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Dive into the research topics where Frank Steinbacher is active.

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Featured researches published by Frank Steinbacher.


international electron devices meeting | 2014

Imaging with organic and hybrid photodetectors

Sandro Francesco Tedde; Patric Büchele; Rene Fischer; Frank Steinbacher; Oliver Schmidt

Organic semiconductors provide exiting new opportunities for the realization of flat panel image sensors as they can be processed from the solution phase on large areas at low cost. In particular the high charge separation efficiency obtained in a bulk heterojunction (BHJ) enables the realization of organic photodiodes (OPDs). The spectral sensitivity of OPDs can be tailored to cover wavelengths ranging from the visible to the near infrared region. These sensitivities match perfectly to a variety of X-ray scintillators enabling a further improvement in the sensitivity range. In combination with an amorphous silicon (a-Si) thin film transistor (TFT) backplane technology, visible, near infrared (NIR) and X-ray image sensors have been realized. Thin film OPDs have been used in combination with a cesium iodide (CsI) scintillator in a traditional stacked geometry, proofing state-of-the art performance. Even more, it is possible to blend X-ray absorbing particles directly into the organic semiconductor thereby enabling quasi-direct X-ray converters with the promise to achieve a modulation transfer function (MTF) that is as high as in direct converting materials such as amorphous Selenium.


Journal of Photonics for Energy | 2011

Cheap p- and n-doping for highly efficient organic devices

Ralf Krause; Frank Steinbacher; Günter Schmid; Jan Hauke Wemken; Arvid Hunze

Electrically doped, organic transport layers are important for todays high efficiency organic (opto-)electronic devices. Doped organic layers have a strongly increased free charge carrier density compared to their undoped counterparts and also improve the charge carrier injection from adjacent electrodes into the organics. For practical applications, especially in optoelectronics, these layers have to have low absorption in the wavelength range of interest. The two nearly colorless p - and n -doping materials, rhenium heptoxide and cesium carbonate, are investigated focusing on their conductivity enhancement, injection improvement, and voltage drop over doped transport layers in organic light emitting diodes. They show very good doping properties already at moderate doping concentrations and prove that they can be used in variable thicknesses without a significant voltage increase. This makes them cheap, low absorbing alternatives to todays, well-established doping systems.


Organic Electronics | 2012

Determining emissive dipole orientation in organic light emitting devices by decay time measurement

Lieven Penninck; Frank Steinbacher; Ralf Krause; Kristiaan Neyts


Physica Status Solidi (a) | 2012

Triplet exciton transfer mechanism between phosphorescent organic dye molecules

Frank Steinbacher; Ralf Krause; Arvid Hunze; A. Winnacker


Organic Electronics | 2011

Simplified, yellow, organic light emitting diode by co-evaporation of premixed dye molecules

Frank Steinbacher; Ralf Krause; Arvid Hunze; A. Winnacker


Archive | 2012

Schichtverbund zur Erzeugung elektrischer Energie aus Licht

Arvid Hunze; Florian Jakubka; Ralf Krause; Frank Steinbacher


Archive | 2014

Arrangement of photovoltaic module array, has filter arrangement designed such that alternating current harmonics abutting against direct current input of inverter is suppressed and not allowed to pass toward module array

Helmut Eckert; Ralf Krause; Matthias Josef Martin; Markus Pfeifer; Frank Steinbacher


Archive | 2011

Verfahren zur Herstellung einer Siliziumschicht auf einem Substrat

Helmut Eckert; Ralf Krause; Günter Schmid; Frank Steinbacher


Archive | 2011

Layered composite for generating electrical energy from light

Arvid Hunze; Florian Jakubka; Ralf Krause; Frank Steinbacher


Archive | 2011

Method for manufacturing silicon layer on substrate in photovoltaic cell in laboratory, involves utilizing agent to form amorphous or part-crystalline silicon after heating layer at temperature below silicon melting temperature

Helmut Eckert; Ralf Krause; Günter Schmid; Frank Steinbacher

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