Guo Li-Wei

Electroluminescence of an n-ZnO/p-GaN heterojunction under forward and reverse biases

We investigate the carrier envelope phase (CEP) effects on high-order harmonic generation (HHG) in ultrashort pulses with the pulse duration 2.5 fs when the laser intensity is high enough so that the initial state is ionized effectively during the laser pulse but remains about 20% population at the end of the laser pulse. We End that the ionization process of the initial state is very sensitive to the CEP during the laser pulse. The ionization process of the initial state determines the continuum state population and hence influences dramatically the weights of the classical trajectories that contribute to HHG. In such a case we can not predict the cutoff and the structure of the harmonic spectrum only by the number and the kinetic energy of the classical trajectories. The harmonic spectrum exhibits abundant characters for different CEP cases. As a result, we can control the cutoff frequency and the plateau structure of the harmonic spectrum with CEP by controlling the time behaviour of the ionization of the initial state.

Incorporation Behaviour of Arsenic and Phosphorus in GaAsP/GaAs Grown by Solid Source Molecular Beam Epitaxy with a GaP Decomposition Source

The incorporation behaviour of arsenic and phosphorus in the GaAsP ternary alloy under phosphorus-rich conditions is studied based on the incorporation coefficient model and the growth diffusion model combined with the alloy composition data obtained by high resolution x-ray diffraction analysis. It is found that As adatoms have longer surface lifetime and longer migration length than those of P adatoms, which leads to an arsenic incorporation efficiency much higher than that of phosphorous. With the increase of arsenic flux, the surface lifetime of arsenic adatoms decreases due to the competition of As adatoms. The detailed analysis and discussion are given here.

Raman Spectrum of Epitaxial Graphene on SiC (0001) by Pulsed Electron Irradiation

We report new Raman features of epitaxial graphene (EG) on Si-face 4H-SiC prepared by pulsed electron irradiation (PEI). With increasing graphene layers, frequencies of G and 2D peaks show blue-shifts and approach those of bulk highly-oriented pyrolytic graphite. It is indicated that the EG is slightly tension strained and tends to be strain-free. Meanwhile, single Lorentzian line shapes are well fitted to the 2D peaks of EG on SiC(0001) and their full widths at half maximum decrease with the increasing graphene layers, which indicates that the multilayer EG on Si-face can also contain turbostratic stacking by our PEI route instead of only AB Bernal stacking by a traditional thermal annealing method. It is worth noting that the stacking style plays an important role on the charge carrier mobility. Therefore our findings will be a candidate for growing quality graphene with high carrier mobility both on the Si- and C-terminated SiC substrate. Mechanisms behind the features are studied and discussed.

Enhanced Photoluminescence of InGaN/GaN Green Light-Emitting Diodes Grown on Patterned Sapphire Substrate

Green InGaN/GaN based light-emitting diodes (LEDs) are fabricated both on planar and wet-etched patterned sapphire substrates by metalorganic vapour phase epitaxy (MOVPE). Their photoluminescence (PL) properties of the two samples are studied. The results indicate that the PL integral intensity of the green LED on the patterned substrate is nearly two times of that on the planar one within the whole measured temperature range. The enhanced PL intensity in the green LED on the patterned substrate is shown completely contributed from the extraction efficiency, but not from the internal quantum efficiency. The conclusion is supported by temperature-dependent PL analysis on the two samples, and the mechanisms are discussed.

Characteristics of GaN grown on 6H-SiC with different AlN buffers

Characteristics of GaN grown on 6H-SiC (0001) substrates using different thicknesses of AlN buffers are studied. It is found that the surface morphology and crystal quality of GaN film closely depends on the strain state of the AlN buffer. For a thicker AlN buffer, there are cracks on GaN surface, which make the GaN films unsuitable for applications. While for a thinner AlN buffer, more dislocations are produced in the GaN film, which deteriorates the performance of GaN. Possible generation mechanisms of cracks and more dislocations are investigated and a ~100 nm AlN buffer is suggested to be a better choice for high quality GaN on SiC.

