Haruna Kawashima

Method and apparatus for precisely detecting surface position of a patterned wafer

Device for detecting the position of a surface

Surface position detecting method and apparatus including detection and correction of errors, such as surface position errors or tilt, in exposure regions

Surface position detecting device

Device for optically detecting inclination of a surface

Surface position detecting method at a predetermined and plurality of adjacent points

Exposure method and exposure apparatus using the same

Autofocusing system for a projecting exposure apparatus

Scanning exposure apparatus with surface position detecting system

Detection of surface position