Fu-Liang Yang

Method for simultaneously fabricating a DRAM capacitor and metal interconnections

Method for simultaneously forming capacitor plate and metal contact structures for a high density DRAM device

Method of fabricating a self-aligned contact

Method for manufacturing double-crown capacitors self-aligned to node contacts on dynamic random access memory

Method of making a shallow trench isolation for ULSI formation via in-direct CMP process

Method of fabricating single crown, extendible to triple crown, stacked capacitor structures, using a self-aligned capacitor node contact

Method of forming an isolation region in a semiconductor substrate

Stacked capacitor DRAM structure featuring a multiple crown shaped polysilicon lower electrode

Method to solve the dishing issue in CMP planarization by using a nitride hard mask for local inverse etchback and CMP

Method for eliminating CMP induced microscratches