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Dive into the research topics where Fabio Vidimari is active.

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Featured researches published by Fabio Vidimari.


Design, Simulation, and Fabrication of Optoelectronic Devices and Circuits | 1994

Design of Al-free and Al-based InGaAs/GaAs strained quantum well 980-nm pump lasers including thermal behavior effects on E/O characteristics

Sergio Pellegrino; M. G. Re; C. Beoni; D. Reichenbach; Fabio Vidimari

A 2D thermal simulator and a model to evaluate high power lasers characteristics have been developed. With these models it was possible to optimize cavity length of InGaAs/GaAs (Multiple) Quantum Well 980 nm lasers realized both with Al-based and Al-free confining layers. A comprehensive experimental investigation of the influence of cavity length and temperature on the laser emission wavelength has been performed. This allows a fine trimming of the devices to match the Erbium doped fiber absorption bandwidth.


Design, Simulation, and Fabrication of Optoelectronic Devices and Circuits | 1994

Disordering of InGaAs/GaAs strained quantum well structures induced by rare gas ion implantation

Sergio Pellegrino; C. Pignataro; Manuela Caldironi; M. Dellagiovanna; Fabio Vidimari; Alberto Carnera; A. Gasparotto

In this work we have investigated the effect of various implantation schemes on In(0.2)GaAs/GaAs/AlGaAs Single Quantum Well, where the implanted species are Argon and Helium, with doses in the range 1E12 to 1E14 at cm^2, at energy spanning 270 - 400 KeV and 30 to 50 KeV for Ar and He, respectively. Repetitive annealing processes were carried out between 735 and 870 degree(s)C and the interdiffusion was deduced by photoluminescence measurements. A maximum of 20 nm shift from He ion implanted Quantum Well with an high degree of reconstruction has been recorded, thus allowing the application of this disordering scheme for the realization of optoelectronic devices.


Archive | 1995

Method for the preparation and passivation of the end mirrors of a high emissive power semiconductor laser and related laser device

Giudice Massimo Del; Sergio Pellegrino; Fabio Vidimari; M. G. Re


Archive | 1990

Fabrication process of laser structures with lateral confinement at very low threshold current

Fabio Vidimari; Sergio Pellegrino


Archive | 1990

Fabrication process of laser structures with lateral confinement at very low threshold current and related laser devices obtained by this process

Fabio Vidimari; Sergio Pellegrino


Archive | 1990

PROCESS TO MANUFACTURE LASER STRUCTURES WITH LATERAL CONFINEMENT AT VERY LOW THRESHOLD CURRENT AND RELEVANT LASER DEVICES SO OBTAINED

Fabio Vidimari; Sergio Pellegrino


Archive | 1994

Semiconductor laser having low current threshold

Sergio Pellegrino; Massimo del Giudice; Fabio Vidimari


Archive | 1995

高出力半導体レーザのエンド・ミラーを準備しパッシベーションする方法および関連するレーザ・デバイス

Giudice Massimo Del; Sergio Pellegrino; M. G. Re; Fabio Vidimari; セルジオ・ペルグリーノ; フアビオ・ビデイマーリ; マツシモ・デル・ジウデイーチエ; ミケーレ・ジヨバンニ・レ


Archive | 1995

Verfahren zur Vorbehandlung und Passivierung von Endspiegeln eines Hochleistungshalbleiterlasers sowie eine entsprechende Laservorrichtung

Giudice Massimo Del; Sergio Pellegrino; Fabio Vidimari; M. G. Re


Archive | 1994

Halbleiterlaser mit niedrigem Schwellstrom und zugehöriges Herstellungsverfahren Semiconductor laser with low threshold current and associated production method

Sergio Pellegrino; Fabio Vidimari; Giudice Massimo Del

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