H. Hochmuth

High electron mobility of epitaxial ZnO thin films on c-plane sapphire grown by multistep pulsed-laser deposition

A multistep pulsed-laser deposition (PLD) process is presented for epitaxial, nominally undoped ZnO thin films of total thickness of 1 to 2 μm on c-plane sapphire substrates. We obtain reproducibly high electron mobilities from 115 up to 155 cm2/V s at 300 K in a narrow carrier concentration range from 2 to 5×1016 cm−3. The key issue of the multistep PLD process is the insertion of 30-nm-thin ZnO relaxation layers deposited at reduced substrate temperature. The high-mobility samples show atomically flat surface structure with grain size of about 0.5–1 μm, whereas the surfaces of low-mobility films consist of clearly resolved hexagonally faceted columnar grains of only 200-nm size, as shown by atomic force microscopy. Structurally optimized PLD ZnO thin films show narrow high-resolution x-ray diffraction peak widths of the ZnO(0002) ω- and 2Θ-scans as low as 151 and 43 arcsec, respectively, and narrow photoluminescence linewidths of donor-bound excitons of 1.7 meV at 2 K.

Room temperature ferromagnetism in ZnO films due to defects

ZnO films were prepared by pulsed laser deposition on a-plane sapphire substrates under N2 atmosphere. Ferromagnetic loops were obtained with the superconducting quantum interference device at room temperature, which indicate a Curie temperature much above room temperature. No clear ferromagnetism was observed in intentionally Cu-doped ZnO films. This excludes that Cu doping into ZnO plays a key role in tuning the ferromagnetism in ZnO. 8.8% negative magnetoresistance probed at 5K at 60kOe on ferromagnetic ZnO proves the lack of s-d exchange interaction. Anomalous Hall effect (AHE) was observed in ferromagnetic ZnO as well as in nonferromagnetic Cu-doped ZnO films, indicating that AHE does not uniquely prove ferromagnetism. The observed ferromagnetism in ZnO is attributed to intrinsic defects.

Room temperature ferromagnetism in carbon-implanted ZnO

Unexpected ferromagnetism has been observed in carbon doped ZnO films grown by pulsed laser deposition [H. Pan et al., Phys. Rev. Lett. 99, 127201 (2007)]. In this letter, we introduce carbon into ZnO films by ion implantation. Room temperature ferromagnetism has been observed. Our analysis demonstrates that (1) C-doped ferromagnetic ZnO can be achieved by an alternative method, i.e., ion implantation, and (2) the chemical involvement of carbon in the ferromagnetism is indirectly proven.

Mean barrier height of Pd Schottky contacts on ZnO thin films

We have investigated the temperature dependence of the barrier height of high-quality Pd Schottky contacts on (0001)-oriented ZnO thin films by temperature-dependent current-voltage and capacitance-voltage (CV) measurements. The films have been grown by pulsed-laser deposition. The effective Schottky barrier height ΦB,eff deduced from the current-voltage measurements was evaluated by considering a Gaussian barrier height distribution with a standard deviation σ around a mean barrier height ΦB,m. We determined ΦB,m=(1.16±0.04)eV which agrees well with the value of 1.14eV determined by CV measurements. The standard deviation is determined to be (134±10)meV.

Lateral homogeneity of Schottky contacts on n-type ZnO

The electrical properties of Schottky contacts (SCs) produced ex situ on n-type ZnO single crystals and epitaxial thin films were investigated. Electron beam induced current imaging was used to study lateral variations of the current induced in the space charge region of the SC. Further, the effective barrier height was determined by current–voltage and capacitance–voltage measurements. Pd contacts prepared on ZnO thin films that had undergone treatment in a plasma-enhanced chemical vapor deposition with nitrous oxide (N2O) as ambient gas are laterally homogeneous with an effective barrier height of (600±30) meV.

Room temperature ferromagnetism in Mn-doped ZnO films mediated by acceptor defects

Mn-doped ZnO films with preferred c-axis growth orientation were prepared by pulsed laser deposition under N2 atmosphere on a-plane sapphire substrates. Large positive magnetoresistance amounting to 60% was observed at 5K. Clear anomalous Hall effect was observed at 20K. Ferromagnetism with Curie temperature higher than 290K has been observed, and a deep acceptor trap due to Zn vacancies with a thermal activation energy amounting to 0.815eV has been detected by deep-level transient spectroscopy. For comparison, only paramagnetism was observed in Mn-doped ZnO films with donor traps prepared under O2 atmosphere. Their results clearly demonstrate that the ferromagnetism in Mn-doped ZnO originates from the parallel alignment of magnetic moments mediated by acceptor defects.

Large‐area double‐side pulsed laser deposition of YBa2Cu3O7−x thin films on 3‐in. sapphire wafers

A pulsed laser deposition (PLD) technique for YBa2Cu3O7−x (YBCO) thin films with CeO2 buffer layers and gold contact films on both sides of 3‐in. diameter sapphire wafers, which are applied for microwave strip‐line filters, is described and some results of structural and compositional characterization are given. This large‐area multilayer PLD technique allows for a homogeneous and reproducible YBCO deposition on both wafer sides with inductively measured critical current densities of 3×106–5×106 A/cm2 at 77 K with a YBCO thickness of 350–500 nm. The results indicate that PLD seems to have unique capabilities for fast deposition of high‐quality large area oxide multilayers.

Properties of reactively sputtered Ag, Au, Pd, and Pt Schottky contacts on n-type ZnO

Highly rectifying Ag, Au, Pd, and Pt Schottky contacts have been fabricated on heteroepitaxial pulsed-laser deposited ZnO-thin films by reactive sputtering. X-ray photoelectron spectroscopy revealed an oxidation of the Ag, Pd, and Pt contact material; the gold contacts are purely metallic. The necessity of a conductive capping of the oxidized contacts is proven by photocurrent measurements of AgxO contacts. The ideality factors and the effective barrier heights were determined by current-voltage measurements. Capacitance-voltage and temperature dependent current-voltage measurements were furthermore carried out to determine the mean barrier height, the standard deviation and the respective voltage dependencies taking lateral fluctuations of the barrier height into account.

ZnO metal-semiconductor field-effect transistors with Ag-Schottky gates

Metal-semiconductor field-effect transistors (MESFETs) were fabricated by reactive dc sputtering of Ag-Schottky gate contacts on ZnO thin-film channels grown by pulsed-laser deposition on sapphire. The n-type conductivity (normally on) of typical MESFETs is tunable over 8 decades in a voltage range of 2.5V with an off voltage of −1.5V and very low off-current density in the range of 10−6A∕cm2. Channel mobilities of up to 27cm2∕Vs have been achieved.

Spin Manipulation in Co-Doped ZnO

We report the clearly observed tunneling magnetoresistance at 5 K in magnetic tunnel junctions with Co-doped ZnO as a bottom ferromagnetic electrode and Co as a top ferromagnetic electrode prepared by pulsed laser deposition. Spin-polarized electrons were injected from Co-doped ZnO to the crystallized Al2O3 and tunnelled through the amorphous Al2O3 barrier. Our studies demonstrate the spin polarization in Co-doped ZnO and its possible application in future ZnO-based spintronics devices.