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Spectrochimica Acta Part B: Atomic Spectroscopy | 1991

Instantaneous and delayed responses of line intensities to interruption of the RF power in an argon inductively coupled plasma

Fhag Frank Fey; Ww Winfred Stoffels; van der Jjam Joost Mullen; van der B Bart Sijde; Dc Daan Schram

Abstract Instantaneous and delayed responses of line intensities to the sudden interruption of the RF power have been studied in an argon inductively coupled plasma (ICP). The instantaneous responses are caused by equilibrium shifts in the balances of elementary processes that control the populations of the excited states. It has been found that excited levels of Ar and H are predominantly populated by recombination of free electrons with ionic species, while most levels of metals such as Mg, Cd, Na, Fe, Al and Cu are populated by excitation from the ground state atom. Also charge transfer between Mg 1 and Ar 1 has been observed in the temporal behaviour of line intensities of two Mg + states, quasi-resonant for charge transfer. Furthermore, we observed that in the inner part of the plasma the temperature remains constant during the recombination decay time, after an initial cooling of the electrons to the heavy particle temperature. When the power is switched on again, the electron temperature seems to increase temporarily to a value that is higher than the steady state value. The delayed responses are caused by disturbances created in the expansion zone of the plasma during and after the interruption. It was found that these disturbances travel through the plasma with a velocity of 12 m s −1 .


Spectrochimica Acta Part B: Atomic Spectroscopy | 1992

The effect of evaporation on the analyte emission intensities during power interruption in an inductively coupled plasma

Fhag Frank Fey; de Jm Hans Regt; van der Jjam Joost Mullen; Dc Daan Schram

Abstract A power interruption technique is used to study the population balances of excited states of analytes in an inductively coupled plasma (ICP). Measurements on Li analyte emission show that the Boltzmann balance of excitation of and de-excitation to the ground state is the dominant population process for the lower excited levels. During the power interruption, changes in the excitation and de-excitation flows are visible and it turns out that the ionization degree of Li depends strongly on position, central flow and plasma power. The results cannot be explained unless evaporation of analyte is assumed to have an important impact on the excitation flow in the Li system.


Electronic Notes in Theoretical Computer Science | 1996

Fundamental description of spectrochemical ICP discharges

Dc Daan Schram; van der Jjam Joost Mullen; de Jm Hans Regt; Da Benoij; J Jeroen Jonkers; Fhag Frank Fey


Journal of High Temperature Chemical Processes | 1992

On the modelling of flowing thermal plasmas, applied to an inductively coupled plasma

Da Benoij; de Ecjn Jong; Fhag Frank Fey; van der Jjam Joost Mullen; Dc Daan Schram


Journal of High Temperature Chemical Processes | 1992

The response of metal states to interruption of an inductively coupled plasma

Fhag Frank Fey; Ww Winfred Stoffels; E Eva Stoffels-Adamowicz; Da Benoij; de Jm Hans Regt; van der Jjam Joost Mullen; Dc Daan Schram


Archive | 1991

A pulsed inductively coupled plasma : experiments and modeling

van der Jjam Joost Mullen; Fhag Frank Fey; E Eva Stoffels-Adamowicz; Ww Winfred Stoffels; Da Benoij; de Ecjn Jong; Dc Daan Schram


Archive | 1991

A general program for the calculation of flowing thermal plasmas, applied to an inductively coupled plasma

de Ecjn Jong; van der Jjam Joost Mullen; Fhag Frank Fey; Da Benoij


Archive | 1991

Balansen en kinetiek in een inductief gekoppeld plasma

Fhag Frank Fey; Ww Winfred Stoffels; E Eva Stoffels-Adamowicz; Jjam Joost van der Mullen; B Bart van der Sijde; Dc Daan Schram


Archive | 1991

Instantaneous and delayed responses of line intensities to pulsation of the RF power in an argon ICP

Ww Winfred Stoffels; E Eva Stoffels-Adamowicz; Fhag Frank Fey; van der Jjam Joost Mullen


Archive | 1991

A collisional-radiative model for elements in an inductively coupled plasma

E Eva Stoffels-Adamowicz; Ww Winfred Stoffels; Da Benoij; Fhag Frank Fey; van der Jjam Joost Mullen

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van der Jjam Joost Mullen

Eindhoven University of Technology

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Dc Daan Schram

Eindhoven University of Technology

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Ww Winfred Stoffels

Eindhoven University of Technology

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E Eva Stoffels-Adamowicz

Eindhoven University of Technology

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de Jm Hans Regt

Eindhoven University of Technology

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J Jeroen Jonkers

Eindhoven University of Technology

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Jjam Joost van der Mullen

Eindhoven University of Technology

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van der B Bart Sijde

Eindhoven University of Technology

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