on Sr doped LaMnO3 and LaCoO3 layers synthesised in a low-pressure plasma reactor equipped with a convergent nozzle

F. Rousseau; Mehrdad Nikravech; Linda Benabdelmoumène; Cédric Guyon; Daniel Morvan; Jacques Amouroux


High Temperature Material Processes | 2006

OPTICAL EMISSION SPECTROSCOPY OF A SUPERSONIC LOW-PRESSURE PLASMA REACTOR USED TO SYNTHESIS SOFC CATHODES THIN LAYERS

F. Rousseau; M. Nickravech; S. Awamat; Daniel Morvan; Jacques Amouroux


High Temperature Material Processes | 2004

INVESTIGATION ON SUPERSONIC GAS FLOW COUPLED WITH AN INDUCTIVE LOW-PRESSURE PLASMA USED FOR THE SYNTHESIS OF SOFC MATERIAL

F. Rousseau; M. Nikravech; E. Francke; J. Milpied; Daniel Morvan; Jacques Amouroux


High Temperature Material Processes | 2003

EFFECTS OF PLASMA PARAMETERS ON THE PROPERTIES OF La 1-x Sr x MnO 3 THIN LAYERS DEPOSITED IN LOW-PRESSURE RF PLASMA WAVE SHOCK REACTOR

M. Nikravech; F. Rousseau; Daniel Morvan; Jacques Amouroux

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Marie-Pierre Bacos

Office National d'Études et de Recherches Aérospatiales

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Catherine Rio

Office National d'Études et de Recherches Aérospatiales

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F. Prima

Centre national de la recherche scientifique

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Mehrdad Nikravech

Pierre-and-Marie-Curie University

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