H. J. Mathieu

Phosphonate self-assembled monolayers on aluminum surfaces

Substrates of aluminum (Al) deposited by physical vapor deposition onto Si substrates and then chemically reacted with perfluorodecylphosphonic acid (PFDPAlSi), decylphosphonic acid (DPAlSi), and octadecylphosphonic acid (ODPAlSi) were studied by x-ray photoelectron spectroscopy (XPS), contact angle measurements, atomic force microscopy (AFM), and friction force microscopy, a derivative of AFM, to characterize their surface chemical composition, roughness, and micro-/nanotribological properties. XPS analysis confirmed the presence of perfluorinated and nonperfluorinated alkylphosphonate molecules on the PFDPAlSi, DPAlSi, and ODPAlSi. The sessile drop static contact angle of pure water on PFDPAlSi was typically more than 130 degrees and on DPAlSi and ODPAlSi typically more than 125 degrees indicating that all phosphonic acid reacted AlSi samples were very hydrophobic. The surface roughness for PFDPAlSi, DPAlSi, ODPAlSi, and bare AlSi was approximately 35 nm as determined by AFM. The surface energy for PFDPAlSi was determined to be approximately 11 mNm by the Zisman plot method compared to 21 and 20 mNm for DPAlSi and ODPAlSi, respectively. Tribology involves the measure of lateral forces due to friction and adhesion between two surfaces. Friction, adhesion, and wear play important roles in the performance of micro-/nanoelectromechanical systems. PFDPAlSi gave the lowest adhesion and coefficient of friction values while bare AlSi gave the highest. The adhesion and coefficient of friction values for DPAlSi and ODPAlSi were comparable.

Chemical stability of nonwetting, low adhesion self-assembled monolayer films formed by perfluoroalkylsilanization of copper

A self-assembled monolayer (SAM) has been produced by reaction of 1H,1H,2H,2H-perfluorodecyldimethylchlorosilane (PFMS) with an oxidized copper (Cu) substrate and investigated by x-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), friction force microscopy (FFM), a derivative of AFM, and contact angle measurement. FFM showed a significant reduction in the adhesive force and friction coefficient of PFMS modified Cu (PFMS/Cu) compared to unmodified Cu. The perfluoroalkyl SAM on Cu is found to be extremely hydrophobic, yielding sessile drop static contact angles of more than 130 degrees for pure water and a surface energy (which is proportional to the Zisman critical surface tension for a Cu surface with 0 rms roughness) of 14.5 mJm2(nMm). Treatment by exposure to harsh conditions showed that PFMS/Cu SAM can withstand boiling nitric acid (pH=1.8), boiling water, and warm sodium hydroxide (pH=12, 60 degrees C) solutions for at least 30 min. Furthermore, no SAM degradation was observed when PFMS/Cu was exposed to warm nitric acid solution for up to 70 min at 60 degrees C or 50 min at 80 degrees C. Extremely hydrophobic (low surface energy) and stable PFMS/Cu SAMs could be useful as corrosion inhibitors in micro/nanoelectronic devices and/or as promoters for antiwetting, low adhesion surfaces or dropwise condensation on heat exchange surfaces.

A combination of SFM and TOF-SIMS imaging for observing local inhomogenieties in morphology and composition: aged calcite surfaces

Reference LNNME-ARTICLE-1997-005doi:10.1002/(SICI)1096-9918(199712)25:13 3.0.CO;2-WView record in Web of Science Record created on 2007-04-23, modified on 2016-08-08

Surface Functionalization for Biomedical Applications

This paper describes the functionalization of surfaces against nonspecific protein adsorption. For surface modification photo-immobilization, γ – activation or a RF physical plasma is used which changes the chemical surface composition within the first 10 nm region. The surface chemistry is controlled by the use of Time-of-Flight Secondary Ion Mass Spectrometry and X-ray Photoelectron Spectroscopy.