Hanming Wu

In-situ doped silicon germanium and silicon carbide source drain region for strained silicon CMOS transistors

Method and structure for second spacer formation for strained silicon MOS transistors

Metal hard mask method and structure for strained silicon MOS transistors

Method and structure using a pure silicon dioxide hardmask for gate patterning for strained silicon MOS transistors

Silicon Germanium and Polysilicon Gate Structure for Strained Silicon Transistors

ETCHING METHOD AND STRUCTURE USING A HARD MASK FOR STRAINED SILICON MOS TRANSISTORS

ETCHING METHOD AND STRUCTURE IN A SILICON RECESS FOR SUBSEQUENT EPITAXIAL GROWTH FOR STRAINED SILICON MOS TRANSISTORS

Method for dual energy implantation for ultra-shallow junction formation of MOS devices

Germanium-silicon and polycrystalline silicon grating construction of strain silicon transistor

Structure and process for subsequently epitaxial growing strain silicon MOS chip tube in silicon dent