Harald Gross

P‐172: Optical Lithography in Vacuum for Microstructuring of Small Molecules

In this paper, we describe a new kind of lithography for microstructuring of small molecules in vacuum utilizing glass masks with a patterned film. First p- and n-type organic transistors have been successfully fabricated on silicon and glass substrates with a diameter of 150mm, respectively. Simulations regarding a roll-to-roll production show the potential for high material yields at high throughput on large and flexible substrates.