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Dive into the research topics where Gilbert L. Benavides is active.

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Featured researches published by Gilbert L. Benavides.


Precision Engineering-journal of The International Societies for Precision Engineering and Nanotechnology | 2001

Micromilling of metal alloys with focused ion beam-fabricated tools

David P. Adams; Michael J. Vasile; Gilbert L. Benavides; Ann N. Campbell

Abstract This work combines focused ion beam sputtering and ultra-precision machining as a first step in fabricating metal alloy microcomponents. Micro-end mills having ∼25 μm diameters are made by sputtering cobalt M42 high-speed steel and C2 micrograin tungsten carbide tool blanks. A 20 keV focused gallium ion beam is used to define a number of cutting edges and tool end clearance. Cutting edge radii of curvature are less than or equal to 0.1 μm. Micro-end mill tools having 2, 4 and 5 cutting edges successfully machine millimeter long trenches in 6061-T4 aluminum, brass, 4340 steel and polymethyl methacrylate. Machined trench widths are approximately equal to the tool diameters, and surface roughnesses (Ra) at the bottom of micromachined features are ∼200 nm. Microtools are robust and operate for more than 6 h without fracture. Results from ultra-precision machining aluminum alloy at feed rates as high as 50 mm/minute and an axial depth of 1.0 μm are included.


Proceedings of SPIE | 2000

Electrical and Fluidic Packaging of Surface Micromachined Electro-Microfluidic Devices

Paul C. Galambos; Gilbert L. Benavides

Microfluidic devices have applications in chemical analysis, biomedical devices and ink-jets1. An integrated microfluidic system incorporates electrical signals on-chip. Such electro-microfluidic devices require fluidic and electrical connection to larger packages. Therefore electrical and fluidic packaging of electro-microfluidic devices is the key to the development of integrated microfluidic systems. Packaging is more challenging for surface micromachined devices than for larger bulk micromachined devices. However, because surface micromachining allows incorporation of electrical traces during microfluidic channel fabrication, a monolithic device results. A new architecture for packaging surface micromachined electro- microfluidic devices is presented. This architecture relies on two scales of packaging to bring fluid to the device scale (picoliters) from the macroscale (microliters). The architecture emulates and utilizes electronics packaging technology. The larger package consists of a circuit board with embedded fluidic channels and standard fluidic connectors. The embedded channels connect to the smaller package, an Electro-Microfluidic Dual-Inline-Package (EMDIP) that takes fluid to the microfluidic integrated circuit (MIC). The fluidic connection is made to the back of the MIC through Bosch2 etched holes that take fluid to surface micromachined channels on the front of the MIC. Electrical connection is made to bond pads on the front of the MIC.


Other Information: PBD: 1 Jun 2001 | 2001

Meso-Machining Capabilities

Gilbert L. Benavides; David P. Adams; Pin Yang

Meso-scale manufacturing processes are bridging the gap between silicon-based MEMS processes and conventional miniature machining. These processes can fabricate two and three-dimensional parts having micron size features in traditional materials such as stainless steels, rare earth magnets, ceramics, and glass. Meso-scale processes that are currently available include, focused ion beam sputtering, micro-milling, micro-turning, excimer laser ablation, femtosecond laser ablation, and micro electro discharge machining. These meso-scale processes employ subtractive machining technologies (i.e., material removal), unlike LIGA, which is an additive meso-scale process. Meso-scale processes have different material capabilities and machining performance specifications. Machining performance specifications of interest include minimum feature size, feature tolerance, feature location accuracy, surface finish, and material removal rate. Sandia National Laboratories is developing meso-scale mechanical components and actuators which require meso-scale parts fabricated in a variety of materials. Subtractive meso-scale manufacturing processes expand the functionality of meso-scale components and complement silicon based MEMS and LIGA technologies.


MRS Proceedings | 1998

Micrometer-scale machining of metals and polymers enabled by focused ion beam sputtering

David P. Adams; Gilbert L. Benavides; Michael J. Vasile

This work combines focused ion beam sputtering and ultra-precision machining for microfabrication of metal alloys and polymers. Specifically, micro-end mills are made by Ga ion beam sputtering of a cylindrical tool shank. Using an ion energy of 20keV, the focused beam defines the tool cutting edges that have submicrometer radii of curvature. We demonstrate 25 {micro}m diameter micromilling tools having 2, 4 and 5 cutting edges. These tools fabricate fine channels, 26-28 microns wide, in 6061 aluminum, brass, and polymethyl methacrylate. Micro-tools are structurally robust and operate for more than 5 hours without fracture.


