Han-Na Hwang

Pentacene as protection layers of graphene on SiC surfaces

We report that pentacene can be used as a protection layer of graphene using synchrotron radiation-based photoemission spectroscopy. When pentacene was deposited on a single layer graphene, molecular states of pentacene were clearly observed, yet no change in the band structure of graphene could be identified. Unique electronic properties of graphene can be preserved in the presence of pentacene layers, and this finding can be exploited for fundamental research as well as application of graphene in electronic devices. After exposing the pentacene-covered graphene to air followed by a subsequent annealing under vacuum, band structure of graphene was completely maintained.

Metal‐Insulator Transition‐Induced Adsorption‐Resistant Behavior of Small Au Nanoparticles

Smaller nonmetallic nanoparticles are more inert: Metal-insulator transition of Au nanoparticles on silica is closely related to the metal-support charge transfer, which has a strong influence on chemisorption reactivity of Au. Smaller nonmetallic Au nanoparticles are more resistant towards butanethiol chemisorption [picture and graph: see text].The size-dependent variation of the electronic and chemical properties of Au nanoparticles formed on native Si oxide surfaces is investigated using synchrotron radiation photoemission spectroscopy and ultraviolet photoelectron spectroscopy. The adsorption reactivity toward butanethiol adsorption initially increases with decreasing particle size; however, the reactivity of Au nanoparticles becomes gradually lower below a size of approximately 0.8 nm. The photoemission spectral changes suggest a metal-insulator transition, accompanied by negative charge transfer from the nanoparticles to the support, which may be the source of the chemical inertness of small Au nanoparticles.

A compact, sample-in-atmospheric-pressure soft x-ray microscope developed at Pohang Light Source

A full-field transmission soft x-ray microscope (TXM) was developed at the Pohang Light Source. With a 2 mm diameter condenser zone plate and a 40 nm outermost-zone-width objective zone plate, the TXMs achieved spatial resolution is better than 50 nm at the photon energy of 500 eV (wavelength: 2.49 nm). The TXM is portable and mounted in tandem with a 7B1 spectroscopy end station. The sample position is outside the vacuum, allowing for quick sample changes and enhanced in situ experimental capability. In addition, the TXM is pinhole-free and easy to align, having commercial mounts located outside the vacuum components.

Patterning of self-assembled pentacene nanolayers by extreme ultraviolet-induced three-dimensional polymerization.

Most researchers expect extreme ultraviolet lithography (EUVL) to be used to create patterns below 32 nm in semiconductor devices. An ultrathin EUV photoresist (PR) layer a few nanometers thick is required to further reduce the minimum feature size. Here, we show for the first time that pentacene molecular layers can be employed as a new EUV resist. Nanometer-scale dots and lines have been successfully realized using the new molecular resist. We clearly show the mechanism that forms the nanopatterns using a scanning photoemission microscope, EUV interference lithography, an atomic force microscope, and photoemission spectroscopy. The molecular PR has several advantages over traditional polymer EUV PRs. For example, it has high thermal/chemical stability, negligible outgassing, the ability to control the height and width on the nanometer scale, fewer residuals, no need for a chemical development process and thus a reduction of chemical waste when making nanopatterns. Besides, it can be applied to any substrate to which pentacene bonds chemically, such as SiO2, SiN, and SiON, which are important films in the semiconductor device industry.

Patterning of an amine-terminated nanolayer by extreme ultraviolet

The adsorption of NH3 molecules on the Si(100)2×1 surface constructs a cleaner and more well-defined amine layer than self-assembled monolayer such as aminosilylated layer, which make it possible to study photoinduced reactions between amines and monochromatic light with shorter wavelength than ultraviolet, i.e., extreme ultraviolet and soft x ray. We report that the molecular layer of amine groups reacts with extreme ultraviolet and soft x ray, which can be used to make fine patterns on the amine-terminated layer. The amine patterning with the leading postoptical lithography using extreme ultraviolet could be applied to fabricating future molecular nanodevices.