Frederick Hayes Dill
HGST
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Optical Microlithography XVIII | 2005
Frederick Hayes Dill
This paper will go back 30+ years to look at the work that led toward the lithographic models we use today. Although lithography was a very old art, going back to the 1840s, it was relatively new to what we now know as microelectronics. While circuit designers were already beginning to use sophisticated design and modeling techniques, most process models were extremely simple and often not very accurate. For those working in photolithography, there was almost nothing except for optical image models which, while helpful, were not a model of the lithography process. The original publication of this work was in a series of articles in the IEEE Transactions on Electron Devices, Vol ED-22, July 1975.
Archive | 2002
Marie-Claire Cyrille; Frederick Hayes Dill; Cherngye Hwang; Jui-Lung Li
Archive | 2005
Marie-Claire Cyrille; Frederick Hayes Dill; Jui-Lung Li
Archive | 2004
Frederick Hayes Dill; Jeffrey S. Lille; Son Van Nguyen; Hugo Alberto Emilio Santini
Archive | 2003
Ananda Baer; Marie-claire Cyrilla; Frederick Hayes Dill; Benjamin Lu Chen Wang; Charngye Hwang; Mustafa Michael Pinarbasi
Archive | 2000
Frederick Hayes Dill; Robert E. Fontana; Richard Hsiao; Hugo Alberto Emilio Santini
Archive | 2004
Marie-Claire Cyrille; Frederick Hayes Dill; Jui-Lung Li
Archive | 2005
Tsung Yuan Chen; Frederick Hayes Dill; James Mac Frietag; Kuok San Ho; Wipul Pemsiri Jayasekara; Kim Y. Lee; Mustafa Michael Pinarbasi; Ching Hwa Tsang; Pactrick Rush Webb
Archive | 2003
Amanda Baer; Marie-Claire Cyrille; Frederick Hayes Dill; Wipul Pemsiri Jayasekara; Jui-lung Li; Hugo Alberto Emilio Santini; Benjamin Lu Chen Wang
Archive | 2004
Frederick Hayes Dill; Meng Ding; Kuok San Ho; J. A. Katine; Scott Arthur MacDonald; Huey-Ming Tzeng