G.J. Rees

A Monte Carlo investigation of multiplication noise in thin p/sup +/-i-n/sup +/ GaAs avalanche photodiodes

A Monte Carlo (MC) model has been used to estimate the excess noise factor in thin p/sup +/-i-n/sup +/ GaAs avalanche photodiodes (APDs). Multiplication initiated both by pure electron and hole injection is studied for different lengths of multiplication region and for a range of electric fields. In each ease a reduction in excess noise factor is observed as the multiplication length decreases, in good agreement with recent experimental measurements. This low noise behavior results from the higher operating electric field needed in short devices, which causes the probability distribution function for both electron and hole ionization path lengths to change from the conventionally assumed exponential shape and to exhibit a strong dead space effect. In turn this reduces the probability of higher order ionization events and narrows the probability distribution for multiplication. In addition, our simulations suggest that fur a given overall multiplication, electron initiated multiplication in short devices has inherently reduced noise, despite the higher feedback from hole ionization, compared to long devices.

Investigation of impact ionization in thin GaAs diodes

The electron and hole multiplication coefficients, M/sub e/ and M/sub h/, respectively, have been measured in thin GaAs homojunction PIN and NIP diodes and from conventional ionization analysis the effective electron and hole ionization coefficients, /spl alpha/ and /spl beta/, respectively, have been determined. The nominal intrinsic region thickness w of these structures ranges from 1.0 /spl mu/m down to 25 nm. In the thicker structures, bulk-like behavior is observed; however, in the thinner structures, significant differences are found. As the i-regions become thinner and the electric fields increase, the M/sub e//M/sub h/ ratio is seen to approach unity. The experimental results are modeled and interpreted using a semianalytical solution of the Boltzmann equation. In thin (w/spl les/0.1 /spl mu/m) devices the dead space effect reduces effective ionization coefficients below their bulk values at low values of carrier multiplication. However, overshoot effects compensate for this at extremely high fields (/spl ges/1/spl times/10/sup 3/ kV/cm).

A simple model to determine multiplication and noise in avalanche photodiodes

Avalanche multiplication and noise in 1.0, 0.5, 0.1, and 0.05 μm GaAs p+-i-n+ diodes have been calculated for both electron and hole initiated multiplication using a simple model which incorporates a randomly-generated ionization path length (RPL) and a hard-threshold dead space. We find that the mean multiplication obtained using this RPL model is in excellent agreement, even for the shortest structure, with that obtained from an analytical-band structure Monte Carlo (MC) model, which incorporates soft-threshold effects. However, it predicts slightly lower avalanche noise in the shorter devices. This difference results from the narrower ionization path length probability distribution and larger dead space of the hard-threshold RPL model at high electric fields as compared to the more realistic distribution function associated with the relatively sophisticated MC model.

Tailoring of internal fields in InGaAs/GaAs multiwell structures grown on (111)B GaAs

We present a study of internal field distributions in strained InGaAs/GaAs multiple quantum wells in p‐i‐n structures grown on (111)B‐oriented GaAs. Room temperature photocurrent spectroscopy shows clear blueshifting of the e1‐hh1 transition as the well fields are reduced by external bias. The relative length of total well to total barrier material is shown to be an important factor in determining the well and barrier fields. We demonstrate a photocurrent contrast ratio of 4.5:1 for only 3 V applied bias across a 25 quantum well In0.13Ga0.87As p‐i‐n diode and discuss the implication of our results to the design of high performance electro‐optic modulators and self electro‐optic effect devices in this material system.

