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Dive into the research topics where Futoshi Yamamoto is active.

Publication


Featured researches published by Futoshi Yamamoto.


Journal of Lightwave Technology | 2005

Zero-chirp broadband Z-cut Ti:LiNbO/sub 3/ optical modulator using polarization reversal and branch electrode

Satoshi Oikawa; Futoshi Yamamoto; Junichiro Ichikawa; Sunao Kurimura; Kenji Kitamura

In this paper, a novel zero-chirp Z-cut LiNbO/sub 3/ optical modulator using ferroelectric polarization reversal and a branch electrode is proposed. The optical modulator with a Ti-diffused optical waveguide had a very small chirp parameter, which was less than 0.02. The performance showed a preferable 10-Gb/s eye opening and bias stability.


quantum electronics and laser science conference | 2006

Highly efficient wavelength converter for photonic network

Yusuke Usui; Toru Okubo; Hirochika Nakajima; Masayuki Motoya; Sunao Kurimura; Futoshi Yamamoto; Junichiro Ichikawa

Efficient wavelength converter was demonstrated in low-loss adhered ridge waveguide fabricated by dry etching in periodically poled Mg:LN. We obtained highest SHG efficiency of 4500 %/W in telecom band for 32 mm interaction length.


conference on lasers and electro-optics | 2005

Quasi-phase matched difference-frequency generator with adhered ridge waveguide fabricated by dry etching method

Yuji Kato; Yusuke Usui; Hirochika Nakajima; Sunao Kurimura; Masayuki Motoya; Futoshi Yamamoto; Junichiro Ichikawa

We demonstrate 13 mm-long quasi-phase-matched difference-frequency generation device with adhered ridge waveguides fabricated by ECR-RIE dry etching method in periodically poled Zn:LN. The obtained SHG normalized conversion efficiency was 260%/Wcm/sup 2/ in the telecommunication band.


Proceedings of SPIE, the International Society for Optical Engineering | 2001

Application of microsandblast machining to LiNbO3 wafer surface for broadband modulators

Futoshi Yamamoto; Yuji Yamane; Naoki Mitsugi; Masataka Yokosawa; Hirotoshi Nagata

Machining technology for LiNbO3 (LN) wafer surface aiming a mass-production of broadband LN modulators is investigated. Although several manufacturers commercially supply 40G LN modulators, there are many difficulties in mass-production of such broadband LN modulators. For instance, in order to realize sufficiently broadened bandwidth performance, machining of LN wafer surfaces is necessary as demonstrated by ridge-waveguide modulators and devices using very-thin substrates. We focus the study on the machining technology of LN wafers applicable to mass- production based on micro-sandblast techniques. In order to demonstrate effectiveness of the micro-sandblast, 40G LN modulators designed to have a partially thinned substrate along RF-electrodes are experimentally fabricated.


Archive | 2011

Method for forming polarization reversal

Futoshi Yamamoto; Junichiro Ichikawa; Satoshi Oikawa; Sunao Kurimura; Kenji Kitamura


Archive | 2007

Optical Control Device and Manufacturing Method Thereof

Katsutoshi Kondou; Yuhki Kinpara; Futoshi Yamamoto; Junichiro Ichikawa


Archive | 2007

Photoregulation element and production method thereof

Katsutoshi Kondou; Yuhki Kinpara; Futoshi Yamamoto; Junichiro Ichikawa


Archive | 2009

Photo-regulation element and production method thereof

Katsutoshi Kondou; Yuhki Kinpara; Futoshi Yamamoto; Junichiro Ichikawa


Archive | 2006

Optical control element and method of manufacturing same

Junichiro Ichikawa; Futoshi Yamamoto; 太 山本; 潤一郎 市川


Archive | 2016

COMMUNI C A T I O NS X-cut LiNbO 3 optoelectronic device passivated by silicon nitride film

Futoshi Yamamoto; Yasuyuki Miyama; Hirotoshi Nagata; Sumitomo Osaka; Masumi Tamai

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Sunao Kurimura

National Institute for Materials Science

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Kenji Kitamura

National Institute for Materials Science

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Satoshi Oikawa

National Institute for Materials Science

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