Hideki Sato

Film formation by motion control of ionized precursors in electric field

A chemical vapor deposition (CVD) method, called ionization CVD, in which ionized source molecules were deposited on a substrate by Coulombic force, was developed to control gas-phase reaction and film morphology. This method was applied to the tetraethylorthosilicate (TEOS)/ozone-atmospheric pressure chemical vapor deposition process by using the surface corona discharge. TEOS/O3 films deposited on SiN and SiO2 films by this CVD method showed good properties for the flow shape, the gap filling and the surface morphology. In Fourier-transform infrared spectra of gas-phase intermediates collected in the vapor condenser, the intensity of the absorption peak at 600 cm−1 was different between ionized intermediates and nonionized intermediates.

On-line software expansion in large-scale widely distributed systems

To expand software easily, the construction of large-scale widely distributed systems should be based on the concept of autonomous decentralized systems. It is proposed that the software expansion methods should be variable, according to the characteristics of software. Two types of software, online control software and human service software, are derived from the analysis of software characteristics. The software expansion process is then derived, and online replacement is discussed.<<ETX>>