Nonlocal effects in thin 4H-SiC UV avalanche photodiodes

The avalanche multiplication and excess noise characteristics of 4H-SiC avalanche photodiodes with i-region widths of 0.105 and 0.285 /spl mu/m have been investigated using 230-365-nm light, while the responsivities of the photodiodes at unity gain were examined for wavelengths up to 375 nm. Peak unity gain responsivities of more than 130 mA/W at 265 nm, equivalent to quantum efficiencies of more than 60%, were obtained for both structures. The measured avalanche characteristics show that /spl beta/>/spl alpha/ and that the /spl beta///spl alpha/ ratio remains large even in thin 4H-SiC avalanche regions. Very low excess noise, corresponding to k/sub eff/<0.15 in the local noise model, where k/sub eff/=/spl alpha///spl beta/(/spl beta///spl alpha/) for hole (electron) injection, was measured with 365-nm light in both structures. Modeling the experimental results using a simple quantum efficiency model and a nonlocal description yields effective ionization threshold energies of 12 and 8 eV for electrons and holes, respectively, and suggests that the dead space in 4H-SiC is soft. Although dead space is important, pure hole injection is still required to ensure low excess noise in thin 4H-SiC APDs owing to /spl beta///spl alpha/ ratios that remain large, even at very high fields.

Avalanche Multiplication in InAlAs

A systematic study of avalanche multiplication on a series of In 0.52Al0.48As p+-i-n+ and n +-i-p+ diodes with nominal intrinsic region thicknesses ranging from 0.1 to 2.5 mum has been used to deduce effective ionization coefficients between 220 and 980 kVmiddotcm-1. The electron and hole ionization coefficient ratio varies from 32.6 to 1.2 with increasing field. Tunneling begins to dominate the bulk current prior to avalanche breakdown in the 0.1-mum-thick structure, imposing an upper limit to the operating field. While the local model can accurately predict the breakdown in the diodes, multiplication is overestimated at low fields. The effects of ionization dead space, which becomes more significant as the intrinsic region thickness reduces, can be corrected for by using a simple correction technique

Temperature Dependence of Impact Ionization in Submicrometer Silicon Devices

Photomultiplication, initiated by both pure electron and pure hole injection, has been measured in submicrometer Si p+-i-n+ and n+-i-p+ diodes with intrinsic region thicknesses w between 0.1 and 0.8 mum, at temperatures between 15 and 420 K. A local analysis is used to extract the values of effective ionization coefficients. Values of bulk ionization coefficients, alpha and beta, are then deduced and parameterized in an extended form of Chynoweths expression to cover their dependence on both electric field and temperature. Multiplication at various temperatures can be recovered from these bulk coefficients by using a simple dead space correction. beta falls faster with temperature than alpha so that the ionization coefficient ratio, k=beta/alpha, decreases with temperature. Decreasing w reduces this temperature sensitivity, which is weaker than in GaAs, possibly because of the softer ionization threshold in Si

Avalanche noise measurement in thin Si p+-i-n+ diodes

The avalanche multiplication and excess noise properties of a range of submicron Si diodes have been investigated. In these thin diodes the excess noise is found to fall below that predicted by conventional local noise theory. Modeling of the multiplication and excess noise using a recurrence method, which includes the dead space for carrier ionization, gives good agreement with experiment. This suggests that the dead space can reduce the excess noise in submicron Si diodes.

Monte Carlo simulation of impact ionization and current multiplication in short GaAs diodes

We have modelled carrier transport and impact ionization in bulk GaAs and GaAs diodes using two Monte Carlo models, one using analytical band structure, the other employing more realistic pseudopotential band structure. Despite the relative lack of sophistication of the analytical model and the poor representation of band structure at higher energies, the analytical model reproduced accurate drift velocities, mean energies and impact ionization rates in good agreement with experiment and the more sophisticated model. Both models accurately simulated the diodes, agreeing well with experimental results and the two models also agreed with each other with respect to the microscopic aspects of the carrier transport in these devices.

Multiplication and excess noise characteristics of thin 4H-SiC UV avalanche photodiodes

The avalanche multiplication and excess noise characteristics of thin 4H-SiC avalanche photodiodes with an i-region width of 0.1 /spl mu/m have been investigated. The diodes are found to exhibit multiplication characteristics which change significantly when the wavelength of the illuminating light changes from 230 to 365 nm. These multiplication characteristics show unambiguously that /spl beta/>/spl alpha/ in 4H-SiC and that the /spl beta///spl alpha/ ratio remains large even in thin 4H-SiC diodes. Low excess noise, corresponding to k=0.1 in the local model where k=/spl alpha///spl beta/ for hole injection, was measured using 325-nm light. The results indicate that 4H-SiC is a suitable material for realizing low-noise UV avalanche photodiodes requiring good visible-blind performance.