Growth of semi-insulating GaN by using two-step AlN buffer layer

Semi-insulating GaN is grown by using a two-step AlN buffer layer by metalorganic chemical vapour deposition. The sheet resistance of as-grown semi-insulating GaN is dramatically increased to 1013 Ω/sq by using two-step AlN buffer instead of the traditional low-temperature GaN buffer. The high sheet resistance of as-grown GaN over 1013 Ω/sq is due to inserting an insulating buffer layer (two-step AlN buffer) between the high-temperature GaN layer and a sapphire substrate which blocks diffusion of oxygen and overcomes the weakness of generating high density carrier near interface of GaN and sapphire when a low-temperature GaN buffer is used. The result suggests that the high conductive feature of unintentionally doped GaN is mainly contributed from the highly conductive channel near interface between GaN and the sapphire substrate, which is indirectly manifested by room-temperature photoluminescence excited by an incident laser beam radiating on growth surface and on the substrate. The functions of the two-step AlN buffer layer in reducing screw dislocation and improving crystal quality of GaN are also discussed.

Effect of 6H-SiC (112̄0) substrate on epitaxial graphene revealed by Raman scattering

A nonpolar SiC(1120) substrate has been used to fabricate epitaxial graphene (EG). Two EGs with layer numbers of 8–10 (referred to as MLG) and 2–3 (referred to as FLG) were used as representative to study the substrate effect on EG through temperature-dependent Raman scattering. It is found that Raman lineshifts of G and 2D peaks of the MLG with temperature are consistent with that of free graphene, as predicted by theory calculation, indicating that the substrate influence on the MLG is undetectable. While Raman G peak lineshifts of the FLG to that of the free graphene are obvious, however, its lineshift rate (−0.016 cm−1/K) is almost one third of that (−0.043 cm−1/K) of an EG on 6H-SiC (0001) in the temperature range from 300 K to 400 K, indicating a weak substrate effect from SiC (1120) on the FLG. This renders the FLG with a high mobility around 1812 cm2·V−1·s−1 at room temperature even with a very high carrier concentration about 2.95×1013 cm−2 (p-type). These suggest SiC (1120) is more suitable for fabricating EG with high performance.

Growth of Highly Conductive n-Type Al0.7Ga0.3N Film by Using AlN Buffer with Periodical Variation of V/III Ratio

High quality and highly conductive n-type Al0.7Ga0.3N films are obtained by using AlN multi-step layers (MSL) with periodical variation of V/III ratios by low-pressure metalorganic chemical vapour deposition (LP-MOCVD). The full-width at half-maximum (FWHM) of (0002) and (1015) rocking curves of the Si-doped Al0.7Ga0.3N layer are 519 and 625 arcsec, respectively. Room temperature (RT) Hall measurement shows a free electron concentration of 2.9 × 1019 cm−3, and mobility of 17.8 cm2V−1s−1, corresponding to a resistivity of 0.0121 ω cm. High conductivity of the Si-doped AlGaN film with such high Al mole fraction is mainly contributed by a remarkable reduction of threading dislocations (TDs) in AlGaN layer. The TD reducing mechanism in AlN MSL growth with periodical variation of V/III ratio is discussed in detail.

Elimination of Crystallographic Wing Tilt of Canti-Bridged Epitaxial Laterally Overgrown GaN Films by Optimizing Growth Procedure

Canti-bridged epitaxial lateral overgrowth (CBELO) of GaN is performed by metalorganic chemical vapour deposition (MOCVD) on maskless V-grooved sapphire substrates prepared by wet chemical etching with different mesa widths. The wing tilt usually observed in ELO is not found in the CBELO GaN with wide mesa widths, while it can be detected obviously in the GaN with narrow mesa widths. The wing tilt of CBELO GaN grown on a grooved sapphire substrate with narrow mesa can be controlled by adjusting the thickness of the nucleation layer. The dependence of the wing tilt on the nucleation layer thickness is studied. Cross-sectional scanning electron microscopy is used to characterize the geometry of the wing regions, and double crystal x-ray diffraction is used to analyse the structural characteristics and to measure the magnitude of the crystalline wing tilt. It is found that the crystalline wing tilt can be eliminated completely by first growth of a thin nucleation GaN layer then the CBELO GaN. Possible reason and the origin of the wing tilt in CBELO GaN films are also discussed.

Interface Properties of InAs/AlSb Superlattices Characterized by Grazing Incidence X-Ray Reflectivity

Two kinds of superlattice interfaces of InAs/AlSb superlattices are realized in an optimized interface growth process, where one is AlAs-like and the other is InSb-like grown on a relaxed AlSb buffer layer. The superlattice properties such as interface roughness and layer thickness are studied by grazing incidence x-ray reflectivity. The reflectivity curves are simulated by standard software till the simulation curves match well with the experimental curves. The simulation indicates that AlAs-like interfaces are much rougher than InSb-like interfaces. Grazing incidence x-ray reflectivity is also discussed as a powerful tool to assessing the structure properties of superlattices.