Hannes Hempel

Intragrain charge transport in kesterite thin films-Limits arising from carrier localization

Intragrain charge carrier mobilities measured by time-resolved terahertz spectroscopy in state of the art Cu2ZnSn(S,Se)4 kesterite thin films are found to increase from 32 to 140 cm2 V−1 s−1 with increasing Se content. The mobilities are limited by carrier localization on the nanometer-scale, which takes place within the first 2 ps after carrier excitation. The localization strength obtained from the Drude-Smith model is found to be independent of the excited photocarrier density. This is in accordance with bandgap fluctuations as a cause of the localized transport. Charge carrier localization is a general issue in the probed kesterite thin films, which were deposited by coevaporation, colloidal inks, and sputtering followed by annealing with varying Se/S contents and yield 4.9%–10.0% efficiency in the completed device.

Measurement of charge carrier mobilities in thin films on metal substrates by reflection time resolved terahertz spectroscopy

We show that charge carrier mobilities can be measured by reflection time resolved THz spectroscopy (R-TRTS) even for thin films on metal contacts, such as polycrystalline Cu2SnZnSe4 grown on molybdenum. In the measurement a reduced THz reflection upon photo-excitation is observed in contrast to increased THz reflection commonly observed on insulating substrates, and which excludes standard analytic R-TRTS analyses. Instead, a numerical transfer matrix method is used to model the THz reflection from which we derive carrier mobilities of 100 cm2/Vs consistent with literature. We show that R-TRTS on metal substrates is ~100x less sensitive compared to measurements on insulating substrates. These sensitivity of these R-TRTS measurements can be increased by using lower substrate refractive indices, lower substrate conductivities, thicker sample layers or higher THz probe frequencies.

Influence of structure geometry on THz emission from Black Silicon surfaces fabricated by reactive ion etching

The influence of structure geometry on THz emission from Black Silicon (BS) surfaces fabricated by reactive ion etching (RIE) has been investigated by a comprehensive study including optical simulations, optical-pump THz probe and THz emission studies. A strong enhancement of THz emission is observed with increasing structure depth, which is mainly related to the increased number of carriers created within the silicon needles and not due to the overall absorption enhancement as previously claimed for silicon nanowires.

Minority and Majority Charge Carrier Mobility in Cu2ZnSnSe4 revealed by Terahertz Spectroscopy

The mobilities of electrons and holes determine the applicability of any semiconductor, but their individual measurement remains a major challenge. Here, we show that time-resolved terahertz spectroscopy (TRTS) can distinguish the mobilities of minority and majority charge carriers independently of the doping-type and without electrical contacts. To this end, we combine the well-established determination of the sum of electron and hole mobilities from photo-induced THz absorption spectra with mobility-dependent ambipolar modeling of TRTS transients. The method is demonstrated on a polycrystalline Cu2ZnSnSe4 thin film and reveals a minority (electron) mobility of 128 cm2/V-s and a majority (hole) carrier mobility of 7 cm2/V-s in the vertical transport direction relevant for light emitting, photovoltaic and solar water splitting devices. Additionally, the TRTS analysis yields an effective bulk carrier lifetime of 4.4 ns, a surface recombination velocity of 6 * 104 cm/s and a doping concentration of ca. 1016 cm−3, thus offering the potential for contactless screen novel optoelectronic materials.