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Dive into the research topics where Faul Juergen is active.

Publication


Featured researches published by Faul Juergen.


Archive | 2000

Speicher mit grabenkondensator und auswahltransistor und verfahren zu seiner herstellung

Temmler Dietmar; Benzinger Herbert; Karcher Wolfram; Pusch Catharina; Schrems Martin; Faul Juergen


Archive | 2001

Epitaxy layer and method for its production

Temmler Dietmar; Benzinger Herbert; Karcher Wolfram; Pusch Catharina; Schrems Martin; Faul Juergen


Archive | 2000

TRENCH CAPACITOR AND MANUFACTURE THEREOF

Wurster Kai; Schrems Martin; Faul Juergen; Morhard Klaus-Dieter; Lamprecht Alexandra; Dequiedt Odile


Archive | 1999

METHOD AND INSTRUMENT FOR MEASURING PROXIMITY EFFECT BY MEASURING CAPABILITY OR DEVICE

Haensch Wilfried; Prein Frank; Faul Juergen


Archive | 2000

Method for forming the gate oxide of metal-oxide-semiconductor devices

Vogelsang Thomas; Haensch Wilfried; Faul Juergen


Archive | 2005

Verfahren zum BPSG-Glasverfüllen von Öffnungen in Gate-Elektrodenschichten

Amon Juergen; Faul Juergen; Schuster Thomas; Staub Ralf


Archive | 2005

Method for simultaneous forming of different gate regions of FET structure, starting with silicon substrate with two FET regions and simultaneous formation of stray layer over both FET regions

Mueller Ralf; Popp Martin; Faul Juergen


Archive | 2005

Method for implanting semiconductor wafer used in production of integrated circuit involves applying amorphous layer on substrate, applying antireflection layer and resist layer, structuring resist layer and implanting ions

Henke Dietmar; Faul Juergen


Archive | 2005

Verfahren zur Herstellung einer Halbleiterstruktur mit mehreren Gate-Stapeln

Amon Juergen; Faul Juergen; Gruening Ulrike; Jakubowski Frank; Schuster Thomas; Strasser Rudolf


Archive | 2005

Process for implanting a semiconductor wafer, used in production of transistors, comprises preparing the wafer with a substrate, applying a resist layer on the surface of the substrate, structuring the resist layer and further processing

Bram Andreas; Eckart Udo; Sachse Hermann; Faul Juergen

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