Gary Charles Davis
General Electric
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Publication
Featured researches published by Gary Charles Davis.
Advances in Resist Technology and Processing V | 1988
Paul Richard West; Gary Charles Davis; Karen Alina Regh
The use of nitrones as contrast enhancement materials has been extended to the mid-UV region. Diarylnitrones, which function effectively as near-UV contrast enhancement materials, have been found to be less suitable for mid-UV printing because of secondary photochemical reactions. α-Aryl-N-alkylnitrones, however, can be designed to absorb efficiently and photobleach cleanly over a wavelength range of about 280 to 350 nm. Arylalkylnitrones are much more resistant to hydrolysis than are their diaryl counterparts and have been successfully formulated as aqueous solutions. Submicron resist patterns have been printed with a scanning projection aligner operating in the mid-UV through the use of a contrast enhancement material based upon an arylalkylnitrone.
Archive | 1994
Peter David Phelps; Eugene Pauling Boden; Gary Charles Davis; Danielle Ruth Joyce; James Franklin Hoover
Archive | 1984
Paul Richard West; Gary Charles Davis
Archive | 2003
James Manio Silva; David Michel Dardaris; Gary Charles Davis
Archive | 2004
James Louis Derudder; Niles Richard Rosenquist; Gary Charles Davis; Matthew Robert Pixton; Mark Erik Nelson; Zhaohui Su
Archive | 1995
Qamar Singh Bhatia; Paul William Buckley; Gary Charles Davis; Robert L. Howe; Wie-Hin Pan; Elliott West Shanklin
Archive | 2006
Robert Edgar Colborn; Gary Charles Davis; Jianbo Di; Constantin Donea; Irene Dris; Katherine Lee Jackson; Brian D. Mullen; Laura G. Schultz; Moitreyee Sinha; Paul Dean Sybert
Archive | 1991
Paul Richard West; Gary Charles Davis; Karen Alina Regh
Archive | 2003
Ramesh Hariharan; Gary Charles Davis; Marc Brian Wisnudel
Archive | 1999
Gary Charles Davis; Andrew James Caruso; Joseph Richard Wetzel; Ramesh Hariharan; Marc Brian Wisnudel