Other Information: PBD: 1 Jun 2002 | 2002

Electro-Microfluidic Packaging

Gilbert L. Benavides; Paul C. Galambos

Electro-microfluidics is experiencing explosive growth in new product developments. There are many commercial applications for electro-microfluidic devices such as chemical sensors, biological sensors, and drop ejectors for both printing and chemical analysis. The number of silicon surface micromachined electro-microfluidic products is likely to increase. Manufacturing efficiency and integration of microfluidics with electronics will become important. Surface micromachined microfluidic devices are manufactured with the same tools as ICs (integrated circuits) and their fabrication can be incorporated into the IC fabrication process. In order to realize applications for devices must be developed. An Electro-Microfluidic Dual In-line Package (EMDIP{trademark}) was developed surface micromachined electro-microfluidic devices, a practical method for getting fluid into these to be a standard solution that allows for both the electrical and the fluidic connections needed to operate a great variety of electro-microfluidic devices. The EMDIP{trademark} includes a fan-out manifold that, on one side, mates directly with the 200 micron diameter Bosch etched holes found on the device, and, on the other side, mates to lager 1 mm diameter holes. To minimize cost the EMDIP{trademark} can be injection molded in a great variety of thermoplastics which also serve to optimize fluid compatibility. The EMDIP{trademark} plugs directly into a fluidic printed wiring board using a standard dual in-line package pattern for the electrical connections and having a grid of multiple 1 mm diameter fluidic connections to mate to the underside of the EMDIP{trademark}.


ASME 2002 International Mechanical Engineering Congress and Exposition | 2002

Packaging Dissimilar Materials for Microfluidic Applications

Paul C. Galambos; Murat Okandan; Kenneth R. Pohl; Gilbert L. Benavides; Mark W. Jenkins; Dawn J. Bennett; Mathew S. Stay

In this paper we address the problem of assembling several different microfluidic devices, often made from different materials, into a hybrid packaged system. The focus will be on integration of silicon microfluidic die into larger hybrid systems. Details of three different approaches are presented: 1) a plastic flow manifold with tape die attach, 2) multiple capillary die insertion utilizing PDMS (Polydimethylsiloxane – silicone adhesive) for sealing and structural support, and 3) die attachment to a glass flow manifold utilizing anodic bonding. The unique tools required for each of these three techniques will be described. Sealed microfluidic connections (>10 ATM pressure) between silicon microfluidic chips (die) and flow manifolds are demonstrated.Copyright


Nanotribology: Critical Assessment and Research Needs, Gaithersburg, MD (US), 03/13/2000--03/15/2000 | 2000

Meso-scale machining capabilities and issues

Gilbert L. Benavides; David P. Adams; Pin Yang

Meso-scale manufacturing processes are bridging the gap between silicon-based MEMS processes and conventional miniature machining. These processes can fabricate two and three-dimensional parts having micron size features in traditional materials such as stainless steels, rare earth magnets, ceramics, and glass. Meso-scale processes that are currently available include, focused ion beam sputtering, micro-milling, micro-turning, excimer laser ablation, femto-second laser ablation, and micro electro discharge machining. These meso-scale processes employ subtractive machining technologies (i.e., material removal), unlike LIGA, which is an additive meso-scale process. Meso-scale processes have different material capabilities and machining performance specifications. Machining performance specifications of interest include minimum feature size, feature tolerance, feature location accuracy, surface finish, and material removal rate. Sandia National Laboratories is developing meso-scale electro-mechanical components, which require meso-scale parts that move relative to one another. The meso-scale parts fabricated by subtractive meso-scale manufacturing processes have unique tribology issues because of the variety of materials and the surface conditions produced by the different meso-scale manufacturing processes.


Archive | 2001

Packaging of electro-microfluidic devices

Gilbert L. Benavides; Paul C. Galambos; John A. Emerson; Kenneth A. Peterson; Rachel K. Giunta; David Lee Zamora; Robert D. Watson


Archive | 2003

Method of packaging and assembling micro-fluidic device

Gilbert L. Benavides; Paul C. Galambos; John A. Emerson; Kenneth A. Peterson; Rachel K. Giunta; David Lee Zamora; Robert D. Watson


Archive | 2002

Planar-constructed spatial micro-stage

Bernhard Jokiel; Gilbert L. Benavides; Lothar F. Bieg; James J. Allen

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Paul C. Galambos

Sandia National Laboratories

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David P. Adams

Sandia National Laboratories

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Louis A. Romero

Sandia National Laboratories

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Timothy John O'Hern

Sandia National Laboratories

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Bernhard Jokiel

Sandia National Laboratories

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Lothar F. Bieg

Sandia National Laboratories

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David Lee Zamora

Sandia National Laboratories

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John A. Emerson

Sandia National Laboratories

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John R. Torczynski

Sandia National Laboratories

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Kenneth A. Peterson

Sandia National Laboratories

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