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Guy F. Hudson

Micron Technology

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Featured researches published by Guy F. Hudson.

Archive | 1996

Method for chemical-mechanical planarization of a substrate on a fixed-abrasive polishing pad

Guy F. Hudson

Archive | 2000

Method and apparatus for selective removal of material from wafer alignment marks

Russell C. Zahorik; Guy F. Hudson; Hugh E. Stroupe; Todd A. Dobson; Brian F. Gordon

Archive | 2003

Method for post chemical-mechanical planarization cleaning of semiconductor wafers

David Gonzales; Guy F. Hudson

Archive | 1998

Megasonic cleaning methods and apparatus

John Skrovan; Guy F. Hudson

Archive | 1996

Wafer backing member for mechanical and chemical-mechanical planarization of substrates

Guy F. Hudson; Karl M. Robinson

Archive | 2004

Method for controlling pH during planarization and cleaning of microelectronic substrates

Judson R. Sharples; Kenneth F. Zacharias; Guy F. Hudson

Archive | 1998

Polishing polymer surfaces on non-porous CMP pads

Guy F. Hudson; Michael A. Walker

Archive | 1999

Polishing pad with incompressible, highly soluble particles for chemical-mechanical planarization of semiconductor wafers

Guy F. Hudson

Archive | 1998

Low friction polish-stop stratum for endpointing chemical-mechanical planarization processing of semiconductor wafers

Guy F. Hudson; Russell C. Zahorik

Archive | 1996

Trench/hole fill processes for semiconductor fabrication

Richard L. Elliott; John H. Givens; Guy F. Hudson

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Scott G. Meikle

Micron Technology

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Russell C. Zahorik

Micron Technology

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Brian F. Gordon

Micron Technology

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Hugh E. Stroupe

Micron Technology

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Todd A. Dobson

Micron Technology

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Michael A. Walker

Micron Technology

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Richard L. Elliott

Micron Technology

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Judson R. Sharples

Micron Technology

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Karl M. Robinson

Micron Technology

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Kenneth F. Zacharias

Micron Technology

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