Frederic Rotman
Air Liquide
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Publication
Featured researches published by Frederic Rotman.
Proceedings. Japan IEMT Symposium, Sixth IEEE/CHMT International Electronic Manufacturing Technology Symposium | 1989
Frederic Rotman; D. Navarro; S. Mellul; M. Miyasaka; J.L. Aucouturier
The authors studied the effects on copper thick-film systems of several gaseous oxidizers (O/sub 2/, CO/sub 2/, N/sub 2/O, H/sub 2/O) injected into nitrogen furnace atmospheres, either throughout the whole furnace or only into its burnout zone. SEM (scanning electron microscopy) examinations of the copper film microstructures correlated with properties such as adhesion, solderability, and resistivity allows the establishment of ideal firing atmosphere conditions for copper thick-film manufacturing: namely, it is necessary to restrict the atmosphere doping to the burnout zone; and oxygen and water vapor are the more effective gaseous dopants. Specific equipment has been developed to control injection of these dopants into the furnace atmosphere.<<ETX>>
Archive | 1994
Robert W. Connors; Frederick W. Giacobbe; Benjamin Jurcik; Frederic Rotman; Kevin P. Mckean
Archive | 1995
Kevin P. Mckean; Frederic Rotman; Robert W. Connors
Archive | 1990
Frederic Rotman; Yannick Rancon; Philippe Queille; Michel Olivier
Archive | 1991
Pierre Jalby; Pierre Claverie; Frederic Rotman; Masao Kimura; Jean-Marie Friedt; Juichi Arai
Archive | 1990
Frederic Rotman; Yannick Rancon; Philippe Queille; Michel Olivier
Archive | 1991
Pierre Jalby; Pierre Claverie; Frederic Rotman; Masao Kimura; Jean-Marie Friedt; Juichi Arai
Microelectronics International | 1991
Frederic Rotman; D. Navarro; Sylvie Mellul
Archive | 1990
Frederic Rotman; Yannick Rancon; Philippe Queille; Michel Olivier
Archive | 1990
Sylvie Mellul; Frederic Rotman; Dominique Navarro
