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Hideo Miura

Renesas Electronics

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Archive | 2001

Semiconductor device with CMOS-field-effect transistors having improved drain current characteristics

Yukihiro Kumagai; Hiroyuki Ohta; Fumio Ootsuka; Shuji Ikeda; Takahiro Onai; Hideo Miura; Katsuhiko Ichinose; Toshifumi Takeda

Archive | 1999

Semiconductor device having cobalt silicide film in which diffusion of cobalt atoms is inhibited and its production process

Hiromi Shimazu; Tomio Iwasaki; Hiroyuki Ohta; Hideo Miura; Shuji Ikeda

Archive | 2003

Semiconductor wafer and manufacturing method of semiconductor device

Yasuhiko Kouno; Hideo Miura; Nobuyoshi Matsuura; Masaharu Kubo

Archive | 2000

Semiconductor device provided with rewiring layer

Akihiro Yaguchi; Hideo Miura; Atsushi Kazama; Asao Nishimura

Archive | 2006

Method of manufacturing semiconductor device having conductive thin films

Takashi Nakajima; Hideo Miura; Hiroyuki Ohta; Noriaki Okamoto

Archive | 2003

Method for forming grooves in the scribe region to prevent a warp of a semiconductor substrate

Nobuyoshi Matsuura; Yasuhiko Kouno; Hideo Miura; Masaharu Kubo

Archive | 2004

Testing apparatus for carrying out inspection of a semiconductor device

Ryuji Kohno; Hideo Miura; Masatoshi Kanamaru; Hiroya Shimizu; Hideyuki Aoki

Archive | 1997

Semiconductor integrated device and method of fabrication thereof

Hiromi Shimazu; Tsuyoshi Baba; Masayuki Suzuki; Hideo Miura

Archive | 2002

Semiconductor device and contractor for inspection

Hideo Miura; Ryuji Kohno

Archive | 2002

Field effect transistor on a substrate with (111) orientation having zirconium oxide gate insulation and cobalt or nickel silicide wiring

Tomio Iwasaki; Hiroshi Moriya; Hideo Miura; Shuji Ikeda

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